Hiroshi Hiroshima

2.5k total citations
163 papers, 2.0k citations indexed

About

Hiroshi Hiroshima is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Hiroshi Hiroshima has authored 163 papers receiving a total of 2.0k indexed citations (citations by other indexed papers that have themselves been cited), including 140 papers in Electrical and Electronic Engineering, 139 papers in Biomedical Engineering and 42 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Hiroshi Hiroshima's work include Nanofabrication and Lithography Techniques (113 papers), Advancements in Photolithography Techniques (97 papers) and Force Microscopy Techniques and Applications (34 papers). Hiroshi Hiroshima is often cited by papers focused on Nanofabrication and Lithography Techniques (113 papers), Advancements in Photolithography Techniques (97 papers) and Force Microscopy Techniques and Applications (34 papers). Hiroshi Hiroshima collaborates with scholars based in Japan, Ireland and United States. Hiroshi Hiroshima's co-authors include Masanori Komuro, Jun Taniguchi, Qing Wang, Kenta Suzuki, Shinji Matsui, Sung-Won Youn, Iwao Miyamoto, Yoshihiko Hirai, Yuichi Kurashima and Masaru Nakagawa and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Optics Express.

In The Last Decade

Hiroshi Hiroshima

154 papers receiving 1.9k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Hiroshi Hiroshima Japan 25 1.6k 1.6k 484 246 225 163 2.0k
P. Vettiger Switzerland 13 708 0.4× 644 0.4× 605 1.3× 71 0.3× 143 0.6× 31 1.4k
Elmar Platzgummer Austria 17 436 0.3× 380 0.2× 480 1.0× 163 0.7× 130 0.6× 80 1.0k
Trudo Clarysse Belgium 27 2.0k 1.3× 525 0.3× 1.4k 2.8× 70 0.3× 292 1.3× 127 2.3k
Frank Fournel France 22 1.4k 0.9× 555 0.4× 610 1.3× 29 0.1× 65 0.3× 194 1.8k
Paul Ruchhoeft United States 16 478 0.3× 417 0.3× 207 0.4× 98 0.4× 94 0.4× 59 837
A. Ronda France 26 1.4k 0.8× 880 0.6× 1.2k 2.6× 249 1.0× 428 1.9× 134 2.4k
S. Landis France 19 374 0.2× 511 0.3× 556 1.1× 84 0.3× 99 0.4× 77 999
Lynne Gignac United States 27 2.5k 1.5× 926 0.6× 584 1.2× 74 0.3× 39 0.2× 77 3.1k
M. Mühlberger Austria 20 664 0.4× 483 0.3× 605 1.3× 76 0.3× 50 0.2× 76 1.1k
P. Hudek Germany 14 548 0.3× 341 0.2× 333 0.7× 108 0.4× 75 0.3× 89 779

Countries citing papers authored by Hiroshi Hiroshima

Since Specialization
Citations

This map shows the geographic impact of Hiroshi Hiroshima's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hiroshi Hiroshima with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hiroshi Hiroshima more than expected).

Fields of papers citing papers by Hiroshi Hiroshima

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hiroshi Hiroshima. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hiroshi Hiroshima. The network helps show where Hiroshi Hiroshima may publish in the future.

Co-authorship network of co-authors of Hiroshi Hiroshima

This figure shows the co-authorship network connecting the top 25 collaborators of Hiroshi Hiroshima. A scholar is included among the top collaborators of Hiroshi Hiroshima based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hiroshi Hiroshima. Hiroshi Hiroshima is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Suzuki, Kenta, Tetsuya Ueda, Hiroshi Hiroshima, et al.. (2025). Tolerable patterning in nanoimprint lithography by one-pass breakthrough etching of residual layer and spin-on-glass. Japanese Journal of Applied Physics. 64(2). 02SP15–02SP15. 1 indexed citations
3.
4.
Suzuki, Kenta, et al.. (2024). Electrical evaluation of copper damascene interconnects based on nanoimprint lithography compared with ArF immersion lithography for back-end-of-line process. Japanese Journal of Applied Physics. 63(3). 03SP41–03SP41. 5 indexed citations
5.
Youn, Sung-Won, et al.. (2024). Development of electron beam lithography technique for large area nano structural color. Japanese Journal of Applied Physics. 63(3). 03SP06–03SP06. 1 indexed citations
6.
Suzuki, Kenta, et al.. (2018). Pt Nanogap Electrode Fabrication by Two-Layer Lift-Off UV-NIL and Nanowire Breakdown. IEEE Transactions on Nanotechnology. 17(6). 1094–1097. 2 indexed citations
7.
Ishikawa, Kumi, Yuichiro Ezoe, Tomohiro Ogawa, et al.. (2016). 12-inch X-ray optics based on MEMS process. Microsystem Technologies. 23(7). 2815–2821. 4 indexed citations
8.
Takada, Naoki, et al.. (2016). Electric characterisation of fine wires formed with capillary‐effect‐based screen‐printing. Micro & Nano Letters. 11(10). 606–610. 2 indexed citations
9.
Suzuki, Kenta, Sung-Won Youn, Qing Wang, Hiroshi Hiroshima, & Yasushiro Nishioka. (2012). Effective Linewidth Measurement of 45-nm-Half-Pitch Ultraviolet Nanoimprint Lithography Patterns by Scanning Electron Microscope Inspection and Extremely Shallow Si Etching. Japanese Journal of Applied Physics. 51(6S). 06FJ09–06FJ09. 7 indexed citations
10.
Hiroshima, Hiroshi, Qing Wang, & Sung-Won Youn. (2010). 45 nm hp line/space patterning into a thin spin coat film by UV nanoimprint based on condensation. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(6). C6M12–C6M16. 21 indexed citations
11.
Lee, Dongkeon, Harutaka Mekaru, Hiroshi Hiroshima, et al.. (2009). 3D UV-microreplication using cylindrical PDMS mold. Microsystem Technologies. 16(8-9). 1399–1411. 7 indexed citations
12.
Hiroshima, Hiroshi, et al.. (2008). Numerical study on bubble trapping in UV-nanoimprint lithography. Microelectronic Engineering. 86(4-6). 684–687. 24 indexed citations
13.
Kurashima, Yuichi, et al.. (2005). Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method. Japanese Journal of Applied Physics. 44(7S). 5617–5617. 6 indexed citations
14.
Hiroshima, Hiroshi, Yuichi Kurashima, & Masanori Komuro. (2005). Line Width Reproducibility of Photo-Nanoimprints. Japanese Journal of Applied Physics. 44(7S). 5622–5622. 4 indexed citations
15.
Tsutsumi, Toshiyuki, Kenichi Ishii, Hiroshi Hiroshima, et al.. (2002). Close Observation of the Geometrical Features of an Ultranarrow Silicon Nanowire Device. Japanese Journal of Applied Physics. 41(Part 1, No. 6B). 4419–4422. 1 indexed citations
16.
Matsui, Shinji, Hiroyuki Ishigaki, Jun‐ichi Fujita, et al.. (2002). Room Temperature Nanoimprint Technology Using Hydrogen Silsequioxane (HSQ). Japanese Journal of Applied Physics. 41(Part 1, No. 6B). 4198–4202. 41 indexed citations
17.
Tsutsumi, Toshiyuki, Kenichi Ishii, Hiroshi Hiroshima, et al.. (2000). Fabrication technology of a Si nanowire memory transistor using an inorganic electron beam resist process. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 2640–2645. 13 indexed citations
18.
Hiroshima, Hiroshi & Masanori Komuro. (1997). High Growth Rate for Slow Scanning in Electron-Beam-Induced Deposition. Japanese Journal of Applied Physics. 36(12S). 7686–7686. 16 indexed citations
19.
Komuro, Masanori & Hiroshi Hiroshima. (1997). Lateral tunnel junction produced by electron-beam-induced deposition. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(6). 2809–2815. 10 indexed citations
20.
Wada, T., et al.. (1996). SiO2/poly-Si electron beam resist process for nanofabrication. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 14(3). 1850–1854. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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