U. Smith

867 citations

50 papers · 710 indexed · h-index 13

Impact in

Atomic and Molecular Physics, and Optics top 10%
- Semiconductor materials and interfaces
Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices
- Silicon and Solar Cell Technologies
- Integrated Circuits and Semiconductor Failure Analysis

Papers in ⓘ

Acoustics and Ultrasonics 1
Atomic and Molecular Physics, and Optics 28
- Semiconductor materials and interfaces 18
- Force Microscopy Techniques and Applications 6

Co-authors: Fredric Ericson (11 shared papers)Jan‐Åke Schweitz (4 shared papers)D. Mangelinck (2 shared papers)Tobias Jarmar (6 shared papers)S.-L. Zhang (3 shared papers)S. Berg (2 shared papers)Ilia Katardjiev (1 shared paper)F. Engelmark (2 shared papers)
Journals: Journal of Applied Physics (9 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)Applied Physics Letters (2 papers)Journal of The Electrochemical Society (2 papers)Electrochemical and Solid-State Letters (2 papers)
Partner nations: Sweden United States France

In The Last Decade

U. Smith

47 papers receiving 671 citations

Peers

Countries citing papers authored by U. Smith

Since Specialization

Citations

This map shows the geographic impact of U. Smith's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by U. Smith with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites U. Smith more than expected).

Fields of papers citing papers by U. Smith

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by U. Smith. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by U. Smith. The network helps show where U. Smith may publish in the future.

Co-authors

The 25 scholars most cited alongside U. Smith, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with U. Smith Line = papers co-authored together U. Smith links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 50 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	A transmission electron microscopy study of hillocks in thin aluminum films Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Fredric Ericson, Nils Kristensen, Jan‐Åke Schweitz, U. Smith	1991	76
2	Synthesis of highly oriented piezoelectric AlN films by reactive sputter deposition Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·F. Engelmark, G. Fucntes, Ilia Katardjiev, Anders Hårsta, U. Smith, S. Berg	2000	76
3	Self-aligned silicides for Ohmic contacts in complementary metal–oxide–semiconductor technology: TiSi2, CoSi2, and NiSi Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·S.-L. Zhang, U. Smith	2004	69
4	Differential scanning calorimetry analysis of the linear parabolic growth of nanometric Ni silicide thin films on a Si substrate Applied Physics Letters ·F. Nemouchi, D. Mangelinck, C. Bergman, P. Gas, U. Smith	2005	60
5	Morphological and phase stability of nickel–germanosilicide on Si1−xGex under thermal stress Journal of Applied Physics ·Tobias Jarmar, J. Seger, Fredric Ericson, D. Mangelinck, U. Smith, S.-L. Zhang	2002	60
6	Local stress relaxation phenomena in thin aluminum films Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·U. Smith, Nils Kristensen, Fredric Ericson, Jan‐Åke Schweitz	1991	36
7	Hole formation in thin aluminium films under controlled variation of strain and temperature Thin Solid Films ·Nils Kristensen, Fredric Ericson, Jan‐Åke Schweitz, U. Smith	1991	29
8	Morphological instability of NiSi1−uGeu on single-crystal and polycrystalline Si1−xGex Journal of Applied Physics ·J. Seger, Tobias Jarmar, Z.-B. Zhang, Henry H. Radamson, Fredric Ericson, U. Smith, S.-L. Zhang	2004	28
9	Long-term stability and electrical properties of compensation doped poly-Si IC-resistors IEEE Transactions on Electron Devices ·Matts Rydberg, U. Smith	2000	28
10	Grain collapses in strained aluminum thin films Journal of Applied Physics ·Nils Kristensen, Fredric Ericson, Jan‐Åke Schweitz, U. Smith	1991	24
11	Current Instability for Silicon Nanowire Field-Effect Sensors Operating in Electrolyte with Platinum Gate Electrodes Electrochemical and Solid-State Letters ·Si Chen, Leif Nyholm, Nima Jokilaakso, Amelie Eriksson Karlström, Jan Linnros, U. Smith, Shi‐Li Zhang	2011	22
12	Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness Electrochemical and Solid-State Letters ·Xindong Gao, Joakim Andersson, Tomáš Kubart, Tomas Nyberg, U. Smith, Jun Lü, Lars Hultman, A. J. Kellock, Zhen Zhang, C. Lavoie, Shi‐Li Zhang	2011	20
13	An ion-gated bipolar amplifier for ion sensing with enhanced signal and improved noise performance Applied Physics Letters ·Da Zhang, Xindong Gao, Si Chen, H. Norström, U. Smith, P. M. Solomon, Shi‐Li Zhang, Zhen Zhang	2014	12
14	Fluctuations in doubly scattered laser light Physica A Statistical Mechanics and its Applications ·F.C. van Rijswijk, U. Smith	1976	11
15	An experimental study of the influence of oxygen on silicide formation with tungsten deposited from tungsten hexafluoride Journal of Applied Physics ·Sui Zhang, U. Smith, R. Buchta, Mikael Östling	1991	11
16	Role of nonradiative recombination in the degradation of InGaAsP/InP-based bulk lasers IEEE Journal of Quantum Electronics ·Thomas Kallstenius, A. Landstedt, U. Smith, P. Granestrand	2000	10
17	On the degradation of InGaAsP/InP-based bulk lasers Journal of Lightwave Technology ·Thomas Kallstenius, Jakob Bäckström, U. Smith, B. Stoltz	1999	10
18	Electrical properties of the TiSi2–Si transition region in contacts: The influence of an interposed layer of Nb Journal of Applied Physics ·Jonas Åberg, Stefan Persson, P.‐E. Hellberg, S.-L. Zhang, U. Smith, Fredric Ericson, Mathias Engström, Wlodek Kaplan	2001	8
19	Degradation of InGaAsP/InP-based multiquantum-well lasers Journal of Applied Physics ·Thomas Kallstenius, Jakob Bäckström, U. Smith, Björn Stoltz	1999	8
20	Electromigration behavior of Cu metallization interfacing with Ta versus TaN at high temperatures Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Shabnam Mardani, H. Norström, U. Smith, Fredrik Gustavsson, Jörgen Olsson, Shi‐Li Zhang	2016	7

About U. Smith

U. Smith is a scholar working on Acoustics and Ultrasonics, Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Ceramics and Composites, having authored 50 papers that have together received 710 indexed citations. Recurring topics across this work include Semiconductor materials and interfaces (18 papers), Semiconductor materials and devices (15 papers), Thin-Film Transistor Technologies (10 papers), Silicon and Solar Cell Technologies (8 papers), Copper Interconnects and Reliability (7 papers), Force Microscopy Techniques and Applications (6 papers), Advancements in Semiconductor Devices and Circuit Design (5 papers) and Silicon Carbide Semiconductor Technologies (5 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (342 citations), Electrical and Electronic Engineering (456 citations), Electronic, Optical and Magnetic Materials (146 citations), Condensed Matter Physics (78 citations) and Acoustics and Ultrasonics (6 citations). U. Smith has collaborated with scholars based in Sweden, United States and France. Frequent co-authors include Fredric Ericson, Jan‐Åke Schweitz, D. Mangelinck, Tobias Jarmar, S.-L. Zhang, S. Berg, Ilia Katardjiev, F. Engelmark, Anders Hårsta and P. Gas. Their work appears in journals such as Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Applied Physics Letters, Journal of The Electrochemical Society and Electrochemical and Solid-State Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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