A. Inani

414 total citations
11 papers, 321 citations indexed

About

A. Inani is a scholar working on Electrical and Electronic Engineering, Hardware and Architecture and Industrial and Manufacturing Engineering. According to data from OpenAlex, A. Inani has authored 11 papers receiving a total of 321 indexed citations (citations by other indexed papers that have themselves been cited), including 11 papers in Electrical and Electronic Engineering, 4 papers in Hardware and Architecture and 1 paper in Industrial and Manufacturing Engineering. Recurrent topics in A. Inani's work include Semiconductor materials and devices (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Advancements in Semiconductor Devices and Circuit Design (5 papers). A. Inani is often cited by papers focused on Semiconductor materials and devices (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Advancements in Semiconductor Devices and Circuit Design (5 papers). A. Inani collaborates with scholars based in United States, India and Singapore. A. Inani's co-authors include V. Ramgopal Rao, Paul Vande Voorde, W. Greene, J.C.S. Woo, P. Zeitzoff, J.M.C. Stork, Min Cao, Baolei Cheng, Baohong Cheng and Jason C. S. Woo and has published in prestigious journals such as IEEE Transactions on Electron Devices, Japanese Journal of Applied Physics and Microelectronics Reliability.

In The Last Decade

A. Inani

11 papers receiving 296 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
A. Inani United States 5 313 41 28 28 15 11 321
S. C. Song United States 9 268 0.9× 39 1.0× 32 1.1× 21 0.8× 19 1.3× 37 280
Yusuke Oniki Belgium 8 257 0.8× 60 1.5× 27 1.0× 46 1.6× 17 1.1× 32 282
Shiying Xiong United States 5 419 1.3× 23 0.6× 30 1.1× 65 2.3× 8 0.5× 5 435
S. Krishnan United States 13 477 1.5× 60 1.5× 37 1.3× 19 0.7× 16 1.1× 34 499
R. Schreutelkamp Belgium 10 257 0.8× 41 1.0× 39 1.4× 51 1.8× 7 0.5× 31 276
W.W. Abadeer United States 8 321 1.0× 32 0.8× 24 0.9× 13 0.5× 18 1.2× 24 327
Guan Huei See Singapore 11 341 1.1× 19 0.5× 32 1.1× 42 1.5× 12 0.8× 44 355
A. Bajolet France 10 280 0.9× 23 0.6× 19 0.7× 21 0.8× 13 0.9× 19 288
P. Fonteneau France 11 254 0.8× 30 0.7× 12 0.4× 18 0.6× 12 0.8× 22 262
I.-C. Chen United States 9 239 0.8× 29 0.7× 29 1.0× 25 0.9× 12 0.8× 22 253

Countries citing papers authored by A. Inani

Since Specialization
Citations

This map shows the geographic impact of A. Inani's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Inani with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Inani more than expected).

Fields of papers citing papers by A. Inani

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Inani. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Inani. The network helps show where A. Inani may publish in the future.

Co-authorship network of co-authors of A. Inani

This figure shows the co-authorship network connecting the top 25 collaborators of A. Inani. A scholar is included among the top collaborators of A. Inani based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A. Inani. A. Inani is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

11 of 11 papers shown
1.
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3.
Inani, A., et al.. (2007). Accelerated testing for time dependent dielectric breakdown (TDDB) evaluation of embedded DRAM capacitors using tantalum pentoxide. Microelectronics Reliability. 47(9-11). 1429–1433. 12 indexed citations
4.
Hess, Christopher P., et al.. (2006). Yield Improvement Using a Fast Product Wafer Level Monitoring System. 417–422. 2 indexed citations
5.
Inani, A., et al.. (2006). Yield Improvement Using Fail Signature Detection Algorithm (FSDA). 225–227. 1 indexed citations
6.
Hess, Christopher P., et al.. (2006). Scribe characterization vehicle test chip for ultra fast product wafer yield monitoring. 110–115. 7 indexed citations
7.
Inani, A., V. Ramgopal Rao, Buwen Cheng, P. Zeitzoff, & Jong‐Ho Woo. (1999). Capacitance Degradation due to Fringing Field in Deep Sub-Micron MOSFETs with High-K Gate Dielectrics. DSpace (IIT Bombay). 1. 160–163. 1 indexed citations
8.
Cheng, Baohong, et al.. (1999). Channel engineering for high speed sub-1.0 V power supply deep sub-micron CMOS. DSpace (IIT Bombay). 69–70. 27 indexed citations
9.
Cheng, Baolei, Min Cao, V. Ramgopal Rao, et al.. (1999). The impact of high-κ gate dielectrics and metal gate electrodes on sub-100 nm MOSFETs. IEEE Transactions on Electron Devices. 46(7). 1537–1544. 232 indexed citations
10.
Inani, A., V. Ramgopal Rao, Baohong Cheng, & Jason C. S. Woo. (1999). Gate Stack Architecture Analysis and Channel Engineering in Deep Sub-Micron MOSFETs. Japanese Journal of Applied Physics. 38(4S). 2266–2266. 30 indexed citations
11.
Inani, A., V. Ramgopal Rao, Buwen Cheng, et al.. (1998). Performance Considerations in Using High-k Dielectrics for Deep Sub-Micron MOSFETs. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026