D. Werho

546 citations

22 papers · 462 indexed · h-index 10

Impact in

Radiation top 10%
- X-ray Spectroscopy and Fluorescence Analysis
Surfaces, Coatings and Films top 10%
- Electron and X-Ray Spectroscopy Techniques

Papers in ⓘ

Surfaces, Coatings and Films 6
- Electron and X-Ray Spectroscopy Techniques 5
Radiation 6
- X-ray Spectroscopy and Fluorescence Analysis 6
- Advanced X-ray Imaging Techniques 2

Co-authors: Dina H. Triyoso (4 shared papers)D. Roan (3 shared papers)B. E. White (3 shared papers)Philip J. Tobin (3 shared papers)R. Gregory (3 shared papers)Andrew E. Hooper (1 shared paper)Theresa Hopson (1 shared paper)J. Baker (2 shared papers)
Journals: Spectrochimica Acta Part B Atomic Spectroscopy (2 papers)Journal of Applied Physics (2 papers)Thin Solid Films (2 papers)Journal of The Electrochemical Society (2 papers)Surface and Interface Analysis (1 paper)
Partner nations: United States Mexico

In The Last Decade

D. Werho

22 papers receiving 440 citations

Peers

Countries citing papers authored by D. Werho

Since Specialization

Citations

This map shows the geographic impact of D. Werho's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Werho with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Werho more than expected).

Fields of papers citing papers by D. Werho

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Werho. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Werho. The network helps show where D. Werho may publish in the future.

Co-authors

The 25 scholars most cited alongside D. Werho, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with D. Werho Line = papers co-authored together D. Werho links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 22 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO[sub 2] Journal of The Electrochemical Society ·Dina H. Triyoso, R. Liu, D. Roan, M. Ramón, N. V. Edwards, R. Gregory, D. Werho, J. Kulik, G. Tam, Elizabeth F. Irwin, X.-D. Wang, L.B. La, C. Hobbs, R. Garcia, J. Baker, B. E. White, Philip J. Tobin	2004	148
2	Impact of titanium addition on film characteristics of HfO2 gate dielectrics deposited by atomic layer deposition Journal of Applied Physics ·Dina H. Triyoso, R. I. Hegde, Stefan Zollner, Michael Ramon, S. Kalpat, R. Gregory, X.-D. Wang, Jian Jiang, M. Raymond, R. Rai, D. Werho, D. Roan, B. E. White, Philip J. Tobin	2005	72
3	Film properties of ALD HfO2 and La2O3 gate dielectrics grown on Si with various pre-deposition treatments Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Dina H. Triyoso, R. I. Hegde, Jennifer E. Grant, Peter Fejes, R. Liu, D. Roan, M. Ramón, D. Werho, R. Rai, L.B. La, J. Baker, Cristina Garza, T. Guenther, B. E. White, Philip J. Tobin	2004	56
4	Evaluation of amine‐ and amide‐terminated self‐assembled monolayers as ‘Molecular glues’ for Au and SiO ₂ substrates Surface and Interface Analysis ·Andrew E. Hooper, D. Werho, Theresa Hopson, O. Palmer	2001	53
5	Application of synchrotron radiation to TXRF analysis of metal contamination on silicon wafer surfaces Thin Solid Films ·P. Pianetta, Katharina Baur, Anoop Pratap Singh, S. Brennan, Jonathan A. Kerner, D. Werho, J Wang	2000	31
6	Atomic layer deposited TaCy metal gates: Impact on microstructure, electrical properties, and work function on HfO2 high-k dielectrics Journal of Applied Physics ·Dina H. Triyoso, R. Gregory, J. Schaeffer, D. Werho, D. Li, S. Marcus, G. D. Wilk	2007	20
7	Investigations into the Mechanism of Adsorption of Carbon Nanotubes onto Aminopropylsiloxane Functionalized Surfaces Langmuir ·T. Burgin, Justin Lewenstein, D. Werho	2005	15
8	Laboratory and synchrotron radiation total-reflection X-ray fluorescence: new perspectives in detection limits and data analysis Spectrochimica Acta Part B Atomic Spectroscopy ·Katharina Baur, S. Brennan, B Burrow, D. Werho, P. Pianetta	2001	15
9	Recent advances and perspectives in synchrotron radiation TXRF Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment ·Katharina Baur, S. Brennan, D. Werho, L. Moro, P. Pianetta	2001	12
10	Improvement in gate oxide integrity on thin-film silicon-on-insulator substrates by lateral gettering Applied Physics Letters ·Seon‐Eui Hong, T. Wetteroth, Hang‐Sik Shin, S. R. Wilson, D. Werho, T.-C. Lee, D.K. Schroder	1997	9
11	Spontaneous oxide reduction in metal stacks Thin Solid Films ·Wentao Qin, Alex A. Volinsky, D. Werho, N. David Theodore, M. Kottke, Chandra Ramiah	2004	6
12	Using heavy ion backscattering spectrometry (HIBS) to solve integrated circuit manufacturing problems Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·J.C. Banks, Barney L. Doyle, J. A. Knapp, D. Werho, R. B. Gregory, Mark Anthony, Trace Hurd, Alain C. Diebold	1998	5
13	Calibration of reference materials for total-reflection X-ray fluorescence analysis by heavy ion backscattering spectrometry Spectrochimica Acta Part B Atomic Spectroscopy ·D. Werho, R. B. Gregory, S. N. Schauer, X Liu, G. D. Carney, J.C. Banks, J. Knapp, Barney L. Doyle, Alain C. Diebold	1997	4
14	Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica MRS Proceedings ·Alexander A. Demkov, R. Liu, Stefan Zollner, D. Werho, M. Kottke, R. B. Gregory, M. Angyal, S. Filipiak, L.C. McIntyre, M.D. Ashbaugh	1999	3
15	Is Ti Contamination in Si Wafer Processing an Issue? Journal of The Electrochemical Society ·Li‐Hsin Chang, William G. Cowden, Jim Christiansen, D. Werho, N. David Theodore	1996	3
16	Application of synchrotron radiation to TXRF analysis of metal contamination on silicon wafer surfaces Superficies y Vacío ·P. Pianetta, Katharina Baur, S. Brennan, D. Werho, J. Wang	1999	2
17	Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool For Relative Porosity Measurements of Low- K Dielectric Films MRS Proceedings ·N. V. Edwards, Joseph B. Vella, Qian Xie, Stefan Zollner, D. Werho, Indira Adhihetty, R. Liu, Tom Tiwald, Christopher Russell, Jason Vires, K. Junker	2001	2
18	3C-SiC Buffer Layers Converted from Si at a Low Temperature MRS Proceedings ·H.M. Liaw, Seon‐Eui Hong, Peter Fejes, D. Werho, Harland G. Tompkins, Stefan Zollner, S. R. Wilson, K. J. Linthicum, R. F. Davis	1999	2
19	Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica MRS Proceedings ·Alexander A. Demkov, Stefan Zollner, R. Liu, D. Werho, M. Kottke, R. B. Gregory, M. Angyal, S. Filipiak, G. B. Adams	2000	1
20	Electroless Plated CoWB and COWPB Films for Copper Cap Applications ECS Transactions ·Varughese Mathew, Lynne Michaelson, Samira Garcia, Eddie Acosta, D. Werho, R. B. Gregory, Zhi-Xiong Jiang, Kiwoon Kim	2006	1

About D. Werho

D. Werho is a scholar working on Surfaces, Coatings and Films, Radiation, Ceramics and Composites, Electrical and Electronic Engineering and Materials Chemistry, having authored 22 papers that have together received 462 indexed citations. Recurring topics across this work include Semiconductor materials and devices (9 papers), X-ray Spectroscopy and Fluorescence Analysis (6 papers), Electron and X-Ray Spectroscopy Techniques (5 papers), Electronic and Structural Properties of Oxides (5 papers), Force Microscopy Techniques and Applications (3 papers), Ferroelectric and Negative Capacitance Devices (3 papers), Advanced X-ray Imaging Techniques (2 papers) and Copper Interconnects and Reliability (2 papers). The work is most often cited by research in Radiation (59 citations), Surfaces, Coatings and Films (45 citations), Electrical and Electronic Engineering (347 citations), Materials Chemistry (219 citations) and Electronic, Optical and Magnetic Materials (38 citations). D. Werho has collaborated with scholars based in United States and Mexico. Frequent co-authors include Dina H. Triyoso, D. Roan, B. E. White, Philip J. Tobin, R. Gregory, Andrew E. Hooper, Theresa Hopson, J. Baker, L.B. La and M. Ramón. Their work appears in journals such as Spectrochimica Acta Part B Atomic Spectroscopy, Journal of Applied Physics, Thin Solid Films, Journal of The Electrochemical Society and Surface and Interface Analysis.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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