A.A. Howling
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- Plasma Diagnostics and Applications 71
- Thin-Film Transistor Technologies 34
- Silicon and Solar Cell Technologies 18
- Electrohydrodynamics and Fluid Dynamics 17
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- Dust and Plasma Wave Phenomena 20
- Materials Chemistry top 5%
- Silicon Nanostructures and Photoluminescence 20
- Nuclear and High Energy Physics top 10%
- Magnetic confinement fusion research 20
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- Particle accelerators and beam dynamics 24
- Co-authors
- Ch. HollensteinL. SansonnensJ.-L. DorierI. FurnoU. KrollAlexandra WaskowB. StrahmJohannes Schmitt
- Cited by
- Electrical and Electronic EngineeringAtomic and Molecular Physics, and OpticsMaterials Chemistry
- Journals
- Plasma Sources Science and Technology (20 papers)Journal of Applied Physics (10 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (10 papers)
- Partner nations
- SwitzerlandFranceGermany
In The Last Decade
A.A. Howling
112 papers receiving 2.8k citations
Peers
Comparison fields: 5 of 91
- Electrical and Electronic Engineering 2.3k
- Atomic and Molecular Physics, and Optics 860
- Materials Chemistry 1.0k
- Radiology, Nuclear Medicine and Imaging 424
- Nuclear and High Energy Physics 225
Countries citing papers authored by A.A. Howling
This map shows the geographic impact of A.A. Howling's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A.A. Howling with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A.A. Howling more than expected).
Fields of papers citing papers by A.A. Howling
This network shows the impact of papers produced by A.A. Howling. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A.A. Howling. The network helps show where A.A. Howling may publish in the future.
Co-authorship network
The 25 scholars most cited alongside A.A. Howling, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 2 | |
| 2 | 2023 | 3 | |
| 3 | 2023 | 5 | |
| 4 | 2021 | 6 | |
| 5 | 2021 | 21 | |
| 6 | 2020 | 10 | |
| 7 | 2020 | 27 | |
| 8 | 2019 | 11 | |
| 9 | 2017 | 10 | |
| 10 | 2017 | 33 | |
| 11 | 2013 | 7 | |
| 12 | 2013 | 6 | |
| 13 | 2008 | 8 | |
| 14 | 2007 | 36 | |
| 15 | 2006 | 23 | |
| 16 | 2005 | 13 | |
| 17 | 2005 | 9 | |
| 18 | 2005 | 21 | |
| 19 | 1992 | 41 | |
| 20 | Frequency effects in silane plasmas for PECVD | 1992 | 3 |
About A.A. Howling
A.A. Howling is a scholar working on Electrical and Electronic Engineering, Nuclear and High Energy Physics, Aerospace Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry, having authored 114 papers that have together received 2.9k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (71 papers), Thin-Film Transistor Technologies (34 papers), Particle accelerators and beam dynamics (24 papers), Dust and Plasma Wave Phenomena (20 papers), Magnetic confinement fusion research (20 papers), Silicon Nanostructures and Photoluminescence (20 papers), Silicon and Solar Cell Technologies (18 papers) and Electrohydrodynamics and Fluid Dynamics (17 papers). The work is most often cited by research in Electrical and Electronic Engineering (2.3k citations), Atomic and Molecular Physics, and Optics (860 citations), Materials Chemistry (1.0k citations), Radiology, Nuclear Medicine and Imaging (424 citations) and Nuclear and High Energy Physics (225 citations). A.A. Howling has collaborated with scholars based in Switzerland, France and Germany. Frequent co-authors include Ch. Hollenstein, L. Sansonnens, J.-L. Dorier, Ch. Hollenstein, I. Furno, U. Kroll, Alexandra Waskow, B. Strahm, Johannes Schmitt and C. Courteille. Their work appears in journals such as Plasma Sources Science and Technology, Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Physics D Applied Physics and Plasma Physics and Controlled Fusion.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.