Minoru Toriumi

730 total citations
60 papers, 588 citations indexed

About

Minoru Toriumi is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Minoru Toriumi has authored 60 papers receiving a total of 588 indexed citations (citations by other indexed papers that have themselves been cited), including 46 papers in Electrical and Electronic Engineering, 24 papers in Biomedical Engineering and 17 papers in Surfaces, Coatings and Films. Recurrent topics in Minoru Toriumi's work include Advancements in Photolithography Techniques (39 papers), Nanofabrication and Lithography Techniques (16 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Minoru Toriumi is often cited by papers focused on Advancements in Photolithography Techniques (39 papers), Nanofabrication and Lithography Techniques (16 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Minoru Toriumi collaborates with scholars based in Japan and United States. Minoru Toriumi's co-authors include Toshiro Itani, Julius Joseph Santillan, Yoshihiko Hatano, Takahiro Kozawa, Seiichi Tagawa, Hiroshi Masuhara, Seiichi Ishikawa, Takeshi Ohfuji, Hiroaki Morimoto and Masayuki Endo and has published in prestigious journals such as The Journal of Chemical Physics, Chemistry of Materials and Journal of Materials Chemistry.

In The Last Decade

Minoru Toriumi

56 papers receiving 490 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Minoru Toriumi Japan 15 435 253 161 94 42 60 588
Lewis W. Flanagin United States 9 220 0.5× 207 0.8× 62 0.4× 93 1.0× 33 0.8× 13 399
M. V. Jouravlev South Korea 4 193 0.4× 305 1.2× 82 0.5× 228 2.4× 28 0.7× 7 463
P. Yannoulis Germany 7 218 0.5× 117 0.5× 62 0.4× 242 2.6× 38 0.9× 8 396
W Mar United States 5 287 0.7× 90 0.4× 65 0.4× 176 1.9× 16 0.4× 6 384
J. Taborski Germany 10 304 0.7× 123 0.5× 41 0.3× 270 2.9× 19 0.5× 11 454
S. A. Sardar Japan 13 283 0.7× 48 0.2× 41 0.3× 135 1.4× 18 0.4× 24 430
Christian Pruner Austria 12 146 0.3× 84 0.3× 41 0.3× 256 2.7× 20 0.5× 26 419
Toshifumi Yoshidome Japan 11 141 0.3× 98 0.4× 23 0.1× 80 0.9× 24 0.6× 44 342
Katarzyna Komorowska Poland 11 374 0.9× 111 0.4× 25 0.2× 238 2.5× 16 0.4× 50 533
James P. Bareman United States 5 199 0.5× 70 0.3× 49 0.3× 217 2.3× 42 1.0× 8 378

Countries citing papers authored by Minoru Toriumi

Since Specialization
Citations

This map shows the geographic impact of Minoru Toriumi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Minoru Toriumi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Minoru Toriumi more than expected).

Fields of papers citing papers by Minoru Toriumi

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Minoru Toriumi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Minoru Toriumi. The network helps show where Minoru Toriumi may publish in the future.

Co-authorship network of co-authors of Minoru Toriumi

This figure shows the co-authorship network connecting the top 25 collaborators of Minoru Toriumi. A scholar is included among the top collaborators of Minoru Toriumi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Minoru Toriumi. Minoru Toriumi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Toriumi, Minoru, Takayasu Kawasaki, Mitsunori Araki, Takayuki Imai, & Koichi Tsukiyama∥. (2019). Wavelength Dependence of Poly(<i>p</i>-hydroxystyrene) Ablation by Mid-Infrared Free-Electron Laser. Journal of Photopolymer Science and Technology. 32(2). 189–193.
2.
Toriumi, Minoru & Toshiro Itani. (2015). Inhomogeneity of PAGs in a hybrid-type EUV resist system studied by molecular-dynamics simulations for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 942508–942508. 7 indexed citations
3.
Toriumi, Minoru & Toshiro Itani. (2014). Inhomogeneity of PAGs in Resist Film studied by Molecular Dynamics Simulations. Journal of Photopolymer Science and Technology. 27(5). 617–622. 5 indexed citations
4.
Toriumi, Minoru. (2009). Theoretical analysis of development behavior of resist measured by QCM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72732Y–72732Y. 3 indexed citations
5.
Toriumi, Minoru, et al.. (2008). A Study of Molecular Orientation Effect in Photoresist Films. Japanese Journal of Applied Physics. 47(6S). 4936–4936. 1 indexed citations
6.
Sasaki, T., et al.. (2006). Development of fluoropolymer for 193nm immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615324–615324. 4 indexed citations
7.
Toriumi, Minoru, et al.. (2006). Diffusion mechanism of water for immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615311–615311. 8 indexed citations
8.
Itani, Toshiro, Kiyoshi Fujii, Takuji Ishikawa, et al.. (2004). Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 159–159. 5 indexed citations
9.
Ishikawa, Takuji, Meiten Koh, Hirokazu Aoyama, et al.. (2004). The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 169–169. 4 indexed citations
10.
Itani, Toshiro, et al.. (2003). Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 103–103. 4 indexed citations
11.
Nakatani, Kiyoharu, et al.. (2003). A Nonaqueous Potentiometric Titration Study of the Dissociation of t-Butyl Methacrylate-Methacrylic Acid Copolymers. Analytical Sciences. 19(5). 775–777.
12.
Shida, Naomi, et al.. (2002). 157-nm single-layer resists based on advanced fluorinated polymers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 497–497. 11 indexed citations
13.
Kodama, S., Isamu Kaneko, Naomi Shida, et al.. (2002). Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 76–76. 27 indexed citations
14.
Toriumi, Minoru, et al.. (2000). Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3328–3331. 5 indexed citations
15.
Toriumi, Minoru, et al.. (2000). Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 1056–1056. 6 indexed citations
16.
Toriumi, Minoru, Takeshi Ohfuji, Masayuki Endo, & Hiroaki Morimoto. (1999). Analysis of molecular diffusion in resist polymer films simulated by molecular dynamics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 368–368. 11 indexed citations
17.
Itaya, Akira, et al.. (1994). Laser photolytic studies on sensitizers for negative photoresists: 4,4′-diazido-3,3′-dimethoxybiphenyl in poly(methyl methacrylate) films. Journal of Materials Chemistry. 4(10). 1539–1545. 1 indexed citations
18.
19.
Toriumi, Minoru, et al.. (1988). Negative Bleaching Photoresist (BLEST) For Mid-UV Exposure. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 920. 27–27. 2 indexed citations
20.
Shinsaka, Kyoji, Hitoshi Koizumi, Noriyuki Kouchi, et al.. (1985). Fluorescence lifetimes and excitation spectra of liquid alkanes measured by means of synchrotron radiation. The Journal of Chemical Physics. 83(9). 4405–4409. 16 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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