Eisuke Tokumitsu

3.9k citations

167 papers · 3.2k indexed · h-index 32

Impact in

Electrical and Electronic Engineering top 1%
- Semiconductor materials and devices
- Ferroelectric and Negative Capacitance Devices
- Thin-Film Transistor Technologies
- Advanced Memory and Neural Computing
Materials Chemistry top 2%
- Ferroelectric and Piezoelectric Materials
- Electronic and Structural Properties of Oxides
- ZnO doping and properties

Papers in

Electrical and Electronic Engineering 132
- Semiconductor materials and devices 76
- Ferroelectric and Negative Capacitance Devices 32
- Thin-Film Transistor Technologies 24
- Advancements in Semiconductor Devices and Circuit Design 23
- Advanced Memory and Neural Computing 18
Materials Chemistry 96
- Ferroelectric and Piezoelectric Materials 63
- Electronic and Structural Properties of Oxides 32

Co-authors: Hiroshi Ishiwara Makoto Konagai Takaaki Miyasako Kiyoshi Takahashi Takumi Yamada Takeshi Akatsuka Koki Saito Tatsuya Shimoda
Journals: Japanese Journal of Applied Physics (59 papers)Applied Physics Letters (16 papers)Journal of Applied Physics (8 papers)Integrated ferroelectrics (7 papers)Journal of Crystal Growth (6 papers)
Partner nations: Japan United States South Korea

In The Last Decade

Eisuke Tokumitsu

166 papers receiving 3.0k citations

Peers

Countries citing papers authored by Eisuke Tokumitsu

Since Specialization

Citations

This map shows the geographic impact of Eisuke Tokumitsu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Eisuke Tokumitsu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Eisuke Tokumitsu more than expected).

Fields of papers citing papers by Eisuke Tokumitsu

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Eisuke Tokumitsu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Eisuke Tokumitsu. The network helps show where Eisuke Tokumitsu may publish in the future.

Co-authors

The 25 scholars most cited alongside Eisuke Tokumitsu, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Eisuke Tokumitsu Line = papers co-authored together Eisuke Tokumitsu links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Analog Memcapacitor by Ferroelectric Capacitor and Its Application to Spiking Neuromorphic System IEEE Transactions on Electron Devices ·O. Olatunde, Chi-Chuang Wu, S. Murphy, Michihiro Shintani, Eisuke Tokumitsu, Tokiyoshi Matsuda, Hidenori Kawanishi, Yasuhiko Nakashima, Mutsumi Kimura	2024	5
2	Impact of ambient moisture on gate controllability in ferroelectric-gate field-effect transistors with bottom-gate geometry Japanese Journal of Applied Physics ·Sameh Mahmoud Ahmed Said, Takaaki Miyasako, Kudumula Bhanuprakash Reddy, Eisuke Tokumitsu	2024	2
3	Impact of CeOx layer insertion on ferroelectric properties of Hf-Zr-O films prepared by chemical solution deposition Japanese Journal of Applied Physics ·廖雨声, Taalaibek Matkerimov, Koichi Higashimine, Eisuke Tokumitsu	2023	0
4	Ferroelectric-gated variable-area capacitors with large capacitance tuning ratio using Ce-doped HfO₂ film for both gate insulator and capacitor layer Japanese Journal of Applied Physics ·Takaaki Miyasako, В. (Владимир) Пирогов, Kudumula Bhanuprakash Reddy, Masahiko Kimura, Eisuke Tokumitsu	2023	1
5	Improvement of Amorphous InGaZnO Thin-Film Transistor With Ferroelectric ZrO_x/HfZrO Gate Insulator by 2 Step Sequential Ar/O₂ Treatment IEEE Electron Device Letters ·Md Mehedi Hasan, Taalaibek Matkerimov, Md Mobaidul Islam, Ravindra Naik Bukke, Eisuke Tokumitsu, Hye‐Yong Chu, Sung Chul Kim, Jin Jang	2022	29
6	Electrical properties of ferroelectric Y-doped Hf–Zr–O thin films prepared by chemical solution deposition Japanese Journal of Applied Physics ·Keisuke Sasaki, Taalaibek Matkerimov, Manato KAWANO, Eisuke Tokumitsu	2022	6
7	High performance, amorphous InGaZnO thin-film transistors with ferroelectric ZrO2 gate insulator by one step annealing Applied Surface Science ·Md. Mehedi Hasan, Gulfan Hury, Taalaibek Matkerimov, Eisuke Tokumitsu, Hye‐Yong Chu, Sung Chul Kim, Jin Jang	2022	16
8	Enhancement of ferroelectricity in sputtered HZO thin films by catalytically generated atomic hydrogen treatment Japanese Journal of Applied Physics ·Taalaibek Matkerimov, R. D. Lough, Yuki Hara, Shinji Migita, Hiroyuki Ota, Yukinori Morita, Keisuke Ohdaira, Eisuke Tokumitsu	2022	2
9	Fabrication of Ferroelectric Gate Thin‐Film Transistors with a Lanthanum‐Doped HZO Gate Insulator and Indium‐Tin‐Oxide Channel via a Solution Process physica status solidi (RRL) - Rapid Research Letters ·Taalaibek Matkerimov, Tatsuya Murakami, Eisuke Tokumitsu	2022	4
10	Neuromorphic System Using Memcapacitors and Autonomous Local Learning IEEE Transactions on Neural Networks and Learning Systems ·Mutsumi Kimura, O. Olatunde, Fouzia Baki, H Yoshida, Shi LiFeng, Markus Effinger, J W Steadman, Eisuke Tokumitsu, Yasuhiko Nakashima	2021	14
11	A simple analysis of polarization reversal of ferroelectric capacitor demonstrating negative capacitance-like behavior Japanese Journal of Applied Physics ·Eisuke Tokumitsu	2019	6
12	Fabrication of MoS₂ thin films on oxide‐dielectric‐covered substrates by chemical solution process physica status solidi (b) ·Ramona Gleixner, Koichi Higashimine, J W Steadman, Eisuke Tokumitsu	2016	5
13	Fabrication and characterization of ferroelectric-gate thin-film transistors with an amorphous oxide semiconductor, amorphous In–Ga–Zn–O Japanese Journal of Applied Physics ·J W Steadman, Eisuke Tokumitsu	2014	17
14	Effects of Thermal Annealing on ZnO Thin-Film Transistor Characteristics and the Application of Excimer Laser Annealing in Plastic-Based ZnO Thin-Film Transistors Japanese Journal of Applied Physics ·Mitsuru Nakata, Kazushige Takechi, Toshimasa Eguchi, Eisuke Tokumitsu, Hiroshi Yamaguchi, Setsuo Kaneko	2009	17
15	Ferroelectric Split-Gate-Field-Effect-Transistors for Nonvolatile Memory Cell Array IEICE Transactions on Electronics ·Rusna S Mardini, Eisuke Tokumitsu	2004	3
16	Characterization of Sol-gel Derived Bi_ La_xTi_3O_ Films Abhishek Jha, Minoru Osada, Eisuke Tokumitsu	2002	1
17	Flexible Logic-Gate Using Ferroelectric Films Eisuke Tokumitsu, O. P. JHA, Aníbal E Borroto Nordelo	2001	1
18	Numerical Analysis of Metal-Ferroelectric-Semiconductor Field-Effect-Transistors (MFS-FETs) Considering Inhomogeneous Ferroelectric Polarization IEICE Transactions on Electronics ·T. Kamei, Eisuke Tokumitsu, Hiroshi Ishiwara	1998	3
19	Fabrication and characterization of metal-ferroelectrics-semiconductor field effect transistors using epitaxial bamgf₄ films grown on si(111) substrates Integrated ferroelectrics ·Koji Aizawa, Tomoyuki Okamoto, Eisuke Tokumitsu, M. M. Musin	1997	5
20	Electrical properties of ferroelectric-capacitor-gate si mos transistors using p(l)zt films Integrated ferroelectrics ·Eisuke Tokumitsu, Ligue Suisse contre le Cancer, Hiroshi Ishiwara	1997	7

About Eisuke Tokumitsu

Eisuke Tokumitsu is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics, and Optics and Condensed Matter Physics, having authored 167 papers that have together received 3.2k indexed citations. Recurring topics across this work include Semiconductor materials and devices (76 papers), Ferroelectric and Piezoelectric Materials (63 papers), Electronic and Structural Properties of Oxides (32 papers), Ferroelectric and Negative Capacitance Devices (32 papers), Thin-Film Transistor Technologies (24 papers), Advancements in Semiconductor Devices and Circuit Design (23 papers), Acoustic Wave Resonator Technologies (22 papers) and Advanced Memory and Neural Computing (18 papers). The work is most often cited by research in Electrical and Electronic Engineering (2.6k citations), Materials Chemistry (1.8k citations), Atomic and Molecular Physics, and Optics (817 citations), Electronic, Optical and Magnetic Materials (415 citations) and Condensed Matter Physics (258 citations). Eisuke Tokumitsu has collaborated with scholars based in Japan, United States and South Korea. Frequent co-authors include Hiroshi Ishiwara, Makoto Konagai, Takaaki Miyasako, Kiyoshi Takahashi, Takumi Yamada, Takeshi Akatsuka, Koki Saito, Tatsuya Shimoda, Kiyoshi Takahashi and Phan Trong Tue. Their work appears in journals such as Japanese Journal of Applied Physics, Applied Physics Letters, Journal of Applied Physics, Integrated ferroelectrics and Journal of Crystal Growth.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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