A.E. Grigorescu

597 total citations
6 papers, 466 citations indexed

About

A.E. Grigorescu is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, A.E. Grigorescu has authored 6 papers receiving a total of 466 indexed citations (citations by other indexed papers that have themselves been cited), including 6 papers in Electrical and Electronic Engineering, 4 papers in Biomedical Engineering and 1 paper in Surfaces, Coatings and Films. Recurrent topics in A.E. Grigorescu's work include Advancements in Photolithography Techniques (6 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers) and Advanced Surface Polishing Techniques (4 papers). A.E. Grigorescu is often cited by papers focused on Advancements in Photolithography Techniques (6 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers) and Advanced Surface Polishing Techniques (4 papers). A.E. Grigorescu collaborates with scholars based in Netherlands. A.E. Grigorescu's co-authors include K. HAGEN, P. Kruit, E. van der Drift and Vadim Sidorkin and has published in prestigious journals such as Nanotechnology, Microelectronic Engineering and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

In The Last Decade

A.E. Grigorescu

6 papers receiving 451 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
A.E. Grigorescu Netherlands 6 329 307 104 93 72 6 466
Nassir Mojarad Switzerland 10 344 1.0× 274 0.9× 157 1.5× 55 0.6× 55 0.8× 15 497
Kathryn Wilder United States 9 277 0.8× 306 1.0× 127 1.2× 245 2.6× 50 0.7× 10 513
C.G. Bostan Netherlands 8 183 0.6× 234 0.8× 44 0.4× 96 1.0× 109 1.5× 26 350
Vishwas J. Gadgil Netherlands 4 140 0.4× 210 0.7× 39 0.4× 56 0.6× 109 1.5× 7 318
Elizabeth Buitrago Switzerland 14 458 1.4× 297 1.0× 124 1.2× 62 0.7× 66 0.9× 35 534
W.H. Bruenger Germany 9 191 0.6× 101 0.3× 81 0.8× 85 0.9× 110 1.5× 29 321
A. C. F. Hoole United Kingdom 8 248 0.8× 192 0.6× 49 0.5× 225 2.4× 93 1.3× 13 464
M. B. Stern United States 8 201 0.6× 132 0.4× 65 0.6× 83 0.9× 62 0.9× 23 336
T. Sulzbach Germany 12 211 0.6× 221 0.7× 26 0.3× 403 4.3× 53 0.7× 28 469
Young-Joo Kim South Korea 14 219 0.7× 130 0.4× 37 0.4× 122 1.3× 217 3.0× 40 408

Countries citing papers authored by A.E. Grigorescu

Since Specialization
Citations

This map shows the geographic impact of A.E. Grigorescu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A.E. Grigorescu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A.E. Grigorescu more than expected).

Fields of papers citing papers by A.E. Grigorescu

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A.E. Grigorescu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A.E. Grigorescu. The network helps show where A.E. Grigorescu may publish in the future.

Co-authorship network of co-authors of A.E. Grigorescu

This figure shows the co-authorship network connecting the top 25 collaborators of A.E. Grigorescu. A scholar is included among the top collaborators of A.E. Grigorescu based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A.E. Grigorescu. A.E. Grigorescu is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

6 of 6 papers shown
1.
Grigorescu, A.E. & K. HAGEN. (2009). Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art. Nanotechnology. 20(29). 292001–292001. 328 indexed citations
2.
Sidorkin, Vadim, et al.. (2009). Resist thickness effects on ultra thin HSQ patterning capabilities. Microelectronic Engineering. 86(4-6). 749–751. 26 indexed citations
3.
Sidorkin, Vadim, et al.. (2008). Towards 2–10nm electron-beam lithography: A quantitative approach. Microelectronic Engineering. 85(5-6). 805–809. 10 indexed citations
4.
Grigorescu, A.E., et al.. (2007). Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 1998–2003. 18 indexed citations
5.
Grigorescu, A.E., et al.. (2007). 10nm lines and spaces written in HSQ, using electron beam lithography. Microelectronic Engineering. 84(5-8). 822–824. 72 indexed citations
6.
Grigorescu, A.E., et al.. (2007). Sub-10-nm structures written in ultra-thin HSQ resist layers using electron-beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 65194A–65194A. 12 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026