D. Werho

546 total citations
22 papers, 462 citations indexed

About

D. Werho is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Radiation. According to data from OpenAlex, D. Werho has authored 22 papers receiving a total of 462 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 9 papers in Materials Chemistry and 6 papers in Radiation. Recurrent topics in D. Werho's work include Semiconductor materials and devices (9 papers), X-ray Spectroscopy and Fluorescence Analysis (6 papers) and Electron and X-Ray Spectroscopy Techniques (5 papers). D. Werho is often cited by papers focused on Semiconductor materials and devices (9 papers), X-ray Spectroscopy and Fluorescence Analysis (6 papers) and Electron and X-Ray Spectroscopy Techniques (5 papers). D. Werho collaborates with scholars based in United States and Mexico. D. Werho's co-authors include Dina H. Triyoso, Philip J. Tobin, D. Roan, B. E. White, R. Gregory, Andrew E. Hooper, Theresa Hopson, M. Ramón, J. Baker and L.B. La and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

D. Werho

22 papers receiving 440 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
D. Werho United States 10 347 219 59 45 38 22 462
Jonathan D. P. Counsell United Kingdom 12 158 0.5× 226 1.0× 37 0.6× 72 1.6× 30 0.8× 21 381
Masumi Ito Japan 5 380 1.1× 300 1.4× 29 0.5× 20 0.4× 32 0.8× 15 522
O. Sakho Italy 11 83 0.2× 204 0.9× 27 0.5× 53 1.2× 92 2.4× 23 359
Haneul Kang South Korea 8 199 0.6× 337 1.5× 11 0.2× 16 0.4× 48 1.3× 13 432
S. Zweigart Germany 13 692 2.0× 660 3.0× 26 0.4× 23 0.5× 157 4.1× 28 760
Supriya S. Kanyal United States 11 158 0.5× 235 1.1× 16 0.3× 62 1.4× 32 0.8× 19 423
Alfred C. Miller United States 10 236 0.7× 285 1.3× 12 0.2× 8 0.2× 52 1.4× 12 384
Trevor Hardcastle United Kingdom 9 137 0.4× 299 1.4× 8 0.1× 42 0.9× 56 1.5× 13 379
S.K. Garg India 12 201 0.6× 277 1.3× 17 0.3× 21 0.5× 35 0.9× 23 402
Raul Rammula Estonia 16 511 1.5× 456 2.1× 6 0.1× 17 0.4× 31 0.8× 29 624

Countries citing papers authored by D. Werho

Since Specialization
Citations

This map shows the geographic impact of D. Werho's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Werho with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Werho more than expected).

Fields of papers citing papers by D. Werho

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Werho. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Werho. The network helps show where D. Werho may publish in the future.

Co-authorship network of co-authors of D. Werho

This figure shows the co-authorship network connecting the top 25 collaborators of D. Werho. A scholar is included among the top collaborators of D. Werho based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. Werho. D. Werho is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Triyoso, Dina H., R. Gregory, J. Schaeffer, et al.. (2007). Atomic layer deposited TaCy metal gates: Impact on microstructure, electrical properties, and work function on HfO2 high-k dielectrics. Journal of Applied Physics. 102(10). 20 indexed citations
2.
Werho, D., et al.. (2006). Electroless Plated CoWB and COWPB Films for Copper Cap Applications. ECS Transactions. 1(11). 11–17. 1 indexed citations
3.
Triyoso, Dina H., R. I. Hegde, Stefan Zollner, et al.. (2005). Impact of titanium addition on film characteristics of HfO2 gate dielectrics deposited by atomic layer deposition. Journal of Applied Physics. 98(5). 72 indexed citations
4.
Burgin, T., et al.. (2005). Investigations into the Mechanism of Adsorption of Carbon Nanotubes onto Aminopropylsiloxane Functionalized Surfaces. Langmuir. 21(14). 6596–6602. 15 indexed citations
5.
Triyoso, Dina H., R. I. Hegde, Jennifer E. Grant, et al.. (2004). Film properties of ALD HfO2 and La2O3 gate dielectrics grown on Si with various pre-deposition treatments. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(4). 2121–2127. 56 indexed citations
6.
Demkov, Alexander A., et al.. (2001). Stable titanium silicide formation on field oxide after BF2 ion implantation. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(2). 372–375. 1 indexed citations
7.
Brennan, S., et al.. (2001). Recent advances and perspectives in synchrotron radiation TXRF. Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 467-468. 1198–1201. 12 indexed citations
8.
Hooper, Andrew E., et al.. (2001). Evaluation of amine‐ and amide‐terminated self‐assembled monolayers as ‘Molecular glues’ for Au and SiO 2 substrates. Surface and Interface Analysis. 31(9). 809–814. 53 indexed citations
9.
Edwards, N. V., Joseph B. Vella, Qian Xie, et al.. (2001). Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool For Relative Porosity Measurements of Low- K Dielectric Films. MRS Proceedings. 697. 2 indexed citations
10.
Brennan, S., et al.. (2001). Laboratory and synchrotron radiation total-reflection X-ray fluorescence: new perspectives in detection limits and data analysis. Spectrochimica Acta Part B Atomic Spectroscopy. 56(11). 2049–2056. 15 indexed citations
11.
Pianetta, P., et al.. (2000). Application of synchrotron radiation to TXRF analysis of metal contamination on silicon wafer surfaces. Thin Solid Films. 373(1-2). 222–226. 31 indexed citations
12.
Demkov, Alexander A., Stefan Zollner, D. Werho, et al.. (2000). Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica. MRS Proceedings. 612. 1 indexed citations
13.
Pianetta, P., et al.. (1999). Application of synchrotron radiation to TXRF analysis of metal contamination on silicon wafer surfaces. Superficies y Vacío. 17–21. 2 indexed citations
14.
Liaw, H.M., Peter Fejes, D. Werho, et al.. (1999). 3C-SiC Buffer Layers Converted from Si at a Low Temperature. MRS Proceedings. 572. 2 indexed citations
15.
Demkov, Alexander A., Stefan Zollner, D. Werho, et al.. (1999). Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica. MRS Proceedings. 579. 3 indexed citations
16.
17.
Banks, J.C., Barney L. Doyle, J. A. Knapp, et al.. (1998). Using heavy ion backscattering spectrometry (HIBS) to solve integrated circuit manufacturing problems. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 136-138. 1223–1228. 5 indexed citations
18.
Wetteroth, T., et al.. (1997). Improvement in gate oxide integrity on thin-film silicon-on-insulator substrates by lateral gettering. Applied Physics Letters. 71(23). 3397–3399. 9 indexed citations
19.
Werho, D., R. B. Gregory, S. N. Schauer, et al.. (1997). Calibration of reference materials for total-reflection X-ray fluorescence analysis by heavy ion backscattering spectrometry. Spectrochimica Acta Part B Atomic Spectroscopy. 52(7). 881–886. 4 indexed citations
20.
Werho, D., et al.. (1996). Is Ti Contamination in Si Wafer Processing an Issue?. Journal of The Electrochemical Society. 143(7). 2353–2356. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Jonathan D. P. Counsell Breakdown of academic impact, for papers by Masumi Ito Breakdown of academic impact, for papers by O. Sakho Breakdown of academic impact, for papers by Haneul Kang Breakdown of academic impact, for papers by S. Zweigart Breakdown of academic impact, for papers by Supriya S. Kanyal Breakdown of academic impact, for papers by Alfred C. Miller Breakdown of academic impact, for papers by Trevor Hardcastle Breakdown of academic impact, for papers by S.K. Garg Breakdown of academic impact, for papers by Raul Rammula
Rankless by CCL
2026