D. K. Basa

747 total citations
40 papers, 667 citations indexed

About

D. K. Basa is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Ceramics and Composites. According to data from OpenAlex, D. K. Basa has authored 40 papers receiving a total of 667 indexed citations (citations by other indexed papers that have themselves been cited), including 36 papers in Electrical and Electronic Engineering, 30 papers in Materials Chemistry and 5 papers in Ceramics and Composites. Recurrent topics in D. K. Basa's work include Thin-Film Transistor Technologies (31 papers), Silicon Nanostructures and Photoluminescence (23 papers) and Diamond and Carbon-based Materials Research (17 papers). D. K. Basa is often cited by papers focused on Thin-Film Transistor Technologies (31 papers), Silicon Nanostructures and Photoluminescence (23 papers) and Diamond and Carbon-based Materials Research (17 papers). D. K. Basa collaborates with scholars based in India, Italy and United States. D. K. Basa's co-authors include F. W. Smith, Kwok Wai Mui, Reed R. Corderman, G. Ambrosone, U. Coscia, D. N. Bose, V. Vijayan, Tapash R. Rautray, F. W. Smith and Antigone Marino and has published in prestigious journals such as Physical review. B, Condensed matter, Journal of Applied Physics and Applied Surface Science.

In The Last Decade

D. K. Basa

39 papers receiving 648 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
D. K. Basa India 13 550 503 65 61 57 40 667
Masatoshi Wakagi Japan 13 484 0.9× 471 0.9× 45 0.7× 84 1.4× 43 0.8× 34 592
Gabriel Agnello United States 9 185 0.3× 260 0.5× 74 1.1× 38 0.6× 21 0.4× 26 422
H.L. Hughes United States 15 605 1.1× 221 0.4× 32 0.5× 43 0.7× 17 0.3× 62 684
G. Pfeiffer United States 11 225 0.4× 348 0.7× 99 1.5× 97 1.6× 39 0.7× 35 521
P. Ciepielewski Poland 13 175 0.3× 335 0.7× 36 0.6× 93 1.5× 18 0.3× 36 423
Tianxing Ma United States 11 340 0.6× 124 0.2× 33 0.5× 20 0.3× 19 0.3× 23 449
B. Selle Germany 15 619 1.1× 554 1.1× 11 0.2× 67 1.1× 44 0.8× 64 764
J. Strane United States 9 401 0.7× 209 0.4× 20 0.3× 67 1.1× 46 0.8× 23 531
V. Studnička Czechia 12 158 0.3× 281 0.6× 25 0.4× 29 0.5× 75 1.3× 36 397
E. A. Irene United States 5 286 0.5× 231 0.5× 28 0.4× 64 1.0× 40 0.7× 5 385

Countries citing papers authored by D. K. Basa

Since Specialization
Citations

This map shows the geographic impact of D. K. Basa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. K. Basa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. K. Basa more than expected).

Fields of papers citing papers by D. K. Basa

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. K. Basa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. K. Basa. The network helps show where D. K. Basa may publish in the future.

Co-authorship network of co-authors of D. K. Basa

This figure shows the co-authorship network connecting the top 25 collaborators of D. K. Basa. A scholar is included among the top collaborators of D. K. Basa based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. K. Basa. D. K. Basa is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Jariwala, C., et al.. (2015). The effect of spraying parameters on micro-structural properties of WC-12%Co coating deposited on copper substrate by HVOF process. AIP conference proceedings. 1675. 30057–30057. 2 indexed citations
2.
3.
Aygün, Gülnur, et al.. (2014). In-situ spectroscopic ellipsometry and structural study of HfO2 thin films deposited by radio frequency magnetron sputtering. Journal of Applied Physics. 116(8). 10 indexed citations
4.
Ambrosone, G., D. K. Basa, U. Coscia, & M. Passacantando. (2012). Evolution of structural and optical properties of nanostructured silicon carbon films deposited by plasma enhanced chemical vapour deposition. Thin Solid Films. 520(15). 4875–4879. 2 indexed citations
5.
Coscia, U., G. Ambrosone, D. K. Basa, et al.. (2010). Morphological and structural modifications induced in a-Si1−x C x :H films by excimer laser annealing. Applied Physics A. 100(4). 1163–1168. 1 indexed citations
6.
Ambrosone, G., D. K. Basa, U. Coscia, & P. Rava. (2010). Correlation between structural and opto-electronic properties of a-Si1−xCx:H films deposited by plasma enhanced chemical vapour deposition. Thin Solid Films. 518(20). 5871–5874. 10 indexed citations
7.
Basa, D. K., G. Ambrosone, & U. Coscia. (2008). Microcrystalline to nanocrystalline silicon phase transition in hydrogenated silicon–carbon alloy films. Nanotechnology. 19(41). 415706–415706. 18 indexed citations
8.
Ambrosone, G., D. K. Basa, U. Coscia, & M. Fathallah. (2008). Study on the microstructural and overall disorder in hydrogenated amorphous silicon carbon films. Journal of Applied Physics. 104(12). 12 indexed citations
9.
Coscia, U., G. Ambrosone, & D. K. Basa. (2008). Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrix. Journal of Applied Physics. 103(6). 35 indexed citations
10.
Coscia, U., G. Ambrosone, Felice Gesuele, et al.. (2007). Laser annealing study of PECVD deposited hydrogenated amorphous silicon carbon alloy films. Applied Surface Science. 254(4). 984–988. 12 indexed citations
11.
Serényi, Miklós, et al.. (2005). Study on the RF Sputtered hydrogenated amorphous silicon–germanium thin films. Microelectronics Reliability. 45(7-8). 1252–1256. 1 indexed citations
12.
Vijayan, V., Tapash R. Rautray, & D. K. Basa. (2004). EDXRF study of Indian punch-marked silver coins. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 225(3). 353–356. 13 indexed citations
13.
Vijayan, V., Tapash R. Rautray, P.K. Nayak, & D. K. Basa. (2004). Studies on the composition of ancient Indian punch‐marked silver coins. X-Ray Spectrometry. 34(2). 128–130. 17 indexed citations
14.
Basa, D. K.. (2003). Optical bandgap and quantum well model in hydrogenated amorphous silicon carbon alloy films. physica status solidi (a). 195(1). 87–92. 4 indexed citations
15.
Bose, D. N., et al.. (2002). Plasma enhanced growth, composition and refractive index of silicon oxynitride films. Materials Letters. 52(6). 417–422. 16 indexed citations
16.
Basa, D. K.. (2001). Quantum well model and variation of the optical band gap in hydrogenated amorphous silicon carbon alloy films. Solid State Communications. 118(10). 535–539. 6 indexed citations
17.
Basa, D. K., et al.. (2001). Effect of ammonia plasma pretreatment on the plasma enhanced chemical vapor deposited silicon nitride films. Materials Letters. 48(6). 336–341. 14 indexed citations
18.
Basa, D. K., et al.. (2001). Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride films. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 19(1). 41–44. 11 indexed citations
19.
Mui, Kwok Wai, D. K. Basa, F. W. Smith, & Reed R. Corderman. (1987). Optical constants of a series of amorphous hydrogenated silicon-carbon alloy films: Dependence of optical response on film microstructure and evidence for homogeneous chemical ordering. Physical review. B, Condensed matter. 35(15). 8089–8102. 158 indexed citations
20.
Mui, Kwok Wai, D. K. Basa, & F. W. Smith. (1986). Optical constants of an a-Si1−xCx:H film. Journal of Applied Physics. 59(2). 582–587. 20 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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