Johan Böhlmark

2.8k total citations · 1 hit paper
20 papers, 2.4k citations indexed

About

Johan Böhlmark is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Materials Chemistry. According to data from OpenAlex, Johan Böhlmark has authored 20 papers receiving a total of 2.4k indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Mechanics of Materials, 14 papers in Electrical and Electronic Engineering and 14 papers in Materials Chemistry. Recurrent topics in Johan Böhlmark's work include Metal and Thin Film Mechanics (19 papers), Diamond and Carbon-based Materials Research (13 papers) and Semiconductor materials and devices (8 papers). Johan Böhlmark is often cited by papers focused on Metal and Thin Film Mechanics (19 papers), Diamond and Carbon-based Materials Research (13 papers) and Semiconductor materials and devices (8 papers). Johan Böhlmark collaborates with scholars based in Sweden, Iceland and United Kingdom. Johan Böhlmark's co-authors include Ulf Helmersson, Jón Tómas Guðmundsson, Arutiun P. Ehiasarian, Martina Lattemann, Jones Alami, Per O. Å. Persson, N. Brenning, Chris Christou, Yolanda Aranda Gonzalvo and Grzegorz Greczyński and has published in prestigious journals such as Thin Solid Films, Surface and Coatings Technology and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

In The Last Decade

Johan Böhlmark

20 papers receiving 2.3k citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Ionized physical vapor deposition (IPVD): A review of technology and applications

2006 872 citations Ulf Helmersson, Martina Lattemann et al. Thin Solid Films profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Johan Böhlmark Sweden	14	2.1k	1.8k	1.2k	429	235	20	2.4k
Martina Lattemann Sweden	18	1.9k 0.9×	1.7k 1.0×	1.1k 0.9×	373 0.9×	380 1.6×	40	2.4k
Stijn Mahieu Belgium	23	1.5k 0.7×	1.3k 0.7×	1.2k 1.0×	343 0.8×	153 0.7×	50	2.3k
Tomas Nyberg Sweden	25	1.2k 0.6×	1.3k 0.7×	1.2k 1.0×	258 0.6×	231 1.0×	81	2.1k
V. Kouznetsov Sweden	4	1.3k 0.6×	1.1k 0.6×	736 0.6×	279 0.7×	127 0.5×	7	1.4k
H. Michel France	26	1.4k 0.7×	1.2k 0.7×	1.0k 0.8×	189 0.4×	422 1.8×	89	2.2k
K. Macák Sweden	12	1.2k 0.6×	1.1k 0.6×	773 0.6×	254 0.6×	119 0.5×	15	1.4k
Y. Pauleau France	26	1.2k 0.6×	1.2k 0.7×	727 0.6×	273 0.6×	444 1.9×	101	2.0k
A. Kolitsch Germany	25	756 0.4×	1.3k 0.7×	674 0.6×	307 0.7×	288 1.2×	111	1.8k
S. Kadlec Czechia	24	1.2k 0.6×	891 0.5×	626 0.5×	202 0.5×	147 0.6×	43	1.4k
J. Tendys Australia	21	1.3k 0.7×	950 0.5×	643 0.5×	406 0.9×	241 1.0×	36	1.6k

Countries citing papers authored by Johan Böhlmark

Since Specialization

Citations

This map shows the geographic impact of Johan Böhlmark's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Johan Böhlmark with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Johan Böhlmark more than expected).

Fields of papers citing papers by Johan Böhlmark

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Johan Böhlmark. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Johan Böhlmark. The network helps show where Johan Böhlmark may publish in the future.

Co-authorship network of co-authors of Johan Böhlmark

This figure shows the co-authorship network connecting the top 25 collaborators of Johan Böhlmark. A scholar is included among the top collaborators of Johan Böhlmark based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Johan Böhlmark. Johan Böhlmark is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Гришин, А. М., S. I. Khartsev, Johan Böhlmark, & M. Ahlgren. (2015). Ultra-hard AlMgB14 coatings fabricated by RF magnetron sputtering from a stoichiometric target. Journal of Experimental and Theoretical Physics Letters. 100(10). 680–687. 16 indexed citations

Böhlmark, Johan, et al.. (2011). Evaluation of Arc Evaporated Coatings on Rounded Surfaces and Sharp Edges. Materials science forum. 681. 145–150. 4 indexed citations

Broitman, Esteban, Zsolt Czigány, Grzegorz Greczyński, et al.. (2010). Industrial-scale deposition of highly adherent CNx films on steel substrates. Surface and Coatings Technology. 204(21-22). 3349–3357. 32 indexed citations

Greczyński, Grzegorz, Jens Jensen, Johan Böhlmark, & L. Hultman. (2010). Microstructure control of CrNx films during high power impulse magnetron sputtering. Surface and Coatings Technology. 205(1). 118–130. 80 indexed citations

Greczyński, Grzegorz, Johan Böhlmark, Yutao Pei, et al.. (2008). High Power Impulse Magnetron Sputtering for Industrial Applications: Deposition of Chromium Films on Inclined Surfaces. 48–52. 2 indexed citations

Briois, Pascal, et al.. (2008). La9.33Si6O26 electrolyte thin films for IT-SOFC application deposited by a HIPIMS/DC hybrid magnetron sputtering process. Ionics. 14(6). 471–476. 26 indexed citations

Böhlmark, Johan, et al.. (2006). Reactive Film Growth of TiN by Using High Power Impulse Magnetron Sputtering (HIPIMS). 334–337. 8 indexed citations

Böhlmark, Johan, et al.. (2006). Guiding the deposition flux in an ionized magnetron discharge. Thin Solid Films. 515(4). 1928–1931. 85 indexed citations

Böhlmark, Johan, Martina Lattemann, Jón Tómas Guðmundsson, et al.. (2006). The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge. Thin Solid Films. 515(4). 1522–1526. 284 indexed citations

10.

Alami, Jones, Per Eklund, Jon M. Andersson, et al.. (2006). Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering. Thin Solid Films. 515(7-8). 3434–3438. 102 indexed citations

11.

Helmersson, Ulf, Martina Lattemann, Johan Böhlmark, Arutiun P. Ehiasarian, & Jón Tómas Guðmundsson. (2006). Ionized physical vapor deposition (IPVD): A review of technology and applications. Thin Solid Films. 513(1-2). 1–24. 872 indexed citations breakdown →

12.

Böhlmark, Johan. (2006). Fundamentals of High Power Impulse Magnetron Sputtering. KTH Publication Database DiVA (KTH Royal Institute of Technology). 10 indexed citations

13.

Böhlmark, Johan, Arutiun P. Ehiasarian, Martina Lattemann, Jones Alami, & Ulf Helmersson. (2005). The Ion Energy Distributions in a High Power Impulse Magnetron Plasma. 470–473. 2 indexed citations

14.

Helmersson, Ulf, Martina Lattemann, Jones Alami, et al.. (2005). High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A Brief Review. 458–464. 10 indexed citations

15.

Alami, Jones, Jón Tómas Guðmundsson, Johan Böhlmark, Jens Birch, & Ulf Helmersson. (2005). Plasma dynamics in a highly ionized pulsed magnetron discharge. Plasma Sources Science and Technology. 14(3). 525–531. 93 indexed citations

16.

Lattemann, Martina, Arutiun P. Ehiasarian, Johan Böhlmark, Per O. Å. Persson, & Ulf Helmersson. (2005). Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel. Surface and Coatings Technology. 200(22-23). 6495–6499. 133 indexed citations

17.

Böhlmark, Johan, et al.. (2005). Spatial electron density distribution in a high-power pulsed magnetron discharge. IEEE Transactions on Plasma Science. 33(2). 346–347. 100 indexed citations

18.

Alami, Jones, et al.. (2005). Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 23(2). 278–280. 215 indexed citations

19.

Böhlmark, Johan, Ulf Helmersson, M. Vanzeeland, et al.. (2004). Measurement of the magnetic field change in a pulsed high current magnetron discharge. Plasma Sources Science and Technology. 13(4). 654–661. 62 indexed citations

20.

Böhlmark, Johan, Jones Alami, Chris Christou, Arutiun P. Ehiasarian, & Ulf Helmersson. (2004). Ionization of sputtered metals in high power pulsed magnetron sputtering. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 23(1). 18–22. 223 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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