J.-L. Dorier

1.5k total citations
37 papers, 1.2k citations indexed

About

J.-L. Dorier is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Mechanics of Materials. According to data from OpenAlex, J.-L. Dorier has authored 37 papers receiving a total of 1.2k indexed citations (citations by other indexed papers that have themselves been cited), including 27 papers in Electrical and Electronic Engineering, 14 papers in Atomic and Molecular Physics, and Optics and 10 papers in Mechanics of Materials. Recurrent topics in J.-L. Dorier's work include Plasma Diagnostics and Applications (19 papers), Dust and Plasma Wave Phenomena (11 papers) and Thin-Film Transistor Technologies (9 papers). J.-L. Dorier is often cited by papers focused on Plasma Diagnostics and Applications (19 papers), Dust and Plasma Wave Phenomena (11 papers) and Thin-Film Transistor Technologies (9 papers). J.-L. Dorier collaborates with scholars based in Switzerland, France and Germany. J.-L. Dorier's co-authors include A.A. Howling, Ch. Hollenstein, Ch. Hollenstein, L. Sansonnens, U. Kroll, G. Barbezat, M. Gindrat, F. Finger, Joydeep Dutta and C. Courteille and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Physics D Applied Physics.

In The Last Decade

J.-L. Dorier

36 papers receiving 1.2k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J.-L. Dorier Switzerland 19 750 493 444 243 231 37 1.2k
J. Aubreton France 23 610 0.8× 634 1.3× 834 1.9× 698 2.9× 97 0.4× 69 1.5k
N. A. Azarenkov Ukraine 16 379 0.5× 331 0.7× 389 0.9× 205 0.8× 77 0.3× 126 891
R. Pantel France 23 1.6k 2.1× 379 0.8× 722 1.6× 225 0.9× 247 1.1× 98 2.1k
Gilles Cartry France 22 756 1.0× 460 0.9× 226 0.5× 259 1.1× 197 0.9× 52 1.1k
C. Hopf Germany 23 428 0.6× 1.0k 2.1× 152 0.3× 390 1.6× 168 0.7× 50 1.3k
H. Bhuyan Chile 17 453 0.6× 399 0.8× 250 0.6× 394 1.6× 78 0.3× 76 1.0k
Matthew Goeckner United States 20 1.0k 1.4× 325 0.7× 286 0.6× 739 3.0× 78 0.3× 81 1.3k
T. Tachibana Japan 19 564 0.8× 542 1.1× 328 0.7× 181 0.7× 120 0.5× 84 1.4k
J. Uhlenbusch Germany 20 657 0.9× 292 0.6× 371 0.8× 421 1.7× 80 0.3× 113 1.2k
Masanori Akazaki Japan 17 719 1.0× 448 0.9× 209 0.5× 264 1.1× 59 0.3× 136 1.1k

Countries citing papers authored by J.-L. Dorier

Since Specialization
Citations

This map shows the geographic impact of J.-L. Dorier's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J.-L. Dorier with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J.-L. Dorier more than expected).

Fields of papers citing papers by J.-L. Dorier

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J.-L. Dorier. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J.-L. Dorier. The network helps show where J.-L. Dorier may publish in the future.

Co-authorship network of co-authors of J.-L. Dorier

This figure shows the co-authorship network connecting the top 25 collaborators of J.-L. Dorier. A scholar is included among the top collaborators of J.-L. Dorier based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J.-L. Dorier. J.-L. Dorier is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ott, Peter, et al.. (2009). Effects of a Surface Dielectric Barrier Discharge on Transonic Flows Around an Airfoil. 47th AIAA Aerospace Sciences Meeting including The New Horizons Forum and Aerospace Exposition. 13 indexed citations
2.
Guittienne, Ph., et al.. (2009). Use of Low-Pressure Plasma Spraying Equipment to Produce Thin Films and Thick Coatings Using Liquid and Gaseous Precursors. Thermal spray. 83690. 741–745. 1 indexed citations
3.
Dorier, J.-L., Ph. Guittienne, Ch. Hollenstein, M. Gindrat, & A. Refke. (2008). Mechanisms of films and coatings formation from gaseous and liquid precursors with low pressure plasma spray equipment. Surface and Coatings Technology. 203(15). 2125–2130. 20 indexed citations
4.
Dorier, J.-L., et al.. (2007). Effects of high-speed airflows on a surface dielectric barrier discharge. Journal of Physics D Applied Physics. 40(6). 1733–1741. 73 indexed citations
5.
Miyazoe, Hiroyuki, et al.. (2006). In-situ process monitoring for plasma synthesis of alumina nanoparticles. Infoscience (Ecole Polytechnique Fédérale de Lausanne).
6.
Dorier, J.-L., et al.. (2003). A novel approach to interpret enthalpy probe measurements in low pressure supersonic plasma jets. Infoscience (Ecole Polytechnique Fédérale de Lausanne). 2 indexed citations
7.
Dorier, J.-L., et al.. (2001). Time-resolved imaging of anodic arc root behavior during fluctuations of a DC plasma spraying torch. IEEE Transactions on Plasma Science. 29(3). 494–501. 65 indexed citations
8.
Dorier, J.-L., et al.. (2000). Influence of External Parameters on Arc Fluctuations in a F4 DC Plasma Torch Used for Thermal Spraying. Thermal spray. 83607. 37–43. 5 indexed citations
9.
Dorier, J.-L. & N. Hilleret. (1998). Description of a dust particle detection system and measurements of particulate contamination from shock, gate valve, and ion pump under ultrahigh vacuum conditions. Review of Scientific Instruments. 69(11). 3818–3827. 4 indexed citations
10.
Hollenstein, Ch., A.A. Howling, C. Courteille, et al.. (1998). Dust Particle Diagnostics in Rf Plasma Deposition of Silicon and Silicon Oxide Films (Invited). MRS Proceedings. 507. 19 indexed citations
11.
Howling, A.A., C. Courteille, J.-L. Dorier, L. Sansonnens, & Ch. Hollenstein. (1996). From molecules to particles in silane plasmas. Pure and Applied Chemistry. 68(5). 1017–1022. 30 indexed citations
12.
Hollenstein, Ch., W. Schwarzenbach, A.A. Howling, et al.. (1996). Anionic clusters in dusty hydrocarbon and silane plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 14(2). 535–539. 66 indexed citations
13.
Hollenstein, Ch., J.-L. Dorier, Joydeep Dutta, L. Sansonnens, & A.A. Howling. (1994). Diagnostics of particle genesis and growth in RF silane plasmas by ion mass spectrometry and light scattering. Plasma Sources Science and Technology. 3(3). 278–285. 109 indexed citations
14.
Howling, A.A., L. Sansonnens, J.-L. Dorier, & Ch. Hollenstein. (1993). Negative hydrogenated silicon ion clusters as particle precursors in RF silane plasma deposition experiments. Journal of Physics D Applied Physics. 26(6). 1003–1006. 92 indexed citations
15.
Howling, A.A., J.-L. Dorier, & Ch. Hollenstein. (1993). Negative ion mass spectra and particulate formation in radio frequency silane plasma deposition experiments. Applied Physics Letters. 62(12). 1341–1343. 96 indexed citations
16.
Kroll, U., J. Meier, A.A. Howling, et al.. (1993). Influence of higher deposition temperature on a-Si:H material properties, powder formation and light-induced degradation, using the VHF (70 MHz) glow discharge technique. Journal of Non-Crystalline Solids. 164-166. 59–62. 6 indexed citations
17.
Dutta, Joydeep, U. Kroll, Arvind Shah, et al.. (1992). Dependence of intrinsic stress in hydrogenated amorphous silicon on excitation frequency in a plasma-enhanced chemical vapor deposition process. Journal of Applied Physics. 72(7). 3220–3222. 41 indexed citations
18.
Howling, A.A., J.-L. Dorier, & Ch. Hollenstein. (1992). Frequency effects in silane plasmas for PECVD. Infoscience (Ecole Polytechnique Fédérale de Lausanne). 3 indexed citations
19.
Tscharner, R., H. Keppner, S. Dubail, et al.. (1992). Fast powder-free deposition of high quality amorphous silicon solar cells. Infoscience (Ecole Polytechnique Fédérale de Lausanne). 1 indexed citations
20.
Howling, A.A., J.-L. Dorier, Ch. Hollenstein, U. Kroll, & F. Finger. (1992). Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 10(4). 1080–1085. 143 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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