E. Kobeda

552 total citations
9 papers, 461 citations indexed

About

E. Kobeda is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Biomedical Engineering. According to data from OpenAlex, E. Kobeda has authored 9 papers receiving a total of 461 indexed citations (citations by other indexed papers that have themselves been cited), including 7 papers in Electrical and Electronic Engineering, 2 papers in Mechanics of Materials and 2 papers in Biomedical Engineering. Recurrent topics in E. Kobeda's work include Semiconductor materials and devices (7 papers), Silicon and Solar Cell Technologies (3 papers) and Thin-Film Transistor Technologies (3 papers). E. Kobeda is often cited by papers focused on Semiconductor materials and devices (7 papers), Silicon and Solar Cell Technologies (3 papers) and Thin-Film Transistor Technologies (3 papers). E. Kobeda collaborates with scholars based in United States. E. Kobeda's co-authors include E. A. Irene, G. Lucovsky, J. T. Fitch, M. Kellam, C. M. Osburn, S. Basavaiah, J.D. Warnock, B. Cunningham, J. Gambino and Thomas Mayer and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and MRS Bulletin.

In The Last Decade

E. Kobeda

8 papers receiving 449 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
E. Kobeda United States 7 363 226 90 89 47 9 461
E. A. Irene United States 5 286 0.8× 231 1.0× 64 0.7× 53 0.6× 40 0.9× 5 385
Paihung Pan United States 12 379 1.0× 181 0.8× 55 0.6× 80 0.9× 69 1.5× 18 456
P. Gérard France 11 259 0.7× 95 0.4× 101 1.1× 152 1.7× 37 0.8× 44 459
J.C. Bruyère France 13 608 1.7× 502 2.2× 93 1.0× 99 1.1× 52 1.1× 50 727
Dah-Bin Kao United States 7 424 1.2× 229 1.0× 235 2.6× 111 1.2× 21 0.4× 14 560
C. Doland United States 13 414 1.1× 272 1.2× 53 0.6× 173 1.9× 28 0.6× 25 554
L. Nesbit United States 10 311 0.9× 264 1.2× 115 1.3× 78 0.9× 42 0.9× 14 452
D. K. Basa India 13 550 1.5× 503 2.2× 61 0.7× 46 0.5× 57 1.2× 40 667
E. Mateeva United States 12 305 0.8× 256 1.1× 108 1.2× 274 3.1× 57 1.2× 25 525
T. Akatsu France 14 453 1.2× 131 0.6× 119 1.3× 167 1.9× 25 0.5× 20 522

Countries citing papers authored by E. Kobeda

Since Specialization
Citations

This map shows the geographic impact of E. Kobeda's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Kobeda with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Kobeda more than expected).

Fields of papers citing papers by E. Kobeda

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Kobeda. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Kobeda. The network helps show where E. Kobeda may publish in the future.

Co-authorship network of co-authors of E. Kobeda

This figure shows the co-authorship network connecting the top 25 collaborators of E. Kobeda. A scholar is included among the top collaborators of E. Kobeda based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. Kobeda. E. Kobeda is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

9 of 9 papers shown
1.
Kobeda, E., J. Gambino, G.L. Patton, et al.. (1993). Fabrication of Tungsten Local Interconnect for VLSI Bipolar Technology. Journal of The Electrochemical Society. 140(10). 3007–3013. 3 indexed citations
2.
Kobeda, E., et al.. (1992). Diffusion barrier properties of TiN films for submicron silicon bipolar technologies. Journal of Applied Physics. 72(7). 2743–2748. 9 indexed citations
3.
Kobeda, E., M. Kellam, & C. M. Osburn. (1991). Rapid Thermal Annealing of Low‐Temperature Chemical Vapor Deposited Oxides. Journal of The Electrochemical Society. 138(6). 1846–1849. 17 indexed citations
4.
Fitch, J. T., G. Lucovsky, E. Kobeda, & E. A. Irene. (1989). Effects of thermal history on stress-related properties of very thin films of thermally grown silicon dioxide. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(2). 153–162. 112 indexed citations
5.
Kobeda, E. & E. A. Irene. (1989). I ns i t u stress measurements during thermal oxidation of silicon. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(2). 163–166. 45 indexed citations
6.
Kobeda, E. & E. A. Irene. (1988). SiO2 film stress distribution during thermal oxidation of Si. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(2). 574–578. 89 indexed citations
7.
Wortman, Jennifer R., J. Narayan, Sunghyun Choi, et al.. (1987). Section News. MRS Bulletin. 12(2). 74–75. 1 indexed citations
8.
Kobeda, E. & E. A. Irene. (1987). Intrinsic SiO2 film stress measurements on thermally oxidized Si. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 5(1). 15–19. 95 indexed citations
9.
Kobeda, E. & E. A. Irene. (1986). A measurement of intrinsic SiO2 film stress resulting from low temperature thermal oxidation of Si. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 4(3). 720–722. 90 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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