Gilles Cunge

1.0k total citations
30 papers, 915 citations indexed

About

Gilles Cunge is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, Gilles Cunge has authored 30 papers receiving a total of 915 indexed citations (citations by other indexed papers that have themselves been cited), including 26 papers in Electrical and Electronic Engineering, 14 papers in Materials Chemistry and 8 papers in Mechanics of Materials. Recurrent topics in Gilles Cunge's work include Plasma Diagnostics and Applications (17 papers), Semiconductor materials and devices (10 papers) and Diamond and Carbon-based Materials Research (8 papers). Gilles Cunge is often cited by papers focused on Plasma Diagnostics and Applications (17 papers), Semiconductor materials and devices (10 papers) and Diamond and Carbon-based Materials Research (8 papers). Gilles Cunge collaborates with scholars based in France, United States and Ireland. Gilles Cunge's co-authors include Jean‐Paul Booth, Nicholas Braithwaite, O. Joubert, M. M. Turner, D. Vender, B. Crowley, N. Sadeghi, Peter Bruggeman, Nader Sadeghi and David B. Graves and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemistry of Materials.

In The Last Decade

Gilles Cunge

29 papers receiving 879 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Gilles Cunge France 17 750 323 297 195 124 30 915
E. Wagenaars United Kingdom 18 604 0.8× 185 0.6× 230 0.8× 459 2.4× 187 1.5× 68 997
O. Leroy France 13 533 0.7× 283 0.9× 170 0.6× 168 0.9× 177 1.4× 24 701
J. L. Jauberteau France 15 422 0.6× 290 0.9× 304 1.0× 154 0.8× 144 1.2× 59 689
Erik Johnson France 24 1.3k 1.7× 533 1.7× 221 0.7× 184 0.9× 339 2.7× 109 1.5k
О. В. Прошина Russia 18 771 1.0× 166 0.5× 332 1.1× 282 1.4× 154 1.2× 68 883
A. S. Kovalev Russia 17 673 0.9× 140 0.4× 281 0.9× 250 1.3× 92 0.7× 41 750
K N Firsov Russia 20 1.1k 1.4× 336 1.0× 120 0.4× 162 0.8× 306 2.5× 113 1.2k
R. Hrach Czechia 12 344 0.5× 240 0.7× 95 0.3× 119 0.6× 151 1.2× 114 575
C. Cachoncinlle France 15 346 0.5× 221 0.7× 71 0.2× 158 0.8× 148 1.2× 53 608
A. N. Goyette United States 11 360 0.5× 553 1.7× 379 1.3× 70 0.4× 214 1.7× 20 815

Countries citing papers authored by Gilles Cunge

Since Specialization
Citations

This map shows the geographic impact of Gilles Cunge's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Gilles Cunge with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Gilles Cunge more than expected).

Fields of papers citing papers by Gilles Cunge

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Gilles Cunge. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Gilles Cunge. The network helps show where Gilles Cunge may publish in the future.

Co-authorship network of co-authors of Gilles Cunge

This figure shows the co-authorship network connecting the top 25 collaborators of Gilles Cunge. A scholar is included among the top collaborators of Gilles Cunge based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Gilles Cunge. Gilles Cunge is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Iséni, Sylvain, M. Kogelschatz, Gilles Cunge, et al.. (2025). Cryogenic cyclical etching of Si using CF4 plasma passivation steps: The role of CF radicals. Applied Physics Letters. 126(3). 4 indexed citations
2.
Cunge, Gilles, et al.. (2024). PbS quantum dot thin film dry etching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(3).
3.
Pound-Lana, Gwenaelle, Camille Petit‐Etienne, Gilles Cunge, et al.. (2021). Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers. ACS Applied Materials & Interfaces. 13(41). 49184–49193. 14 indexed citations
4.
Cunge, Gilles, et al.. (2017). H+ ion-induced damage and etching of multilayer graphene in H2 plasmas. Journal of Applied Physics. 121(13). 17 indexed citations
5.
Cunge, Gilles, et al.. (2016). Cleaning graphene: A first quantum/classical molecular dynamics approach. Journal of Applied Physics. 119(12). 9 indexed citations
6.
Petit‐Etienne, Camille, et al.. (2016). Roughness generation during Si etching in Cl2 pulsed plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 34(4). 9 indexed citations
7.
Cunge, Gilles, et al.. (2015). Etching mechanisms of graphene nanoribbons in downstream H2plasmas: insights from molecular dynamics simulations. Journal of Physics D Applied Physics. 48(19). 195202–195202. 24 indexed citations
8.
Blanc, Romuald, F. Leverd, Maxime Darnon, et al.. (2014). Patterning of silicon nitride for CMOS gate spacer technology. III. Investigation of synchronously pulsed CH3F/O2/He plasmas. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 32(2). 16 indexed citations
9.
Tiron, Raluca, Maxime Argoud, Patricia Pimenta‐Barros, et al.. (2014). Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line. Japanese Journal of Applied Physics. 53(6S). 06JC05–06JC05. 22 indexed citations
10.
Cunge, Gilles, et al.. (2013). Ion flux and ion distribution function measurements in synchronously pulsed inductively coupled plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 31(2). 32 indexed citations
11.
Tiron, Raluca, A. Gharbi, Maxime Argoud, et al.. (2013). The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 45 indexed citations
12.
Joubert, O., Maxime Darnon, Gilles Cunge, et al.. (2012). Towards new plasma technologies for 22nm gate etch processes and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8328. 83280D–83280D. 7 indexed citations
13.
Petit‐Etienne, Camille, Maxime Darnon, Gilles Cunge, et al.. (2010). Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(5). 926–934. 60 indexed citations
14.
Chabert, Pascal, et al.. (2009). Velocity distribution function of sputtered gallium atoms during inductively coupled argon plasma treatment of a GaAs surface. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 27(2). 356–361. 5 indexed citations
15.
Cunge, Gilles, M. Kogelschatz, O. Joubert, & N. Sadeghi. (2005). Plasma–wall interactions during silicon etching processes in high-density HBr/Cl2/O2plasmas. Plasma Sources Science and Technology. 14(2). S42–S52. 45 indexed citations
16.
Macko, Peter, Gilles Cunge, & N. Sadeghi. (2001). Density of N2(X1Σg+;v= 18) molecules in a dc glow discharge measured by cavity ringdown spectroscopy at 227 nm; validity domain of the technique. Journal of Physics D Applied Physics. 34(12). 1807–1811. 27 indexed citations
17.
Cunge, Gilles, B. Crowley, D. Vender, & M. M. Turner. (2001). Anomalous skin effect and collisionless power dissipation in inductively coupled discharges. Journal of Applied Physics. 89(7). 3580–3589. 35 indexed citations
18.
Cunge, Gilles, B. Crowley, D. Vender, & M. M. Turner. (1999). Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis. Plasma Sources Science and Technology. 8(4). 576–586. 114 indexed citations
19.
Cunge, Gilles, Pascal Chabert, & Jean‐Paul Booth. (1997). Laser-induced fluorescence detection of as a primary product of Si and reactive ion etching with gas. Plasma Sources Science and Technology. 6(3). 349–360. 45 indexed citations
20.
Cunge, Gilles, Jean‐Paul Booth, & Jacques Derouard. (1996). Absolute concentration measurements by pulsed laser-induced fluorescence in low-pressure gases: allowing for saturation effects. Chemical Physics Letters. 263(5). 645–650. 41 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by E. Wagenaars Breakdown of academic impact, for papers by O. Leroy Breakdown of academic impact, for papers by J. L. Jauberteau Breakdown of academic impact, for papers by Erik Johnson Breakdown of academic impact, for papers by О. В. Прошина Breakdown of academic impact, for papers by A. S. Kovalev Breakdown of academic impact, for papers by K N Firsov Breakdown of academic impact, for papers by R. Hrach Breakdown of academic impact, for papers by C. Cachoncinlle Breakdown of academic impact, for papers by A. N. Goyette
Rankless by CCL
2026