G. Gruetzner

1.4k total citations
77 papers, 1.0k citations indexed

About

G. Gruetzner is a scholar working on Biomedical Engineering, Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, G. Gruetzner has authored 77 papers receiving a total of 1.0k indexed citations (citations by other indexed papers that have themselves been cited), including 62 papers in Biomedical Engineering, 57 papers in Electrical and Electronic Engineering and 11 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in G. Gruetzner's work include Nanofabrication and Lithography Techniques (47 papers), Advancements in Photolithography Techniques (36 papers) and Microfluidic and Capillary Electrophoresis Applications (13 papers). G. Gruetzner is often cited by papers focused on Nanofabrication and Lithography Techniques (47 papers), Advancements in Photolithography Techniques (36 papers) and Microfluidic and Capillary Electrophoresis Applications (13 papers). G. Gruetzner collaborates with scholars based in Germany, Switzerland and Spain. G. Gruetzner's co-authors include K. Pfeiffer, F. Reuther, Anja Voigt, Juergen Brügger, G. Bleidießel, M. Zelsmann, Gisela Ahrens, Jouni Ahopelto, Mathias Fink and Bernd Loechel and has published in prestigious journals such as Applied Physics Letters, Advanced Functional Materials and Journal of Materials Chemistry.

In The Last Decade

G. Gruetzner

73 papers receiving 964 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
G. Gruetzner Germany 19 789 618 268 119 112 77 1.0k
K. Pfeiffer Germany 16 608 0.8× 513 0.8× 212 0.8× 92 0.8× 58 0.5× 56 781
Paul Ruchhoeft United States 16 417 0.5× 478 0.8× 207 0.8× 98 0.8× 115 1.0× 59 837
M. Mejias France 9 554 0.7× 484 0.8× 307 1.1× 141 1.2× 196 1.8× 11 963
L. Manin-Ferlazzo France 6 577 0.7× 446 0.7× 301 1.1× 140 1.2× 181 1.6× 9 938
M. Mühlberger Austria 20 483 0.6× 664 1.1× 605 2.3× 76 0.6× 190 1.7× 76 1.1k
Daniel Shir United States 14 695 0.9× 561 0.9× 204 0.8× 128 1.1× 229 2.0× 16 1.1k
Veronica Savu Switzerland 15 485 0.6× 369 0.6× 173 0.6× 55 0.5× 127 1.1× 42 683
Hong Jing Chung Singapore 13 370 0.5× 329 0.5× 437 1.6× 41 0.3× 163 1.5× 39 700
A. J. Walton United Kingdom 5 894 1.1× 465 0.8× 141 0.5× 39 0.3× 193 1.7× 13 1.1k
Satoru Shoji Japan 21 611 0.8× 309 0.5× 453 1.7× 101 0.8× 244 2.2× 43 1.0k

Countries citing papers authored by G. Gruetzner

Since Specialization
Citations

This map shows the geographic impact of G. Gruetzner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by G. Gruetzner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites G. Gruetzner more than expected).

Fields of papers citing papers by G. Gruetzner

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by G. Gruetzner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by G. Gruetzner. The network helps show where G. Gruetzner may publish in the future.

Co-authorship network of co-authors of G. Gruetzner

This figure shows the co-authorship network connecting the top 25 collaborators of G. Gruetzner. A scholar is included among the top collaborators of G. Gruetzner based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with G. Gruetzner. G. Gruetzner is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Cadarso, Víctor J., et al.. (2013). Direct imprinting of organic–inorganic hybrid materials into high aspect ratio sub-100 nm structures. Microsystem Technologies. 20(10-11). 1961–1966. 3 indexed citations
3.
Kim, Joo Yeon, K. Pfeiffer, Anja Voigt, G. Gruetzner, & Juergen Brügger. (2012). Directly fabricated multi-scale microlens arrays on a hydrophobic flat surface by a simple ink-jet printing technique. Journal of Materials Chemistry. 22(7). 3053–3053. 76 indexed citations
4.
Ingrosso, Chiara, Cristina Martin‐Olmos, Andreu Llobera, et al.. (2011). Oxide nanocrystal based nanocomposites for fabricating photoplastic AFM probes. Nanoscale. 3(11). 4632–4632. 8 indexed citations
5.
Haatainen, Tomi, Dariusz M. Jarząbek, Helmut Schift, et al.. (2011). Novel thermoplastic polymers with improved release properties for thermal NIL. Microelectronic Engineering. 88(8). 1902–1905. 13 indexed citations
6.
Kim, Joo Yeon, V. Fakhfouri, K. Pfeiffer, et al.. (2009). Direct fabrication of polymer microlens arrays having tunable optical properties using drop-on-demand ink-jet printing technology. Technical programs and proceedings. 25(1). 803–805. 1 indexed citations
7.
Ahrens, Gisela, et al.. (2008). Investigations of SU-8 removal from metallic high aspect ratio microstructures with a novel plasma technique. Microsystem Technologies. 14(9-11). 1607–1612. 19 indexed citations
8.
Reboud, Vincent, N. Kehagias, M. Zelsmann, et al.. (2008). Modification of Spontaneous Emission of (CdSe)ZnS Nanocrystals Embedded in Nanoimprinted Photonic Crystals. Journal of Nanoscience and Nanotechnology. 8(2). 535–539. 4 indexed citations
9.
Martin‐Olmos, Cristina, Andreu Llobera, Luis Guillermo Villanueva, et al.. (2008). Stress and aging minimization in photoplastic AFM probes. Microelectronic Engineering. 86(4-6). 1226–1229. 15 indexed citations
10.
Himmelhuber, Roland, K. Pfeiffer, Anna Klukowska, et al.. (2007). Innovative materials tailored for advanced micro-optic applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6478. 64780E–64780E. 5 indexed citations
11.
Kehagias, N., et al.. (2007). Embedded nano channels fabricated by non-selective reverse contact UV nanoimprint lithography technique. Microelectronic Engineering. 84(5-8). 921–924. 4 indexed citations
12.
Ingrosso, Chiara, V. Fakhfouri, Marinella Striccoli, et al.. (2007). An Epoxy Photoresist Modified by Luminescent Nanocrystals for the Fabrication of 3D High‐Aspect‐Ratio Microstructures. Advanced Functional Materials. 17(13). 2009–2017. 43 indexed citations
13.
Kehagias, N., et al.. (2005). Three-dimensional polymer structures fabricated by reversal ultraviolet-curing imprint lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 2954–2957. 12 indexed citations
14.
Reuther, F., et al.. (2005). Design of low Tg thermosets for short cycle time nanoimprint lithography. Microelectronic Engineering. 78-79. 496–502. 5 indexed citations
15.
Reuther, F., et al.. (2003). Effective baking of thick and ultra-thick photoresist layers by infrared radiation. Microelectronic Engineering. 67-68. 495–501. 12 indexed citations
16.
Zankovych, S., J. Seekamp, A. Kam, et al.. (2003). Nanoimprint lithography: an alternative nanofabrication approach. Materials Science and Engineering C. 23(1-2). 23–31. 133 indexed citations
17.
Schulz, H., et al.. (2002). Low-temperature wafer-scale warm embossing for mix and match with UV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 223–223. 2 indexed citations
18.
Reuther, F., et al.. (2000). Tailored novolak resins for advanced photoresists by a two-step procedure: new insight into the molecular structure is achieved by coupling GPC and MALDI-TOF-MS. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 464–464. 1 indexed citations
19.
Haatainen, Tomi, et al.. (2000). <title>Step and stamp imprint lithography using a commercial flip chip bonder</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3997. 874–880. 16 indexed citations
20.
Meyer, H.‐G., et al.. (1999). Nanometer patterning using ma-N 2400 series DUV negative photoresist and electron beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3676. 485–485. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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