Ulf Helmersson

14.3k citations
208 papers · 12.2k indexed · 4 hit papers · h-index 55

Impact in

Papers in

Ulf Helmersson

208 papers receiving 11.8k citations

Hit Papers

High power impulse magnetron sputtering discharge 2012 · 611 citations
6111987202620002013250500750

Peers

Ulf Helmersson
Comparison fields: 5 of 82
  • Mechanics of Materials 8.7k
  • Materials Chemistry 8.7k
  • Electrical and Electronic Engineering 5.9k
  • Condensed Matter Physics 975
  • Computational Mechanics 1.7k
Replace André Anders with:
André Anders United States
J. Musil Czechia
J.‐E. Sundgren Sweden
J. E. Greene United States
E. Alves Portugal
S. Vepřek Germany
Eric Chason United States
Daniel Gall United States
Karsten Albe Germany
M. Nastasi United States
Ulf Helmersson relative to André Anders United States André Anders's profile →
Citations per field
00.5×1.5×2.4×
André Anders · 1×
Citations per year

Countries citing papers authored by Ulf Helmersson

Since Specialization
Citations

This map shows the geographic impact of Ulf Helmersson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ulf Helmersson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ulf Helmersson more than expected).

Fields of papers citing papers by Ulf Helmersson

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ulf Helmersson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ulf Helmersson. The network helps show where Ulf Helmersson may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Ulf Helmersson, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Ulf Helmersson Line = papers co-authored together Ulf Helmersson links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 202315
2 20233
3 202211
4 201616
5 201416
6 20145
7 20145
8 201258
9 2010331
10 200950
11 200975
12
The plasma parameters in a high power impulse magnetron sputtering discharge (HiPIMS)
20071
13 20041
14 2002100
15 200224
16 199939
17
High rate reactive dc magnetron sputter deposition of Al 2 O 3 films
19981
18
Electromagnetic Frequency-Temperature Compensation Techniques for High-Q Sapphire Resonators
19981
19 199213
20 19912

About Ulf Helmersson

Ulf Helmersson is a scholar working on Mechanics of Materials, Condensed Matter Physics, Materials Chemistry, Electrical and Electronic Engineering and Ceramics and Composites, having authored 208 papers that have together received 12.2k indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (115 papers), Semiconductor materials and devices (73 papers), Diamond and Carbon-based Materials Research (47 papers), Plasma Diagnostics and Applications (31 papers), Electronic and Structural Properties of Oxides (26 papers), Ferroelectric and Piezoelectric Materials (25 papers), Physics of Superconductivity and Magnetism (20 papers) and Ion-surface interactions and analysis (19 papers). The work is most often cited by research in Mechanics of Materials (8.7k citations), Materials Chemistry (8.7k citations), Electrical and Electronic Engineering (5.9k citations), Condensed Matter Physics (975 citations) and Computational Mechanics (1.7k citations). Ulf Helmersson has collaborated with scholars based in Sweden, Japan and France. Frequent co-authors include Jón Tómas Guðmundsson, Daniel Lundin, Arutiun P. Ehiasarian, Johan Böhlmark, N. Brenning, Martina Lattemann, I. Petrov, J.‐E. Sundgren, Jones Alami and V. Kouznetsov. Their work appears in journals such as Thin Solid Films, Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Surface and Coatings Technology and Plasma Sources Science and Technology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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