Paihung Pan

588 total citations
18 papers, 456 citations indexed

About

Paihung Pan is a scholar working on Electrical and Electronic Engineering, Condensed Matter Physics and Mechanics of Materials. According to data from OpenAlex, Paihung Pan has authored 18 papers receiving a total of 456 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 5 papers in Condensed Matter Physics and 5 papers in Mechanics of Materials. Recurrent topics in Paihung Pan's work include Semiconductor materials and devices (14 papers), Thin-Film Transistor Technologies (6 papers) and Metal and Thin Film Mechanics (5 papers). Paihung Pan is often cited by papers focused on Semiconductor materials and devices (14 papers), Thin-Film Transistor Technologies (6 papers) and Metal and Thin Film Mechanics (5 papers). Paihung Pan collaborates with scholars based in United States. Paihung Pan's co-authors include Van Son Nguyen, F. White, Sarah Burton, L. Nesbit, D. K. Finnemore, F. A. Schmidt, B. J. Beaudry, H. R. Shanks, A. J. Bevolo and G. C. Danielson and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Paihung Pan

17 papers receiving 437 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Paihung Pan United States	12	379	181	84	80	69	18	456
Shashank C. Deshmukh United States	7	277 0.7×	166 0.9×	89 1.1×	45 0.6×	81 1.2×	16	374
G. Quintana Argentina	10	283 0.7×	159 0.9×	40 0.5×	90 1.1×	45 0.7×	17	364
Andrew S. Alimonda United States	8	404 1.1×	189 1.0×	30 0.4×	81 1.0×	104 1.5×	12	459
K. A. Ellis United States	10	263 0.7×	143 0.8×	141 1.7×	137 1.7×	45 0.7×	18	415
Shoji Den Japan	14	295 0.8×	263 1.5×	63 0.8×	43 0.5×	95 1.4×	30	488
Satish D. Athavale United States	7	400 1.1×	291 1.6×	63 0.8×	30 0.4×	91 1.3×	10	487
Naokichi Hosokawa Japan	14	307 0.8×	220 1.2×	124 1.5×	70 0.9×	138 2.0×	37	468
Toshiaki Kusunoki Japan	13	210 0.6×	190 1.0×	93 1.1×	74 0.9×	98 1.4×	37	430
Jer‐Shen Maa Taiwan	11	260 0.7×	114 0.6×	82 1.0×	134 1.7×	41 0.6×	38	363
L. Manchanda United States	15	828 2.2×	370 2.0×	146 1.7×	150 1.9×	52 0.8×	31	912

Countries citing papers authored by Paihung Pan

Since Specialization

Citations

This map shows the geographic impact of Paihung Pan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Paihung Pan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Paihung Pan more than expected).

Fields of papers citing papers by Paihung Pan

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Paihung Pan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Paihung Pan. The network helps show where Paihung Pan may publish in the future.

Co-authorship network of co-authors of Paihung Pan

This figure shows the co-authorship network connecting the top 25 collaborators of Paihung Pan. A scholar is included among the top collaborators of Paihung Pan based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Paihung Pan. Paihung Pan is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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18 of 18 papers shown

Parries, P., Paihung Pan, W. Cote, et al.. (2003). A buried-plate trench cell for a 64-Mb DRAM. 14–15.

Pan, Paihung, et al.. (1997). Formation and mechanism of dimple/pit on Si substrate during WSix/poly-Si gate stack etch. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(5). 1752–1757. 5 indexed citations

Pan, Paihung, et al.. (1994). Shallow trench isolation for ultra-large-scale integrated devices. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(1). 54–58. 20 indexed citations

Pan, Paihung, et al.. (1989). Properties of Thin SiO₂ Films with In-Situ Deposition of Poly Si Electrodes. MRS Proceedings. 146. 2 indexed citations

Pan, Paihung. (1987). Characteristics of thermal SiO2 films during nitridation. Journal of Applied Physics. 61(1). 284–293. 45 indexed citations

Pan, Paihung & Charles E. Schaefer. (1986). Effects of Processing on Characteristics of 10–15 nm Thermally Grown SiO2 Films. Journal of The Electrochemical Society. 133(6). 1171–1176. 9 indexed citations

Pan, Paihung, et al.. (1985). The Composition and Properties of PECVD Silicon Oxide Films. Journal of The Electrochemical Society. 132(8). 2012–2019. 32 indexed citations

Nguyen, Van Son, et al.. (1985). Plasma Organosilicon Polymers: Deposition, Characterization, and Application in Multilayer Resist. Journal of The Electrochemical Society. 132(8). 1925–1932. 25 indexed citations

Pan, Paihung, et al.. (1985). The Composition and Physical Properties of LPCVD Silicon Nitride Deposited with Different NH 3 / SiH2Cl2 Gas Ratios. Journal of The Electrochemical Society. 132(12). 3001–3005. 36 indexed citations

10.

Pan, Paihung, et al.. (1985). Properties of thin LPCVD silicon oxynitride films. Journal of Electronic Materials. 14(5). 617–632. 15 indexed citations

11.

Pan, Paihung, et al.. (1985). Positive charge generation in thin SiO2 films during nitridation process. Applied Physics Letters. 47(5). 473–475. 20 indexed citations

12.

Nguyen, Van Son, Sarah Burton, & Paihung Pan. (1984). The Variation of Physical Properties of Plasma‐Deposited Silicon Nitride and Oxynitride with Their Compositions. Journal of The Electrochemical Society. 131(10). 2348–2353. 55 indexed citations

13.

Nguyen, Van Son & Paihung Pan. (1984). Initial transient phenomena in the plasma enhanced chemical vapor deposition process. Applied Physics Letters. 45(2). 134–136. 15 indexed citations

14.

Pan, Paihung, et al.. (1982). Dopant diffusion in tungsten silicide. Journal of Applied Physics. 53(4). 3059–3062. 28 indexed citations

15.

Pan, Paihung, et al.. (1981). Study of relative thickness of thin oxide layers at Si ₃ N ₃ /Si interface by auger depth profiling. Surface and Interface Analysis. 3(3). 106–109. 1 indexed citations

16.

Pan, Paihung, et al.. (1981). Mechanisms of Plasma‐Enhanced Silicon Nitride Deposition Using SiH4 / N 2 Mixture. Journal of The Electrochemical Society. 128(7). 1555–1563. 115 indexed citations

17.

Pan, Paihung, H. R. Shanks, A. J. Bevolo, & G. C. Danielson. (1980). Low-temperature heat capacity of some alkali metal tungstates. Journal of Solid State Chemistry. 35(2). 176–180. 1 indexed citations

18.

Pan, Paihung, D. K. Finnemore, A. J. Bevolo, et al.. (1980). Heat capacity of high-purity lanthanum. Physical review. B, Condensed matter. 21(7). 2809–2814. 32 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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