K. Menguelti

436 total citations
24 papers, 351 citations indexed

About

K. Menguelti is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, K. Menguelti has authored 24 papers receiving a total of 351 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Electrical and Electronic Engineering, 8 papers in Biomedical Engineering and 8 papers in Materials Chemistry. Recurrent topics in K. Menguelti's work include Advancements in Photolithography Techniques (8 papers), Semiconductor materials and devices (6 papers) and Integrated Circuits and Semiconductor Failure Analysis (4 papers). K. Menguelti is often cited by papers focused on Advancements in Photolithography Techniques (8 papers), Semiconductor materials and devices (6 papers) and Integrated Circuits and Semiconductor Failure Analysis (4 papers). K. Menguelti collaborates with scholars based in Luxembourg, France and United Kingdom. K. Menguelti's co-authors include E. Pargon, O. Joubert, Marc Fouchier, M. Martin, P. Gouraud, Thorsten Lill, J. Foucher, Odette Chaix‐Pluchery, Bianca Rita Pistillo and D. Lenoble and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and The Journal of Physical Chemistry C.

In The Last Decade

K. Menguelti

24 papers receiving 346 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
K. Menguelti Luxembourg 11 289 108 106 70 49 24 351
R. Pillai United States 8 197 0.7× 93 0.9× 186 1.8× 46 0.7× 30 0.6× 21 331
M. Angyal United States 10 379 1.3× 81 0.8× 72 0.7× 238 3.4× 44 0.9× 28 456
Kiju Im South Korea 12 337 1.2× 136 1.3× 128 1.2× 30 0.4× 12 0.2× 30 398
Thierry Mourier France 9 359 1.2× 94 0.9× 50 0.5× 112 1.6× 29 0.6× 49 405
Mohd Faizol Abdullah Malaysia 10 146 0.5× 134 1.2× 196 1.8× 44 0.6× 18 0.4× 30 315
Alfredo Mameli Netherlands 12 529 1.8× 53 0.5× 384 3.6× 81 1.2× 33 0.7× 20 578
Yizhou Song China 11 231 0.8× 26 0.2× 239 2.3× 59 0.8× 32 0.7× 25 354
Lorenza Moro United States 9 363 1.3× 92 0.9× 87 0.8× 32 0.5× 13 0.3× 14 439
Stefanie Sergeant Belgium 11 172 0.6× 65 0.6× 197 1.9× 34 0.5× 11 0.2× 36 317
Fırat Es Türkiye 12 284 1.0× 209 1.9× 159 1.5× 23 0.3× 14 0.3× 27 389

Countries citing papers authored by K. Menguelti

Since Specialization
Citations

This map shows the geographic impact of K. Menguelti's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Menguelti with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Menguelti more than expected).

Fields of papers citing papers by K. Menguelti

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. Menguelti. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Menguelti. The network helps show where K. Menguelti may publish in the future.

Co-authorship network of co-authors of K. Menguelti

This figure shows the co-authorship network connecting the top 25 collaborators of K. Menguelti. A scholar is included among the top collaborators of K. Menguelti based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K. Menguelti. K. Menguelti is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Valle, Nathalie, Brahime El Adib, Stéphanie Girod, et al.. (2024). Control of Ferroelectricity in Solution‐Processed Hafnia Films Through Annealing Atmosphere. Advanced Electronic Materials. 10(8). 2 indexed citations
2.
Menguelti, K., et al.. (2024). Haze factor of silver nanowires in variable refractive index environment: experimental and simulation approaches. Nanotechnology. 35(37). 375703–375703. 1 indexed citations
3.
Rogé, Vincent, Corrado Garlisi, Petru Lunca‐Popa, et al.. (2024). SrTiO3 thin film photoanodes fabricated by combinatorial chemical beam vapour deposition: intricate connection between elemental composition and thin films' properties. Journal of Materials Chemistry A. 12(25). 15227–15239. 9 indexed citations
4.
Κωστοπούλου, Αθανασία, Konstantinos Brintakis, Emmanuel Stratakis, et al.. (2023). Investigation of Si-Coated Multiwalled Carbon Nanotubes as Potential Electrodes for Multivalent Metal-Ion Electrochemical Energy Storage Systems. The Journal of Physical Chemistry C. 127(27). 13364–13379. 5 indexed citations
5.
Garlisi, Corrado, Petru Lunca‐Popa, K. Menguelti, et al.. (2022). Widely Tuneable Composition and Crystallinity of Graded Na1+xTaO3±δ Thin Films Fabricated by Chemical Beam Vapor Deposition. Nanomaterials. 12(6). 1012–1012. 3 indexed citations
6.
Menguelti, K., et al.. (2022). Dry gaseous remote plasma deposition of perfluorinated material with tuneable crystallinity and hydrophobic properties. Vacuum. 202. 111190–111190. 1 indexed citations
7.
Menguelti, K., et al.. (2021). Chemical vapor deposition of CoFe2O4 micropillar arrays with enhanced magnetic properties. Journal of Alloys and Compounds. 890. 161758–161758. 11 indexed citations
8.
Menguelti, K., Olivier Bouton, Petru Lunca‐Popa, et al.. (2021). Spray Deposition of Silver Nanowires on Large Area Substrates for Transparent Electrodes. ACS Applied Nano Materials. 4(2). 1126–1135. 16 indexed citations
9.
Guennou, Maël, J. Guillot, Y.H. Fleming, et al.. (2020). Controlling electrical and optical properties of zinc oxide thin films grown by thermal atomic layer deposition with oxygen gas. Results in Materials. 6. 100088–100088. 28 indexed citations
10.
Pistillo, Bianca Rita, K. Menguelti, Nicolas Desbenoît, et al.. (2016). One step deposition of PEDOT films by plasma radicals assisted polymerization via chemical vapour deposition. Journal of Materials Chemistry C. 4(24). 5617–5625. 17 indexed citations
11.
Ramos, R., et al.. (2013). Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment. Journal of Applied Physics. 113(1). 10 indexed citations
12.
Bahlawane, Naoufal, et al.. (2013). Molecular layer deposition of amine-containing alucone thin films. Surface and Coatings Technology. 230. 101–105. 12 indexed citations
13.
Pargon, E., et al.. (2013). Smoothing mechanisms involved in thermal treatment for linewidth roughness reduction of 193-nm photoresist patterns. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 31(6). 61203–61203. 6 indexed citations
14.
Pargon, E., K. Menguelti, Marc Fouchier, et al.. (2012). Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy. Journal of Applied Physics. 111(8). 41 indexed citations
15.
Pargon, E., K. Menguelti, Marc Fouchier, et al.. (2012). Plasma treatment to improve linewidth roughness during gate patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8328. 83280H–83280H. 3 indexed citations
16.
Fouchier, Marc, E. Pargon, K. Menguelti, et al.. (2011). Vacuum ultra violet absorption spectroscopy of 193 nm photoresists. Applied Physics A. 105(2). 399–405. 17 indexed citations
17.
Pargon, E., et al.. (2011). HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness. Plasma Processes and Polymers. 8(12). 1184–1195. 27 indexed citations
18.
Pargon, E., et al.. (2009). Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light. Applied Physics Letters. 94(10). 39 indexed citations
19.
Pargon, E., et al.. (2009). A CD AFM study of the plasma impact on 193nm photoresist LWR: role of plasma UV and ions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7272. 72720M–72720M. 1 indexed citations
20.
Pargon, E., K. Menguelti, M. Martin, et al.. (2009). Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists. Journal of Applied Physics. 105(9). 63 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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