Jiro Ryuta

401 total citations
12 papers, 298 citations indexed

About

Jiro Ryuta is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Materials Chemistry. According to data from OpenAlex, Jiro Ryuta has authored 12 papers receiving a total of 298 indexed citations (citations by other indexed papers that have themselves been cited), including 8 papers in Electrical and Electronic Engineering, 3 papers in Computational Mechanics and 3 papers in Materials Chemistry. Recurrent topics in Jiro Ryuta's work include Silicon and Solar Cell Technologies (6 papers), Semiconductor materials and devices (4 papers) and Laser Material Processing Techniques (3 papers). Jiro Ryuta is often cited by papers focused on Silicon and Solar Cell Technologies (6 papers), Semiconductor materials and devices (4 papers) and Laser Material Processing Techniques (3 papers). Jiro Ryuta collaborates with scholars based in Japan and India. Jiro Ryuta's co-authors include Y. Shimanuki, Toshiro Tanaka, Hiroyuki Kobayashi, Isao Takahashi, Hitoshi Okuda, Mikio Kishimoto and Hideyuki Kobayashi and has published in prestigious journals such as Japanese Journal of Applied Physics and MRS Proceedings.

In The Last Decade

Jiro Ryuta

12 papers receiving 251 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Jiro Ryuta Japan	8	261	127	84	52	23	12	298
Shinsuke Sadamitsu Japan	13	348 1.3×	138 1.1×	122 1.5×	54 1.0×	18 0.8×	20	376
J.F. Nijs Belgium	8	331 1.3×	97 0.8×	124 1.5×	56 1.1×	10 0.4×	13	357
M. Ohkura Japan	11	351 1.3×	123 1.0×	37 0.4×	57 1.1×	26 1.1×	50	381
Nobuo Toyokura Japan	9	289 1.1×	71 0.6×	109 1.3×	24 0.5×	26 1.1×	17	330
Ralf Jonczyk United States	7	338 1.3×	116 0.9×	148 1.8×	47 0.9×	7 0.3×	20	378
M. Hane Japan	13	422 1.6×	84 0.7×	72 0.9×	33 0.6×	17 0.7×	60	449
R. G. Mazur United States	7	268 1.0×	56 0.4×	156 1.9×	31 0.6×	31 1.3×	17	301
S. Corcoran United States	10	376 1.4×	92 0.7×	101 1.2×	82 1.6×	108 4.7×	24	410
R. Kurps Germany	12	427 1.6×	118 0.9×	202 2.4×	50 1.0×	52 2.3×	50	461
Atsushi Murakoshi Japan	11	313 1.2×	87 0.7×	100 1.2×	28 0.5×	85 3.7×	34	349

Countries citing papers authored by Jiro Ryuta

Since Specialization

Citations

This map shows the geographic impact of Jiro Ryuta's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jiro Ryuta with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jiro Ryuta more than expected).

Fields of papers citing papers by Jiro Ryuta

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jiro Ryuta. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jiro Ryuta. The network helps show where Jiro Ryuta may publish in the future.

Co-authorship network of co-authors of Jiro Ryuta

This figure shows the co-authorship network connecting the top 25 collaborators of Jiro Ryuta. A scholar is included among the top collaborators of Jiro Ryuta based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jiro Ryuta. Jiro Ryuta is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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12 of 12 papers shown

1.

Takahashi, Isao, et al.. (1995). Adsorption and Desorption of Contaminant Metals on Si Wafer Surface in SC1 Solution. MRS Proceedings. 386. 1 indexed citations

2.

Ryuta, Jiro, et al.. (1995). Effect of Native Oxide upon Formation of Amorphous SiO_x Layer at the Interface of Directly Bonded Silicon Wafers. Japanese Journal of Applied Physics. 34(2R). 425–425. 2 indexed citations

3.

Takahashi, Isao, et al.. (1993). Time-Dependent Variation of Composition of SC1 Solution. Japanese Journal of Applied Physics. 32(9A). L1183–L1183. 1 indexed citations

4.

Kobayashi, Hiroyuki, et al.. (1993). Growth of Native Oxide and Accumulation of Organic Matter on Bare Si Wafer in Air. Japanese Journal of Applied Physics. 32(8A). L1031–L1031. 12 indexed citations

5.

Takahashi, Isao, et al.. (1993). Measurement of Organic Matter on Si Wafer by Thermal Desorption Spectroscopy. Japanese Journal of Applied Physics. 32(9A). L1186–L1186. 8 indexed citations

6.

Kobayashi, Hiroyuki, et al.. (1993). Study of Si Etch Rate in Various Composition of SC1 Solution. Japanese Journal of Applied Physics. 32(1A). L45–L45. 15 indexed citations

7.

Ryuta, Jiro, et al.. (1992). Effect of Crystal Pulling Rate on Formation of Crystal-Originated “Particles” on Si Wafers. Japanese Journal of Applied Physics. 31(3B). L293–L293. 45 indexed citations

8.

Ryuta, Jiro, et al.. (1992). Adsorption and Desorption of Metallic Impurities on Si Wafer Surface in SC1 Solution. Japanese Journal of Applied Physics. 31(8R). 2338–2338. 25 indexed citations

9.

Ryuta, Jiro, et al.. (1992). Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence. Japanese Journal of Applied Physics. 31(1A). L11–L11. 18 indexed citations

10.

Ryuta, Jiro, et al.. (1992). Crystal Originated Singularities on Silicon Wafers After SC1 Cleaning. MRS Proceedings. 259. 7 indexed citations

11.

Okuda, Hitoshi, et al.. (1992). Interaction of Metallic Impurities Adsorbed on Si Wafers in SC1 Solution. MRS Proceedings. 259. 1 indexed citations

12.

Ryuta, Jiro, et al.. (1990). Crystal-Originated Singularities on Si Wafer Surface after SC1 Cleaning. Japanese Journal of Applied Physics. 29(11A). L1947–L1947. 163 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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