Hiroshi Ishiwara
- Materials Chemistry top 0.5%
- Electrical and Electronic Engineering top 0.5%
- Electronic, Optical and Magnetic Materials top 0.5%
- Biomedical Engineering top 2%
- Atomic and Molecular Physics, and Optics top 2%
- Co-authors
- Sushil Kumar SinghEisuke TokumitsuTanemasa AsanoK. MaruyamaSeijiro FurukawaByung-Eun ParkYoshihisa FujisakiY. Arimoto
- Topics
- Ferroelectric and Piezoelectric Materials (175 papers)Semiconductor materials and devices (124 papers)Multiferroics and related materials (63 papers)
- Cited by
- Electronic, Optical and Magnetic MaterialsMaterials ChemistryElectrical and Electronic Engineering
- Partner nations
- JapanSouth KoreaUnited States
In The Last Decade
Hiroshi Ishiwara
387 papers receiving 7.4k citations
Peers
Comparison fields: 5 of 72
- Materials Chemistry 5.1k
- Electrical and Electronic Engineering 4.4k
- Electronic, Optical and Magnetic Materials 2.7k
- Biomedical Engineering 1.4k
- Atomic and Molecular Physics, and Optics 1.2k
Countries citing papers authored by Hiroshi Ishiwara
This map shows the geographic impact of Hiroshi Ishiwara's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hiroshi Ishiwara with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hiroshi Ishiwara more than expected).
Fields of papers citing papers by Hiroshi Ishiwara
This network shows the impact of papers produced by Hiroshi Ishiwara. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hiroshi Ishiwara. The network helps show where Hiroshi Ishiwara may publish in the future.
Co-authorship network of co-authors of Hiroshi Ishiwara
This figure shows the co-authorship network connecting the top 25 collaborators of Hiroshi Ishiwara. A scholar is included among the top collaborators of Hiroshi Ishiwara based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hiroshi Ishiwara. Hiroshi Ishiwara is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | Adaptive-Learning Functions of Ferroelectric Field-Effect Transistors for Synaptic Device Applications | 1 |
| 2 | 141 | |
| 3 | Effect of gate insulator on the electrical properties of pentacene based organic field-effect transistors (シリコン材料・デバイス) | 2 |
| 4 | Electrical characteristics of OFETs with thin gate dielectric | 1 |
| 5 | 2 | |
| 6 | Mn置換BiFeO 3 薄膜の微構造と周波数に依存する電気特性 | 2 |
| 7 | 13 | |
| 8 | 5 | |
| 9 | 13 | |
| 10 | 53 | |
| 11 | Electrical properties of sol-gel derived BLT films on Si(100) substrates using LaAlO 3 buffer layers | 1 |
| 12 | 5 | |
| 13 | Fabrication and Characterization of 1T2C-Type Ferroelectric Memory Cell(Special Issue on Nonvolatile Memories) | 1 |
| 14 | A Model for High Frequency C-V Characteristics of Ferroelectric Capacitors | 4 |
| 15 | A Parallel Element Model for Simulating Switching Response of Ferroelectric Capacitors | 1 |
| 16 | Current Status and Prospects of FET-type Ferroelectric Memories | 6 |
| 17 | Special Issue on Advanced Memory Devices Using High-Dielectric-Constant and Ferroelectric Thin Films | 1 |
| 18 | Numerical Analysis of Metal-Ferroelectric-Semiconductor Field-Effect-Transistors (MFS-FETs) Considering Inhomogeneous Ferroelectric Polarization | 3 |
| 19 | 7 | |
| 20 | Current Status and Prospects of Ferroelectric Thin Film Devices | 0 |
About Hiroshi Ishiwara
Hiroshi Ishiwara is a scholar working on Materials Chemistry, Electronic, Optical and Magnetic Materials and Electrical and Electronic Engineering, having authored 399 papers that have together received 7.7k indexed citations. Recurring topics across this work include Ferroelectric and Piezoelectric Materials (175 papers), Semiconductor materials and devices (124 papers) and Multiferroics and related materials (63 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (2.7k citations), Materials Chemistry (5.1k citations) and Electrical and Electronic Engineering (4.4k citations). Hiroshi Ishiwara has collaborated with scholars based in Japan, South Korea and United States. Frequent co-authors include Sushil Kumar Singh, Eisuke Tokumitsu, Tanemasa Asano, K. Maruyama, Seijiro Furukawa, Byung-Eun Park, Yoshihisa Fujisaki, Seijiro Furukawa, Y. Arimoto and Koji Aizawa. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.