I. Kasko

446 total citations
31 papers, 356 citations indexed

About

I. Kasko is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry. According to data from OpenAlex, I. Kasko has authored 31 papers receiving a total of 356 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 13 papers in Atomic and Molecular Physics, and Optics and 13 papers in Materials Chemistry. Recurrent topics in I. Kasko's work include Semiconductor materials and interfaces (13 papers), Silicon and Solar Cell Technologies (13 papers) and Ion-surface interactions and analysis (7 papers). I. Kasko is often cited by papers focused on Semiconductor materials and interfaces (13 papers), Silicon and Solar Cell Technologies (13 papers) and Ion-surface interactions and analysis (7 papers). I. Kasko collaborates with scholars based in Germany, India and United States. I. Kasko's co-authors include C. Dehm, Thomas Mikolajick, N. Nagel, Walter Hartner, C. Mazuré, Markus Kastner, H. Ryssel, U. Geyer, C. U. Pinnow and M. Seibt and has published in prestigious journals such as Journal of Applied Physics, Applied Surface Science and Thin Solid Films.

In The Last Decade

I. Kasko

31 papers receiving 345 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
I. Kasko Germany 10 283 158 65 52 45 31 356
M. Gros‐Jean France 15 417 1.5× 200 1.3× 75 1.2× 52 1.0× 76 1.7× 44 492
Chih Hang Tung Singapore 7 473 1.7× 138 0.9× 71 1.1× 43 0.8× 42 0.9× 14 517
Sungho Heo South Korea 9 377 1.3× 203 1.3× 40 0.6× 36 0.7× 43 1.0× 33 440
Ho-Kyu Kang South Korea 8 349 1.2× 189 1.2× 55 0.8× 44 0.8× 77 1.7× 28 389
Chun‐Yen Chang Taiwan 13 466 1.6× 202 1.3× 70 1.1× 72 1.4× 28 0.6× 63 515
R. Liedtke Germany 10 247 0.9× 222 1.4× 56 0.9× 89 1.7× 58 1.3× 20 361
K. A. Nasyrov Russia 15 602 2.1× 329 2.1× 80 1.2× 34 0.7× 54 1.2× 20 653
Yu. N. Novikov Russia 13 617 2.2× 393 2.5× 85 1.3× 50 1.0× 46 1.0× 54 667
Boon Teik Chan Belgium 14 505 1.8× 333 2.1× 48 0.7× 142 2.7× 54 1.2× 48 621
Enric Grustan‐Gutierrez China 8 324 1.1× 241 1.5× 37 0.6× 51 1.0× 20 0.4× 16 461

Countries citing papers authored by I. Kasko

Since Specialization
Citations

This map shows the geographic impact of I. Kasko's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by I. Kasko with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites I. Kasko more than expected).

Fields of papers citing papers by I. Kasko

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by I. Kasko. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by I. Kasko. The network helps show where I. Kasko may publish in the future.

Co-authorship network of co-authors of I. Kasko

This figure shows the co-authorship network connecting the top 25 collaborators of I. Kasko. A scholar is included among the top collaborators of I. Kasko based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with I. Kasko. I. Kasko is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Mikolajick, Thomas, I. Kasko, Walter Hartner, et al.. (2004). Integration of stacked capacitor module with ultra-thin ferroelectric SrBi2Ta2O9 film for high density ferroelectric random access memory applications at low voltage operation. Thin Solid Films. 473(2). 328–334. 4 indexed citations
3.
Pinnow, C. U., I. Kasko, N. Nagel, et al.. (2002). Influence of deposition conditions on Ir/IrO2 oxygen barrier effectiveness. Journal of Applied Physics. 91(12). 9591–9597. 35 indexed citations
4.
Pinnow, C. U., I. Kasko, C. Dehm, et al.. (2001). Investigation of oxygen diffusion barrier properties of reactively sputtered iro2 thin films. Integrated ferroelectrics. 37(1-4). 29–38. 1 indexed citations
5.
Mikolajick, Thomas, C. Dehm, Walter Hartner, et al.. (2001). FeRAM technology for high density applications. Microelectronics Reliability. 41(7). 947–950. 130 indexed citations
6.
Schindler, G., Walter Hartner, I. Kasko, et al.. (2000). Low temperature process and thin SBT films for ferroelectric memory devices. Integrated ferroelectrics. 30(1-4). 235–244. 10 indexed citations
7.
Mikolajick, Thomas, et al.. (2000). An Overview of FeRAM Technology for High Density Applications. MRS Proceedings. 655. 5 indexed citations
8.
Dehm, C., et al.. (1999). Review of SrBi2Ta2O9 thin films capacitor processing. Integrated ferroelectrics. 26(1-4). 197–213. 13 indexed citations
9.
Kal, S., I. Kasko, & H. Ryssel. (1998). Noncontacting measurement of thickness of thin titanium silicide films using spectroscopic ellipsometer. IEEE Electron Device Letters. 19(4). 127–130. 5 indexed citations
10.
Kal, S., I. Kasko, & H. Ryssel. (1997). Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis. 57. 169–172. 1 indexed citations
11.
Kasko, I., et al.. (1997). Integrated process control for cluster tools using an in-line analytical module. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 18. P41–P44. 1 indexed citations
12.
Kasko, I., S. Kal, & H. Ryssel. (1997). Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis. Microelectronic Engineering. 37-38. 455–460. 8 indexed citations
13.
Bauer, Anton J., et al.. (1997). Cleaning Process Optimization in a Gate Oxide Cluster Tool Using an in-Line XPS Module. MRS Proceedings. 477. 2 indexed citations
14.
Kurmaev, E.Z., S. N. Shamin, V. R. Galakhov, & I. Kasko. (1997). Application of high energy resolved X-ray emission spectroscopy for monitoring of silicide formation in Co/SiO2/Si system. Thin Solid Films. 311(1-2). 28–32. 10 indexed citations
15.
Kal, S., I. Kasko, & H. Ryssel. (1995). Ion-beam mixed ultra-thin cobalt suicide (CoSi2) films by cobalt sputtering and rapid thermal annealing. Journal of Electronic Materials. 24(10). 1349–1355. 6 indexed citations
16.
Kal, S., I. Kasko, & H. Ryssel. (1994). Single crystal growth of Si-Ge alloy by ion implantationand sequential rapid thermal anneal. Electronics Letters. 30(3). 272–274. 1 indexed citations
17.
Kasko, I., C. Dehm, J. Gyulai, & H. Ryssel. (1994). Ion-beam mixing of Co-Si and Co-SiO 2 : A comparison between Monte Carlo simulations and experiments. Radiation effects and defects in solids. null(1). 345–352. 1 indexed citations
18.
Dehm, C., I. Kasko, & H. Ryssel. (1994). Ion-beam induced CoSi2 layers: formation and contact properties. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 84(2). 148–152. 1 indexed citations
19.
Kasko, I., C. Dehm, L. Frey, & H. Ryssel. (1993). Effect of ion-beam mixing temperature on cobalt silicide formation. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 80-81. 786–789. 11 indexed citations
20.
Gärtner, K., et al.. (1989). Laser Induced Silicide Formation. physica status solidi (a). 112(2). 747–752. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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