A. Heuberger

2.8k total citations · 1 hit paper
40 papers, 2.1k citations indexed

About

A. Heuberger is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, A. Heuberger has authored 40 papers receiving a total of 2.1k indexed citations (citations by other indexed papers that have themselves been cited), including 34 papers in Electrical and Electronic Engineering, 18 papers in Surfaces, Coatings and Films and 15 papers in Biomedical Engineering. Recurrent topics in A. Heuberger's work include Advancements in Photolithography Techniques (27 papers), Electron and X-Ray Spectroscopy Techniques (18 papers) and Advanced X-ray Imaging Techniques (6 papers). A. Heuberger is often cited by papers focused on Advancements in Photolithography Techniques (27 papers), Electron and X-Ray Spectroscopy Techniques (18 papers) and Advanced X-ray Imaging Techniques (6 papers). A. Heuberger collaborates with scholars based in Germany and Austria. A. Heuberger's co-authors include L. Csepregi, H. Seidel, H. Baumgärtel, H. Betz, W. Ehrfeld, D. Münchmeyer, Henri Michel, G. Fuhr, Rolf Hagedorn and U. Zimmermann and has published in prestigious journals such as Journal of The Electrochemical Society, IEEE Transactions on Electron Devices and Japanese Journal of Applied Physics.

In The Last Decade

A. Heuberger

38 papers receiving 1.9k citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation Layers

1990 1.3k citations H. Seidel, L. Csepregi et al. Journal of The Electrochemical Society profile →

Peers

Countries citing papers authored by A. Heuberger

Since Specialization

Citations

This map shows the geographic impact of A. Heuberger's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Heuberger with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Heuberger more than expected).

Fields of papers citing papers by A. Heuberger

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Heuberger. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Heuberger. The network helps show where A. Heuberger may publish in the future.

Co-authorship network of co-authors of A. Heuberger

This figure shows the co-authorship network connecting the top 25 collaborators of A. Heuberger. A scholar is included among the top collaborators of A. Heuberger based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A. Heuberger. A. Heuberger is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Ion Projection Lithography for Nano Patterning 1999 ·MRS Proceedings ·A. Heuberger, W.H. Bruenger	3
2	Optical DUV-lithography for high microstructures 1996 ·Microsystem Technologies ·A. Heuberger, Bernd Löchel	9
3	Fluxless flip-clip bonding for the photonic assembly: comparison between evaporated SnPb (60/40) and AuSn (80/20) solder 1996 ·(unknown), (unknown), David Pech, W. Pittroff, Andrea Preuß, Τ. Wirth, W. Österle, H. Reichl, A. Heuberger	5
4	Radio-frequency microtools for particle and live cell manipulation 1994 ·Die Naturwissenschaften ·G. Fuhr, T. M�ller, T. Schnelle, Rolf Hagedorn, Andreas Voigt, S. Fiedler, W.M. Arnold, U. Zimmermann, B. Wagner, A. Heuberger	73
5	Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation Layers breakdown → 1990 ·Journal of The Electrochemical Society ·H. Seidel, L. Csepregi, A. Heuberger, H. Baumgärtel	1260
6	SOR Lithography in West Germany 1989 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·A. Heuberger	3
7	Multi-Beam Concepts for Nanometer Devices 1989 ·Japanese Journal of Applied Physics ·(unknown), (unknown), Matthias Brünner, Karl‐Heinz Herrmann, A. Heuberger, E. Knapek, Paul Schaffer, Uwe Schnakenberg	3
8	Multi electron beam lithography: Fabrication of a control unit 1989 ·Microelectronic Engineering ·Uwe Schnakenberg, W. Benecke, (unknown), K.P. Müller, A. Heuberger, (unknown)	9
9	An e-beam comb-probe printer for nanolithography 1989 ·Microelectronic Engineering ·(unknown), (unknown), Karl‐Heinz Herrmann, A. Heuberger, E. Knapek, (unknown), H. Rose, (unknown), Gene Siegel	5
10	X-ray lithography 1988 ·Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·A. Heuberger	84
11	Open silicon stencil masks for demagnifying ion projection 1987 ·Microelectronic Engineering ·A. Heuberger, Leandro Buchmann, L. Csepregi, K.P. Müller	6
12	X-ray lithography 1986 ·Microelectronic Engineering ·A. Heuberger	19
13	Application of the simulator “XMAS” on specific problems in sub-half-micron lithography 1985 ·Microelectronic Engineering ·(unknown), H. Betz, A. Heuberger	7
14	X-ray lithography 1985 ·Microelectronic Engineering ·A. Heuberger	20
15	Investigation of X-ray exposure using plane scanning mirrors 1983 ·Nuclear Instruments and Methods in Physics Research ·(unknown), H. Betz, A. Heuberger	15
16	<title>X-Ray Lithography Using Synchrotron Radiation And Ion-Beam Shadow Printing</title> 1983 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·A. Heuberger, H. Betz	2
17	Heating and temperature-induced distortions of silicon x-ray masks 1983 ·Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·(unknown), H. Betz, A. Heuberger	20
18	Measurements on the efficiency of acoustic delay lines in view of beam lines for synchrotron radiation 1979 ·Journal of Vacuum Science and Technology ·H. Betz, (unknown), A. Heuberger	16
19	Calculation of the optimum electron energy of a dedicated storage ring for X-ray lithography 1979 ·IEEE Transactions on Electron Devices ·H. Betz, (unknown), A. Heuberger, (unknown)	7
20	Energieauflösung multiplizierender halbleiterdetektoren für weiche γ-spektroskopie bei zimmertemperaturbetrieb 1970 ·Nuclear Instruments and Methods ·Ingolf Rüge, G.P.A. Berg, A. Heuberger	0

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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