D. K. Basa

747 citations

40 papers · 667 indexed · h-index 13

Ceramics and Composites top 10%
- Glass properties and applications 5
Materials Chemistry top 10%
- Silicon Nanostructures and Photoluminescence 23
- Diamond and Carbon-based Materials Research 17
- ZnO doping and properties 6
Electrical and Electronic Engineering top 10%
- Thin-Film Transistor Technologies 31
- Semiconductor materials and devices 8
- Advancements in Semiconductor Devices and Circuit Design 3
Archeology
Radiation
Computational Mechanics
- Surface Roughness and Optical Measurements 2

Co-authors: F. W. Smith Kwok Wai Mui Reed R. Corderman G. Ambrosone U. Coscia D. N. Bose V. Vijayan Tapash R. Rautray
Cited by: Ceramics and Composites Materials Chemistry Electrical and Electronic Engineering
Journals: Journal of Applied Physics (7 papers)Thin Solid Films (7 papers)Applied Surface Science (4 papers)
Partner nations: India Italy United States

In The Last Decade

D. K. Basa

39 papers receiving 648 citations

Peers

Countries citing papers authored by D. K. Basa

Since Specialization

Citations

This map shows the geographic impact of D. K. Basa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. K. Basa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. K. Basa more than expected).

Fields of papers citing papers by D. K. Basa

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. K. Basa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. K. Basa. The network helps show where D. K. Basa may publish in the future.

Co-authorship network

The 25 scholars most cited alongside D. K. Basa, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with D. K. Basa Line = papers co-authored together D. K. Basa links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	The effect of spraying parameters on micro-structural properties of WC-12%Co coating deposited on copper substrate by HVOF process AIP conference proceedings ·Ratna Remaya Diana,C. Jariwala,Mbe Lab,P.M. Raole,D. K. Basa	2015	2
2	Spectral photoconductivity of nanostructured silicon carbon films spectral photoconductivity of SiC thin films Rani Nurnawati,U. Coscia,D. K. Basa,G. Ambrosone,V. Rigato	2014	1
3	In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering Journal of Applied Physics ·E. R. Tandberg,Gülnur Aygün,D. K. Basa	2014	10
4	Evolution of structural and optical properties of nanostructured silicon carbon films deposited by plasma enhanced chemical vapour deposition Thin Solid Films ·G. Ambrosone,D. K. Basa,U. Coscia,M. Passacantando	2012	2
5	Morphological and structural modifications induced in a-Si1−x C x :H films by excimer laser annealing Applied Physics A ·U. Coscia,G. Ambrosone,D. K. Basa,E. Tresso,Angelica Chiodoni,N. Pinto,R. Murri	2010	1
6	Correlation between structural and opto-electronic properties of a-Si1−xCx:H films deposited by plasma enhanced chemical vapour deposition Thin Solid Films ·G. Ambrosone,D. K. Basa,U. Coscia,P. Rava	2010	10
7	Microcrystalline to nanocrystalline silicon phase transition in hydrogenated silicon–carbon alloy films Nanotechnology ·D. K. Basa,G. Ambrosone,U. Coscia	2008	18
8	Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon films Journal of Applied Physics ·G. Ambrosone,D. K. Basa,U. Coscia,M. Fathallah	2008	12
9	Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrix Journal of Applied Physics ·U. Coscia,G. Ambrosone,D. K. Basa	2008	35
10	Laser annealing study of PECVD deposited hydrogenated amorphous silicon carbon alloy films Applied Surface Science ·U. Coscia,G. Ambrosone,Felice Gesuele,V. Grossi,V. Parisi,蒋少鸿,D. K. Basa	2007	12
11	Study on the RF Sputtered hydrogenated amorphous silicon–germanium thin films Microelectronics Reliability ·Miklós Serényi,И Их Подверженность,Ákos Nemcsics,N.Q. Khánh,D. K. Basa,Sana Khlif	2005	1
12	EDXRF study of Indian punch-marked silver coins Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·V. Vijayan,Tapash R. Rautray,D. K. Basa	2004	13
13	Studies on the composition of ancient Indian punch‐marked silver coins X-Ray Spectrometry ·V. Vijayan,Tapash R. Rautray,P.K. Nayak,D. K. Basa	2004	17
14	Optical bandgap and quantum well model in hydrogenated amorphous silicon carbon alloy films physica status solidi (a) ·D. K. Basa	2003	4
15	Plasma enhanced growth, composition and refractive index of silicon oxynitride films Materials Letters ·Blanka Zamberlin,D. N. Bose,D. K. Basa	2002	16
16	Quantum well model and variation of the optical band gap in hydrogenated amorphous silicon carbon alloy films Solid State Communications ·D. K. Basa	2001	6
17	Effect of ammonia plasma pretreatment on the plasma enhanced chemical vapor deposited silicon nitride films Materials Letters ·Blanka Zamberlin,D. K. Basa,D. N. Bose	2001	14
18	Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride films Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Éva Libicki,D. K. Basa,D. N. Bose	2001	11
19	Optical constants of a series of amorphous hydrogenated silicon-carbon alloy films: Dependence of optical response on film microstructure and evidence for homogeneous chemical ordering Physical review. B, Condensed matter ·Kwok Wai Mui,D. K. Basa,F. W. Smith,Reed R. Corderman	1987	158
20	Optical constants of an a-Si1−xCx:H film Journal of Applied Physics ·Kwok Wai Mui,D. K. Basa,F. W. Smith	1986	20

About D. K. Basa

D. K. Basa is a scholar working on Ceramics and Composites, Materials Chemistry, Electrical and Electronic Engineering, Radiation and Archeology, having authored 40 papers that have together received 667 indexed citations. Recurring topics across this work include Thin-Film Transistor Technologies (31 papers), Silicon Nanostructures and Photoluminescence (23 papers), Diamond and Carbon-based Materials Research (17 papers), Semiconductor materials and devices (8 papers), ZnO doping and properties (6 papers), Glass properties and applications (5 papers), Advancements in Semiconductor Devices and Circuit Design (3 papers) and Surface Roughness and Optical Measurements (2 papers). The work is most often cited by research in Ceramics and Composites (65 citations), Materials Chemistry (503 citations), Electrical and Electronic Engineering (550 citations), Archeology (4 citations) and Radiation (28 citations). D. K. Basa has collaborated with scholars based in India, Italy and United States. Frequent co-authors include F. W. Smith, Kwok Wai Mui, Reed R. Corderman, G. Ambrosone, U. Coscia, D. N. Bose, V. Vijayan, Tapash R. Rautray, F. W. Smith and Antigone Marino. Their work appears in journals such as Journal of Applied Physics, Thin Solid Films, Applied Surface Science, Materials Letters and Solid State Communications.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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