Robert C. Wetzel

1.7k citations

30 papers · 1.4k indexed · 1 hit paper · h-index 15

Impact in

Radiation top 2%
- X-ray Spectroscopy and Fluorescence Analysis
Atomic and Molecular Physics, and Optics top 5%
- Atomic and Molecular Physics
- Advanced Chemical Physics Studies

Papers in

Spectroscopy 9
- Mass Spectrometry Techniques and Applications 7
Radiation 4

Co-authors: Robert S. Freund Todd R. Hayes R. J. Shul F. A. Baiocchi Richard F. Losee Kent D. Choquette J. P. Mannáerts M. Hong
Journals: Applied Physics Letters (5 papers)The Journal of Chemical Physics (3 papers)Physical Review A (3 papers)Journal of Electronic Materials (2 papers)IEEE Photonics Technology Letters (2 papers)
Partner nations: United States Germany Belgium

In The Last Decade

Robert C. Wetzel

30 papers receiving 1.3k citations

Hit Papers

align trajectories log scale

Absolute cross sections for electron-impact ionization of the rare-gas atoms by the fast-neutral-beam method 1987 · 344 citations

Peers

Countries citing papers authored by Robert C. Wetzel

Since Specialization

Citations

This map shows the geographic impact of Robert C. Wetzel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Robert C. Wetzel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Robert C. Wetzel more than expected).

Fields of papers citing papers by Robert C. Wetzel

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Robert C. Wetzel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Robert C. Wetzel. The network helps show where Robert C. Wetzel may publish in the future.

Co-authors

The 25 scholars most cited alongside Robert C. Wetzel, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Robert C. Wetzel Line = papers co-authored together Robert C. Wetzel links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Development of a plasma panel radiation detector Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment ·Richard D. Ball, J. R. Beene, Deeraj Kumar, Y. Benhammou, RobertMissal, J. Chapman, E. Etzion, C. Ferretti, 良浩園田, D.S. Levin, Y. Silver, R. L. Varner, Curtis Weaverdyck, Robert C. Wetzel, B. Zhou, Thomas R. Anderson, K. McKinny, E. H. Bentefour	2014	4
2	Smooth reactive ion etching of GaAs using a hydrogen plasma pretreatment Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Kent D. Choquette, R. J. Shul, A. J. Howard, D. J. Rieger, Robert S. Freund, Robert C. Wetzel	1995	8
3	In-situ process for AlGaAs compound semiconductor: Materials science and device fabrication Journal of Electronic Materials ·M. Hong, Kent D. Choquette, J. P. Mannáerts, M. Patsos, Robert S. Freund, D. Vakhshoori, S. N. G. Chu, H. S. Luftman, Robert C. Wetzel	1994	7
4	Temperature characteristics of (InAs)1/(GaAs)4 short-period superlattices quantum well laser Applied Physics Letters ·Niloy K. Dutta, Naresh Chand, J. Lopata, Robert C. Wetzel	1993	6
5	GaAs surface reconstruction obtained using a dry process Journal of Applied Physics ·Kent D. Choquette, M. Hong, H. S. Luftman, S. N. G. Chu, J. P. Mannáerts, Robert C. Wetzel, Robert S. Freund	1993	20
6	Hydrogen plasma processing of GaAs and AlGaAs Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Kent D. Choquette, Robert S. Freund, M. Hong, H. S. Luftman, S. N. G. Chu, J. P. Mannáerts, Robert C. Wetzel	1993	9
7	Hydrogen plasma removal of AlGaAs oxides before molecular beam epitaxy Applied Physics Letters ·Kent D. Choquette, M. Hong, S. N. G. Chu, H. S. Luftman, J. P. Mannáerts, Robert C. Wetzel, Robert S. Freund	1993	16
8	Removal of GaAs surface contaminants using H2 electron cyclotron resonance plasma treatment followed by Cl2 chemical etching Applied Physics Letters ·M. Hong, Robert S. Freund, Kent D. Choquette, H. S. Luftman, J. P. Mannáerts, Robert C. Wetzel	1993	15
9	Electron cyclotron resonance plasma etching using downstream magnetic confinement Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Kent D. Choquette, Robert C. Wetzel, Robert S. Freund, R. F. Kopf	1992	10
10	Performance characteristics of (InAs) ₁ /(GaAs) _n short-period superlattice quantum-well laser Electronics Letters ·Niloy K. Dutta, Navin Chand, J. Lopata, Robert C. Wetzel	1992	3
11	The Kuwait Environment and Its Effects on Electronic Materials and Components Journal of The Electrochemical Society ·R. B. Comizzoli, J. P. Franey, T. E. Graedel, G. W. Kammlott, Anne Miller, A. J. Muller, N.J. Davies, Biddhyanath Koirala, J. D. Sinclair, Robert C. Wetzel, E.S. Sproles	1992	9
12	(InAs)1/(GaAs)4 superlattices quantum-well laser Applied Physics Letters ·Niloy K. Dutta, Naresh Chand, J. Lopata, Robert C. Wetzel	1992	7
13	Fabrication, performance, and reliability of strained InGaAs QW lasers Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Naresh Chand, Niloy K. Dutta, Sung-Nee G. Chu, W. S. Hobson, J. Lopata, Robert C. Wetzel	1992	1
14	Electron cyclotron resonance plasma preparation of GaAs substrates for molecular beam epitaxy Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Kent D. Choquette, M.H. Hong, Robert S. Freund, J. P. Mannáerts, Robert C. Wetzel	1991	13
15	Measurements of electron-impact-ionization cross sections ofN2, CO,CO2, CS,S2,CS2, and metastableN2 Physical Review A ·Robert S. Freund, Robert C. Wetzel, R. J. Shul	1990	122
16	Electron impact ionization cross sections of SiF2 The Journal of Chemical Physics ·R. J. Shul, Todd R. Hayes, Robert C. Wetzel, F. A. Baiocchi, Robert S. Freund	1988	59
17	Absolute cross sections for electron-impact ionization and dissociative ionization of the SiF free radical The Journal of Chemical Physics ·Todd R. Hayes, Robert C. Wetzel, F. A. Baiocchi, Robert S. Freund	1988	54
18	Absolute cross sections for electron-impact ionization of the rare-gas atoms by the fast-neutral-beam method Physical review. A, General physics ·Robert C. Wetzel, F. A. Baiocchi, Todd R. Hayes, Robert S. Freund Hit paper breakdown →	1987	344
19	Absolute electron-impact-ionization cross-section measurements of the halogen atoms Physical review. A, General physics ·Todd R. Hayes, Robert C. Wetzel, Robert S. Freund	1987	146
20	Electron-Impact Ionization and Dissociative Ionization of the CD3and CD2Free Radicals Physical Review Letters ·F. A. Baiocchi, Robert C. Wetzel, Robert S. Freund	1984	74

About Robert C. Wetzel

Robert C. Wetzel is a scholar working on Spectroscopy, Radiation, Atomic and Molecular Physics, and Optics, Computational Mechanics and Surfaces, Coatings and Films, having authored 30 papers that have together received 1.4k indexed citations. Recurring topics across this work include Semiconductor materials and devices (10 papers), Ion-surface interactions and analysis (9 papers), Mass Spectrometry Techniques and Applications (7 papers), Semiconductor Quantum Structures and Devices (7 papers), Semiconductor Lasers and Optical Devices (6 papers), Atomic and Molecular Physics (6 papers), Plasma Diagnostics and Applications (5 papers) and Photonic and Optical Devices (4 papers). The work is most often cited by research in Radiation (248 citations), Atomic and Molecular Physics, and Optics (853 citations), Spectroscopy (409 citations), Surfaces, Coatings and Films (129 citations) and Computational Mechanics (277 citations). Robert C. Wetzel has collaborated with scholars based in United States, Germany and Belgium. Frequent co-authors include Robert S. Freund, Todd R. Hayes, R. J. Shul, F. A. Baiocchi, Richard F. Losee, Kent D. Choquette, J. P. Mannáerts, M. Hong, H. S. Luftman and S. N. G. Chu. Their work appears in journals such as Applied Physics Letters, The Journal of Chemical Physics, Physical Review A, Journal of Electronic Materials and IEEE Photonics Technology Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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