D. Fuard

876 total citations
25 papers, 702 citations indexed

About

D. Fuard is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, D. Fuard has authored 25 papers receiving a total of 702 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 14 papers in Biomedical Engineering and 8 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in D. Fuard's work include Advancements in Photolithography Techniques (11 papers), Copper Interconnects and Reliability (8 papers) and Cellular Mechanics and Interactions (7 papers). D. Fuard is often cited by papers focused on Advancements in Photolithography Techniques (11 papers), Copper Interconnects and Reliability (8 papers) and Cellular Mechanics and Interactions (7 papers). D. Fuard collaborates with scholars based in France, United States and Switzerland. D. Fuard's co-authors include Patrick Schiavone, Tzvetelina Tzvetkova‐Chevolleau, Philippe Tracqui, S. Decossas, Jacques Ohayon, Anastasis Stephanou, O. Joubert, L. Vallier, M. Bonvalot and M. Assous and has published in prestigious journals such as Journal of Applied Physics, Biomaterials and Soft Matter.

In The Last Decade

D. Fuard

25 papers receiving 682 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
D. Fuard France	10	444	232	169	118	82	25	702
Patrick Schiavone France	11	530 1.2×	354 1.5×	148 0.9×	197 1.7×	54 0.7×	77	878
Kristen L. Mills United States	11	587 1.3×	102 0.4×	121 0.7×	85 0.7×	63 0.8×	20	731
Hirofumi Hidai Japan	15	472 1.1×	183 0.8×	63 0.4×	35 0.3×	106 1.3×	95	762
Zongguang Wang China	14	305 0.7×	121 0.5×	64 0.4×	86 0.7×	57 0.7×	34	684
John M. Maloney United States	13	453 1.0×	278 1.2×	249 1.5×	21 0.2×	49 0.6×	27	937
Thomas Fellner Germany	13	452 1.0×	140 0.6×	89 0.5×	30 0.3×	63 0.8×	22	999
Do Hyun Kang South Korea	15	528 1.2×	211 0.9×	68 0.4×	86 0.7×	24 0.3×	44	1.1k
Claudia Unger Germany	14	803 1.8×	155 0.7×	32 0.2×	34 0.3×	131 1.6×	19	1.0k
Jérôme Polesel‐Maris France	19	623 1.4×	434 1.9×	130 0.8×	99 0.8×	35 0.4×	53	1.3k
S. Decossas France	7	328 0.7×	166 0.7×	50 0.3×	55 0.5×	115 1.4×	15	631

Countries citing papers authored by D. Fuard

Since Specialization

Citations

This map shows the geographic impact of D. Fuard's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Fuard with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Fuard more than expected).

Fields of papers citing papers by D. Fuard

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Fuard. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Fuard. The network helps show where D. Fuard may publish in the future.

Co-authorship network of co-authors of D. Fuard

This figure shows the co-authorship network connecting the top 25 collaborators of D. Fuard. A scholar is included among the top collaborators of D. Fuard based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. Fuard. D. Fuard is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Tomba, Caterina, Camille Migdal, D. Fuard, Catherine Villard, & Alice Nicolas. (2022). Poly-l-lysine/Laminin Surface Coating Reverses Glial Cell Mechanosensitivity on Stiffness-Patterned Hydrogels. ACS Applied Bio Materials. 5(4). 1552–1563. 4 indexed citations

Migdal, Camille, Nicolas Bouchonville, D. Fuard, et al.. (2022). Cells on Hydrogels with Micron-Scaled Stiffness Patterns Demonstrate Local Stiffness Sensing. Nanomaterials. 12(4). 648–648. 4 indexed citations

Resende, João, et al.. (2020). Hybridization of ellipsometry and energy loss spectra from XPS for bandgap and optical constants determination in SiON thin films. Materials Chemistry and Physics. 259. 124000–124000. 10 indexed citations

Broussous, Lucile, et al.. (2014). TiN Hard Mask Cleans with SC1 Solutions, for 64nm Pitch BEOL Patterning. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 219. 209–212. 2 indexed citations

Loughian, Christelle Der, D. Fuard, Marie Courçon, et al.. (2013). Intracellular stresses in patterned cell assemblies. Soft Matter. 10(14). 2414–2423. 17 indexed citations

Fuard, D., et al.. (2013). S-Genius, a universal software platform with versatile inverse problem resolution for scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1 indexed citations

Pargon, E., K. Menguelti, Marc Fouchier, et al.. (2012). Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy. Journal of Applied Physics. 111(8). 41 indexed citations

Fuard, D., et al.. (2010). Fabrication of three-dimensional structures for the assessment of cell mechanical interactions within cell monolayers. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(6). C6K1–C6K7. 1 indexed citations

Fuard, D., et al.. (2009). Outliers detection by fuzzy classification method for model building. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7272. 72721G–72721G. 2 indexed citations

10.

Tortai, J.H., et al.. (2009). An inverse ellipsometric problem for thin film characterization: comparison of different optimization methods. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7272. 72723S–72723S. 7 indexed citations

11.

Tzvetkova‐Chevolleau, Tzvetelina, Anastasis Stephanou, D. Fuard, et al.. (2008). The motility of normal and cancer cells in response to the combined influence of the substrate rigidity and anisotropic microstructure. Biomaterials. 29(10). 1541–1551. 138 indexed citations

12.

Fuard, D., Tzvetelina Tzvetkova‐Chevolleau, S. Decossas, Philippe Tracqui, & Patrick Schiavone. (2008). Optimization of poly-di-methyl-siloxane (PDMS) substrates for studying cellular adhesion and motility. Microelectronic Engineering. 85(5-6). 1289–1293. 344 indexed citations

13.

Fuard, D., et al.. (2005). Measurement of residual thickness using scatterometry. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 3069–3074. 22 indexed citations

14.

Fuard, D. & Patrick Schiavone. (2004). Comparison of various lithography strategies for the 65- and 45-nm half pitch using simulation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 1360–1360. 1 indexed citations

15.

Fuard, D.. (2004). Assessment of the critical dimension prediction accuracy for the lumped parameter model for resist lithography. Microelectronic Engineering. 73-74. 53–58. 1 indexed citations

16.

Fuard, D.. (2004). Assessment of the critical dimension prediction accuracy for the lumped parameter model for resist lithography. Microelectronic Engineering. 73-74. 53–58. 1 indexed citations

17.

Fuard, D., O. Joubert, L. Vallier, & M. Bonvalot. (2001). High density plasma etching of low k dielectric polymers in oxygen-based chemistries. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(2). 447–455. 30 indexed citations

18.

Fuard, D., et al.. (2001). Etch mechanisms of low dielectric constant polymers in high density plasmas: Impact of charging effects on profile distortion during the etching process. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2223–2230. 32 indexed citations

19.

Joubert, O., et al.. (2000). Plasma polymerized methylsilane. III. Process optimization for 193 nm lithography applications. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(2). 793–798. 3 indexed citations

20.

Fuard, D., et al.. (1999). Optimization of Plasma Polymerized Methylsilane process for 248 and 193 nm lithography applications. Microelectronic Engineering. 46(1-4). 349–352. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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