Johan Böhlmark

20 papers receiving 2.3k citations

Hit Papers

Ionized physical vapor deposition (IPVD): A review of technology and applications 2006 · 872 citations
8722006202620122019250500750

Peers

Johan Böhlmark
Comparison fields: 5 of 46
  • Mechanics of Materials 2.1k
  • Materials Chemistry 1.8k
  • Electrical and Electronic Engineering 1.2k
  • Computational Mechanics 429
  • Electronic, Optical and Magnetic Materials 177
Replace Martina Lattemann with:
Martina Lattemann Sweden
Tomas Nyberg Sweden
K. Macák Sweden
V. Kouznetsov Sweden
Stijn Mahieu Belgium
S. Kadlec Czechia
J. Tendys Australia
A. Kolitsch Germany
Y. Pauleau France
H. Michel France
Johan Böhlmark relative to Martina Lattemann Sweden Martina Lattemann's profile →
Citations per field
00.5×1.5×
Martina Lattemann · 1×
Citations per year

Countries citing papers authored by Johan Böhlmark

Since Specialization
Citations

This map shows the geographic impact of Johan Böhlmark's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Johan Böhlmark with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Johan Böhlmark more than expected).

Fields of papers citing papers by Johan Böhlmark

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Johan Böhlmark. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Johan Böhlmark. The network helps show where Johan Böhlmark may publish in the future.

Co-authors

The 25 scholars most cited alongside Johan Böhlmark, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Johan Böhlmark Line = papers co-authored together Johan Böhlmark links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1
Ionized physical vapor deposition (IPVD): A review of technology and applications
Hit paper breakdown →
2006872
2 2006284
3 2004223
4 2005215
5 2005133
6 2006102
7 2005100
8 200593
9 200685
10 201080
11 200462
12 201032
13 200826
14 201516
15
High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A Brief Review
200510
16
Fundamentals of High Power Impulse Magnetron Sputtering
200610
17
Reactive Film Growth of TiN by Using High Power Impulse Magnetron Sputtering (HIPIMS)
20068
18 20114
19
The Ion Energy Distributions in a High Power Impulse Magnetron Plasma
20052
20
High Power Impulse Magnetron Sputtering for Industrial Applications: Deposition of Chromium Films on Inclined Surfaces
20082

About Johan Böhlmark

Johan Böhlmark is a scholar working on Mechanics of Materials, Materials Chemistry, Electrical and Electronic Engineering, Computational Mechanics and Condensed Matter Physics, having authored 20 papers that have together received 2.4k indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (19 papers), Diamond and Carbon-based Materials Research (13 papers), Semiconductor materials and devices (8 papers), Plasma Diagnostics and Applications (7 papers), Ion-surface interactions and analysis (4 papers), Dust and Plasma Wave Phenomena (2 papers), Boron and Carbon Nanomaterials Research (1 paper) and High-Temperature Coating Behaviors (1 paper). The work is most often cited by research in Mechanics of Materials (2.1k citations), Materials Chemistry (1.8k citations), Electrical and Electronic Engineering (1.2k citations), Computational Mechanics (429 citations) and Electronic, Optical and Magnetic Materials (177 citations). Johan Böhlmark has collaborated with scholars based in Sweden, Iceland and United Kingdom. Frequent co-authors include Ulf Helmersson, Jón Tómas Guðmundsson, Arutiun P. Ehiasarian, Martina Lattemann, Jones Alami, Per O. Å. Persson, N. Brenning, Chris Christou, Yolanda Aranda Gonzalvo and Grzegorz Greczyński. Their work appears in journals such as Thin Solid Films, Surface and Coatings Technology, Plasma Sources Science and Technology, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Journal of Experimental and Theoretical Physics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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