Miki Moriyama

753 total citations
26 papers, 611 citations indexed

About

Miki Moriyama is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, Miki Moriyama has authored 26 papers receiving a total of 611 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 13 papers in Electronic, Optical and Magnetic Materials and 11 papers in Mechanics of Materials. Recurrent topics in Miki Moriyama's work include Semiconductor materials and devices (13 papers), Copper Interconnects and Reliability (10 papers) and Metal and Thin Film Mechanics (10 papers). Miki Moriyama is often cited by papers focused on Semiconductor materials and devices (13 papers), Copper Interconnects and Reliability (10 papers) and Metal and Thin Film Mechanics (10 papers). Miki Moriyama collaborates with scholars based in Japan, Australia and Brazil. Miki Moriyama's co-authors include Masanori Murakami, Susumu Tsukimoto, Kazuhiro Ito, Yasuo Koide, M. Tanaka, Koji Nitta, Tomoaki MORITA, Osamu Nakatsuka, Masahiro Shimada and K. Matsunaga and has published in prestigious journals such as Journal of Applied Physics, Acta Materialia and Thin Solid Films.

In The Last Decade

Miki Moriyama

24 papers receiving 581 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Miki Moriyama Japan 14 427 247 222 179 162 26 611
Atsushi Noya Japan 14 507 1.2× 341 1.4× 203 0.9× 373 2.1× 174 1.1× 74 705
R. Ratajczak Poland 17 406 1.0× 152 0.6× 479 2.2× 107 0.6× 159 1.0× 76 820
J. M. DeLucca United States 15 445 1.0× 190 0.8× 134 0.6× 104 0.6× 155 1.0× 21 597
E. K. Broadbent United States 15 551 1.3× 224 0.9× 166 0.7× 256 1.4× 341 2.1× 30 761
Brad J. Burrow United States 9 490 1.1× 285 1.2× 134 0.6× 307 1.7× 234 1.4× 12 668
J. M. Molarius Finland 14 458 1.1× 232 0.9× 392 1.8× 526 2.9× 130 0.8× 46 816
Tik Sun United States 10 369 0.9× 304 1.2× 196 0.9× 117 0.7× 169 1.0× 20 548
E. M. Zielinski United States 10 289 0.7× 363 1.5× 237 1.1× 284 1.6× 59 0.4× 27 583
R. Bensalem Algeria 14 175 0.4× 156 0.6× 169 0.8× 59 0.3× 126 0.8× 35 504
Thomas Detzel Austria 16 360 0.8× 176 0.7× 363 1.6× 331 1.8× 154 1.0× 32 850

Countries citing papers authored by Miki Moriyama

Since Specialization
Citations

This map shows the geographic impact of Miki Moriyama's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Miki Moriyama with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Miki Moriyama more than expected).

Fields of papers citing papers by Miki Moriyama

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Miki Moriyama. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Miki Moriyama. The network helps show where Miki Moriyama may publish in the future.

Co-authorship network of co-authors of Miki Moriyama

This figure shows the co-authorship network connecting the top 25 collaborators of Miki Moriyama. A scholar is included among the top collaborators of Miki Moriyama based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Miki Moriyama. Miki Moriyama is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Imanishi, Masayuki, Shigeyoshi Usami, Kosuke Murakami, et al.. (2024). Characteristics of Vertical Transistors on a GaN Substrate Fabricated via Na‐Flux Method and Enlargement of the Substrate Surpassing 6 Inches. physica status solidi (RRL) - Rapid Research Letters. 18(11). 4 indexed citations
2.
Imanishi, Masayuki, Shigeyoshi Usami, Kosuke Murakami, et al.. (2024). Characteristics of Vertical Transistors on a GaN Substrate Fabricated via Na‐Flux Method and Enlargement of the Substrate Surpassing 6 Inches. physica status solidi (RRL) - Rapid Research Letters. 18(11). 1 indexed citations
3.
Nakamura, Daisuke, Kazuyoshi Iida, Kayo Horibuchi, et al.. (2022). Mechanism and enhancement of anti-parasitic-reaction catalytic activity of tungsten-carbide-coated graphite components for the growth of bulk GaN crystals. Applied Physics Express. 15(4). 45501–45501.
4.
Hitosugi, Taro, Miki Moriyama, Ngoc Lam Huong Hoang, et al.. (2010). Properties of TiO2-based transparent conducting oxide thin films on GaN(0001) surfaces. Journal of Applied Physics. 107(5). 40 indexed citations
5.
Ito, Kazuhiro, et al.. (2005). Growth of GaN on Nitriding TiN Buffer Layers. MATERIALS TRANSACTIONS. 46(9). 1975–1978. 8 indexed citations
6.
Moriyama, Miki, Toshifumi Morita, Susumu Tsukimoto, Masahiro Shimada, & Masanori Murakami. (2005). The Effect of Target Purities on Grain Growth in Sputtered Copper Thin Films. MATERIALS TRANSACTIONS. 46(5). 1036–1041. 13 indexed citations
7.
Murakami, Masanori, Miki Moriyama, Susumu Tsukimoto, & Kazuhiro Ito. (2005). Grain Growth Mechanism of Cu Thin Films. MATERIALS TRANSACTIONS. 46(7). 1737–1740. 11 indexed citations
8.
Moriyama, Miki, et al.. (2004). The Effect of Strain Distribution on Abnormal Grain Growth in Cu Thin Films. MATERIALS TRANSACTIONS. 45(10). 3033–3038. 32 indexed citations
9.
Moriyama, Miki, et al.. (2004). Effect of Organic Additives on Formation and Growth Behavior of Micro-Void in Electroplating Copper Films. MATERIALS TRANSACTIONS. 45(11). 3172–3176. 9 indexed citations
10.
Tsukimoto, Susumu, et al.. (2004). Correlation between the electrical properties and the interfacial microstructures of TiAl-based ohmic contacts to p-type 4H-SiC. Journal of Electronic Materials. 33(5). 460–466. 62 indexed citations
11.
Nitta, Koji, et al.. (2004). Ternary TiAlGe ohmic contacts for p-type 4H-SiC. Journal of Applied Physics. 95(4). 2187–2189. 14 indexed citations
12.
Nakatsuka, Osamu, et al.. (2003). Development of Ni/Al and Ni/Ti/Al ohmic contact materials for p-type 4H-SiC. Materials Science and Engineering B. 98(3). 286–293. 74 indexed citations
13.
Shimada, Masahiro, et al.. (2003). Effects of vacuum annealing on electrical properties of GaN contacts. Journal of Electronic Materials. 32(9). 957–963. 6 indexed citations
14.
Moriyama, Miki, et al.. (2002). Correlation between microstructure and barrier properties of TiN thin films used Cu interconnects. Thin Solid Films. 416(1-2). 136–144. 65 indexed citations
15.
Moriyama, Miki, et al.. (2002). Effect of Annealing Atmosphere on Void Formation in Copper Interconnects. MATERIALS TRANSACTIONS. 43(7). 1624–1628. 18 indexed citations
16.
Arai, Takahiro, Hidekazu Sueyoshi, Yasuo Koide, Miki Moriyama, & Masanori Murakami. (2001). Development of Pt-based ohmic contact materials for p-type GaN. Journal of Applied Physics. 89(5). 2826–2831. 23 indexed citations
17.
Moriyama, Miki, et al.. (2000). . Materia Japan. 39(11). 901–908. 1 indexed citations
18.
Moriyama, Miki & Masanori Kajihara. (1998). Fast Penetration of Cu in Ni of Cu/Ni/Cu Diffusion Couples Due to Diffusion Induced Recrystallization.. ISIJ International. 38(5). 489–494. 4 indexed citations
19.
Moriyama, Miki & Masanori Kajihara. (1998). Evaluation of Driving Force and Mobility for Diffusion Induced Grain Boundary Migration in Ni(Cu) System.. ISIJ International. 38(1). 86–92.
20.
Moriyama, Miki, et al.. (1993). Growth of grain-boundary precipitates in Cu-Fe-Co bicrystals. Philosophical magazine. A/Philosophical magazine. A. Physics of condensed matter. Structure, defects and mechanical properties. 68(1). 137–149. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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