W.G. Oldham

4.5k total citations
152 papers, 3.4k citations indexed

About

W.G. Oldham is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering. According to data from OpenAlex, W.G. Oldham has authored 152 papers receiving a total of 3.4k indexed citations (citations by other indexed papers that have themselves been cited), including 126 papers in Electrical and Electronic Engineering, 26 papers in Atomic and Molecular Physics, and Optics and 24 papers in Biomedical Engineering. Recurrent topics in W.G. Oldham's work include Semiconductor materials and devices (50 papers), Advancements in Photolithography Techniques (43 papers) and Silicon and Solar Cell Technologies (26 papers). W.G. Oldham is often cited by papers focused on Semiconductor materials and devices (50 papers), Advancements in Photolithography Techniques (43 papers) and Silicon and Solar Cell Technologies (26 papers). W.G. Oldham collaborates with scholars based in United States, Italy and Germany. W.G. Oldham's co-authors include A. G. Milnes, Yves Comeau, Kenneth J. Hall, Rebecca Hancock, Andrew R. Neureuther, Yosi Shacham‐Diamand, Richard E. Schenker, P. Antognetti, Eugene E. Haller and S.S. Wong and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Water Research.

In The Last Decade

W.G. Oldham

143 papers receiving 3.1k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
W.G. Oldham United States 26 2.3k 847 714 517 342 152 3.4k
A. Goetzberger Germany 40 5.7k 2.5× 3.0k 3.5× 1.9k 2.7× 445 0.9× 281 0.8× 111 7.6k
Hai Xiao United States 42 4.8k 2.1× 1.7k 2.0× 646 0.9× 1.2k 2.4× 61 0.2× 294 6.1k
I. Balberg Israel 40 1.6k 0.7× 1.1k 1.3× 3.5k 4.9× 2.2k 4.2× 306 0.9× 147 6.7k
Stefania Castelletto Australia 36 1.6k 0.7× 1.7k 1.9× 2.4k 3.3× 1.1k 2.1× 66 0.2× 175 4.5k
Atsushi Masuda Japan 33 3.1k 1.4× 398 0.5× 1.6k 2.3× 362 0.7× 54 0.2× 287 4.2k
Ahmed AlSayed United States 24 399 0.2× 432 0.5× 1.8k 2.6× 830 1.6× 149 0.4× 80 3.3k
Yutong Li China 38 1.5k 0.7× 1.4k 1.7× 984 1.4× 772 1.5× 109 0.3× 251 4.6k
Chao Wu China 43 859 0.4× 964 1.1× 1.7k 2.3× 470 0.9× 105 0.3× 265 6.3k
Lionel Canioni France 34 829 0.4× 775 0.9× 942 1.3× 1.0k 2.0× 50 0.1× 149 3.7k
Yong Zhang United States 34 2.3k 1.0× 1.7k 2.0× 2.3k 3.2× 647 1.3× 45 0.1× 217 5.0k

Countries citing papers authored by W.G. Oldham

Since Specialization
Citations

This map shows the geographic impact of W.G. Oldham's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W.G. Oldham with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W.G. Oldham more than expected).

Fields of papers citing papers by W.G. Oldham

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W.G. Oldham. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W.G. Oldham. The network helps show where W.G. Oldham may publish in the future.

Co-authorship network of co-authors of W.G. Oldham

This figure shows the co-authorship network connecting the top 25 collaborators of W.G. Oldham. A scholar is included among the top collaborators of W.G. Oldham based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with W.G. Oldham. W.G. Oldham is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Chen, Yijian, et al.. (2004). Image optimization for maskless lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 637–637. 9 indexed citations
2.
Ting, C. H., et al.. (2003). A framework for multilevel interconnection technology. 19. 108–114.
3.
Moon, J.E., et al.. (2002). A deep-submicrometer raised source/drain LDD structure fabricated using hot-wall epitaxy. Rare & Special e-Zone (The Hong Kong University of Science and Technology). 117–121. 1 indexed citations
4.
Oldham, W.G., et al.. (2000). Phase-Lead Compensator to Improve the Transient Performance of Comb Actuators. TechConnect Briefs. 178–180. 5 indexed citations
5.
Oldham, W.G., et al.. (2000). Modeling and Control of Nanomirrors for EUV Maskless Lithography. TechConnect Briefs. 602–604. 6 indexed citations
6.
Oldham, W.G., et al.. (1998). Thermal annealing of deep ultraviolet (193 nm) induced compaction in fused silica. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3419–3421. 4 indexed citations
7.
Schenker, Richard E. & W.G. Oldham. (1997). Ultraviolet-induced densification in fused silica. Journal of Applied Physics. 82(3). 1065–1071. 75 indexed citations
8.
Raab, E. L., et al.. (1994). Analyzing deep-uv lens aberrations using aerial image and latent image metrologies.. Proc SPIE. 2197. 550–565. 1 indexed citations
9.
Neureuther, Andrew R. & W.G. Oldham. (1986). Simulation of lithography. 71–106.
10.
Young, K.K., T.Y. Chan, Chenming Hu, & W.G. Oldham. (1986). Hole Trapping and Hot-Carrier Induced Device Instability in Thin Nitride/Oxide IGFETs. Symposium on VLSI Technology. 65–66. 3 indexed citations
11.
Shacham‐Diamand, Yosi, et al.. (1986). Two-Dimensional Simulation of Glass Reflow and Silicon Oxidation. Symposium on VLSI Technology. 39–40. 5 indexed citations
12.
Chern, Jenn-Gang, W.G. Oldham, & N.W. Cheung. (1986). Electromigration in Al/Si contacts—Induced open-circuit failure. IEEE Transactions on Electron Devices. 33(9). 1256–1262. 6 indexed citations
13.
Oldham, W.G., et al.. (1985). Plararization with Spin-on-Glass/LPCVD Composite Films. Symposium on VLSI Technology. 52–53. 2 indexed citations
14.
Oldham, W.G., et al.. (1984). Development of positive photoresist. IEEE Transactions on Electron Devices. 31(12). 1730–1736. 45 indexed citations
15.
Oldham, W.G., et al.. (1980). A high resolution negative electron resist by image reversal. IEEE Electron Device Letters. 1(10). 217–219. 8 indexed citations
16.
Oldham, W.G., et al.. (1980). A MESFET model for circuit analysis. Solid-State Electronics. 23(2). 121–126. 27 indexed citations
17.
Hu, Chenming & W.G. Oldham. (1979). Carrier recombination through donors/acceptors in heavily doped silicon. Applied Physics Letters. 35(8). 636–639. 12 indexed citations
18.
Oldham, W.G.. (1977). The Fabrication of Microelectronic Circuits. Scientific American. 237(3). 110–128. 20 indexed citations
19.
Oldham, W.G.. (1972). Radiation-produced trapping effects in devices.. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information). 118. 367–72. 3 indexed citations
20.
Oldham, W.G. & A. G. Milnes. (1964). Interface states in abrupt semiconductor heterojunctions. Solid-State Electronics. 7(2). 153–165. 154 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026