Ch. Hollenstein
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- Plasma Diagnostics and Applications 37
- Thin-Film Transistor Technologies 30
- Silicon and Solar Cell Technologies 13
- Electrohydrodynamics and Fluid Dynamics 7
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- Dust and Plasma Wave Phenomena 21
- Materials Chemistry top 5%
- Silicon Nanostructures and Photoluminescence 20
- Mechanics of Materials top 5%
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- Magnetic confinement fusion research 9
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- Particle accelerators and beam dynamics 8
- Cited by
- Electrical and Electronic EngineeringAtomic and Molecular Physics, and OpticsMaterials Chemistry
- Journals
- Plasma Sources Science and Technology (13 papers)Journal of Applied Physics (11 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (8 papers)
- Partner nations
- SwitzerlandGermanyLiechtenstein
In The Last Decade
Ch. Hollenstein
85 papers receiving 2.5k citations
Peers
Comparison fields: 5 of 62
- Electrical and Electronic Engineering 1.9k
- Atomic and Molecular Physics, and Optics 849
- Materials Chemistry 1.1k
- Radiology, Nuclear Medicine and Imaging 368
- Mechanics of Materials 364
Countries citing papers authored by Ch. Hollenstein
This map shows the geographic impact of Ch. Hollenstein's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ch. Hollenstein with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ch. Hollenstein more than expected).
Fields of papers citing papers by Ch. Hollenstein
This network shows the impact of papers produced by Ch. Hollenstein. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ch. Hollenstein. The network helps show where Ch. Hollenstein may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Ch. Hollenstein, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2013 | 7 | |
| 2 | 2011 | 5 | |
| 3 | 2010 | 15 | |
| 4 | 2007 | 36 | |
| 5 | 2006 | 23 | |
| 6 | 2005 | 13 | |
| 7 | 2005 | 35 | |
| 8 | 2005 | 9 | |
| 9 | 2000 | 172 | |
| 10 | 2000 | 17 | |
| 11 | 2000 | 37 | |
| 12 | 1998 | 10 | |
| 13 | 1996 | 1 | |
| 14 | 1996 | 30 | |
| 15 | 1996 | 66 | |
| 16 | 1992 | 41 | |
| 17 | Frequency effects in silane plasmas for PECVD | 1992 | 3 |
| 18 | Fast powder-free deposition of high quality amorphous silicon solar cells | 1992 | 1 |
| 19 | 1992 | 143 | |
| 20 | 1976 | 4 |
About Ch. Hollenstein
Ch. Hollenstein is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Nuclear and High Energy Physics, Materials Chemistry and Aerospace Engineering, having authored 87 papers that have together received 2.6k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (37 papers), Thin-Film Transistor Technologies (30 papers), Dust and Plasma Wave Phenomena (21 papers), Silicon Nanostructures and Photoluminescence (20 papers), Silicon and Solar Cell Technologies (13 papers), Magnetic confinement fusion research (9 papers), Particle accelerators and beam dynamics (8 papers) and Electrohydrodynamics and Fluid Dynamics (7 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.9k citations), Atomic and Molecular Physics, and Optics (849 citations), Materials Chemistry (1.1k citations), Radiology, Nuclear Medicine and Imaging (368 citations) and Mechanics of Materials (364 citations). Ch. Hollenstein has collaborated with scholars based in Switzerland, Germany and Liechtenstein. Frequent co-authors include A.A. Howling, L. Sansonnens, J.-L. Dorier, D. Magni, U. Kroll, P. Fayet, B. Strahm, C. Courteille, F. Finger and Ph. Guittienne. Their work appears in journals such as Plasma Sources Science and Technology, Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Physics D Applied Physics and Thin Solid Films.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.