Raul Rammula

763 total citations
29 papers, 624 citations indexed

About

Raul Rammula is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Surfaces, Coatings and Films. According to data from OpenAlex, Raul Rammula has authored 29 papers receiving a total of 624 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 22 papers in Materials Chemistry and 2 papers in Surfaces, Coatings and Films. Recurrent topics in Raul Rammula's work include Semiconductor materials and devices (29 papers), Electronic and Structural Properties of Oxides (17 papers) and Ferroelectric and Negative Capacitance Devices (7 papers). Raul Rammula is often cited by papers focused on Semiconductor materials and devices (29 papers), Electronic and Structural Properties of Oxides (17 papers) and Ferroelectric and Negative Capacitance Devices (7 papers). Raul Rammula collaborates with scholars based in Estonia, Slovakia and Finland. Raul Rammula's co-authors include Jaan Aarik, Hugo Mändar, Lauri Aarik, Väino Sammelselg, Tõnis Arroval, Aarne Kasikov, Ahti Niilisk, Teet Uustare, K. Hušeková and Boris Hudec and has published in prestigious journals such as ACS Applied Materials & Interfaces, Applied Surface Science and Journal of Physics D Applied Physics.

In The Last Decade

Raul Rammula

29 papers receiving 618 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Raul Rammula Estonia 16 511 456 75 49 42 29 624
Alma‐Asta Kiisler Estonia 6 520 1.0× 482 1.1× 115 1.5× 63 1.3× 29 0.7× 6 650
Saurabh Karwal Netherlands 11 444 0.9× 367 0.8× 44 0.6× 47 1.0× 79 1.9× 16 555
Liang-Chiun Chao Taiwan 15 392 0.8× 473 1.0× 123 1.6× 126 2.6× 21 0.5× 46 638
Jong‐Chang Woo South Korea 12 425 0.8× 295 0.6× 29 0.4× 76 1.6× 60 1.4× 84 529
Hamide Kavak Türkiye 15 400 0.8× 525 1.2× 43 0.6× 110 2.2× 60 1.4× 36 659
L D Zhang China 13 279 0.5× 396 0.9× 108 1.4× 64 1.3× 20 0.5× 17 530
Virginia R. Anderson United States 13 372 0.7× 312 0.7× 34 0.5× 87 1.8× 20 0.5× 18 486
Cecilia Goyenola Sweden 11 196 0.4× 350 0.8× 52 0.7× 55 1.1× 110 2.6× 14 458
C. W. Pao Taiwan 16 170 0.3× 407 0.9× 119 1.6× 107 2.2× 63 1.5× 31 496
Guang-Rui Gu China 12 189 0.4× 289 0.6× 39 0.5× 58 1.2× 42 1.0× 35 395

Countries citing papers authored by Raul Rammula

Since Specialization
Citations

This map shows the geographic impact of Raul Rammula's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Raul Rammula with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Raul Rammula more than expected).

Fields of papers citing papers by Raul Rammula

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Raul Rammula. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Raul Rammula. The network helps show where Raul Rammula may publish in the future.

Co-authorship network of co-authors of Raul Rammula

This figure shows the co-authorship network connecting the top 25 collaborators of Raul Rammula. A scholar is included among the top collaborators of Raul Rammula based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Raul Rammula. Raul Rammula is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kozlova, Jekaterina, Aivar Tarre, Aarne Kasikov, et al.. (2022). Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition. Nanomaterials. 12(15). 2593–2593. 6 indexed citations
2.
Rammula, Raul, Peeter Ritslaid, Tanel Käämbre, et al.. (2021). Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone. Nanotechnology. 32(33). 335703–335703. 3 indexed citations
3.
Aarik, Lauri, Tõnis Arroval, Hugo Mändar, Raul Rammula, & Jaan Aarik. (2020). Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes. Applied Surface Science. 530. 147229–147229. 14 indexed citations
4.
Arroval, Tõnis, et al.. (2016). Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films. Thin Solid Films. 600. 119–125. 44 indexed citations
5.
Aarik, Lauri, Harry Alles, Aleks Aidla, et al.. (2014). Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O. Thin Solid Films. 565. 37–44. 20 indexed citations
6.
Murakami, K., Mathias Rommel, Boris Hudec, et al.. (2014). Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes. ACS Applied Materials & Interfaces. 6(4). 2486–2492. 18 indexed citations
7.
Aarik, Lauri, Tõnis Arroval, Raul Rammula, et al.. (2014). Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors. Thin Solid Films. 565. 19–24. 32 indexed citations
8.
Arroval, Tõnis, Lauri Aarik, Raul Rammula, et al.. (2013). Influence of growth temperature on the structure and electrical properties of high‐permittivity TiO2 films in TiCl4‐H2O and TiCl4‐O3 atomic‐layer‐deposition processes. physica status solidi (a). 211(2). 425–432. 14 indexed citations
9.
Rammula, Raul, Lauri Aarik, Jekaterina Kozlova, et al.. (2013). Atomic layer deposition of aluminum oxide films on graphene. IOP Conference Series Materials Science and Engineering. 49. 12014–12014. 18 indexed citations
10.
Aarik, Jaan, Tõnis Arroval, Lauri Aarik, et al.. (2013). Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current. Journal of Crystal Growth. 382. 61–66. 18 indexed citations
11.
Fröhlich, K., Boris Hudec, M. Ťapajna, et al.. (2013). TiO2-Based Metal-Insulator-Metal Structures for Future DRAM Storage Capacitors. ECS Transactions. 50(13). 79–87. 12 indexed citations
12.
Aarik, Jaan, Boris Hudec, K. Hušeková, et al.. (2012). Atomic layer deposition of high-permittivity TiO2dielectrics with low leakage current on RuO2in TiCl4-based processes. Semiconductor Science and Technology. 27(7). 74007–74007. 18 indexed citations
13.
Tamm, Aile, Anna‐Liisa Peikolainen, Jekaterina Kozlova, et al.. (2012). Atomic layer deposition of high-k dielectrics on carbon nanoparticles. Thin Solid Films. 538. 16–20. 4 indexed citations
14.
Hudec, Boris, K. Hušeková, Edmund Dobročka, et al.. (2011). Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 29(1). 01AC09–01AC09. 15 indexed citations
15.
Rammula, Raul, Jaan Aarik, Hugo Mändar, Peeter Ritslaid, & Väino Sammelselg. (2010). Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films. Applied Surface Science. 257(3). 1043–1052. 28 indexed citations
16.
Sammelselg, Väino, Aivar Tarre, Jun Lu, et al.. (2009). Structural characterization of TiO2–Cr2O3 nanolaminates grown by atomic layer deposition. Surface and Coatings Technology. 204(12-13). 2015–2018. 21 indexed citations
17.
Tarre, Aivar, Jaan Aarik, Hugo Mändar, et al.. (2008). Atomic layer deposition of Cr2O3 thin films: Effect of crystallization on growth and properties. Applied Surface Science. 254(16). 5149–5156. 33 indexed citations
18.
Sammelselg, Väino, Raul Rammula, Jaan Aarik, et al.. (2007). XPS and AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon. Journal of Electron Spectroscopy and Related Phenomena. 156-158. 150–154. 16 indexed citations
19.
Aarik, Jaan, et al.. (2006). Electron Probe Microanalysis of HfO2 Thin Films on Conductive and Insulating Substrates. Microchimica Acta. 155(1-2). 195–198. 4 indexed citations
20.
Aarik, Jaan, Aleks Aidla, Aarne Kasikov, et al.. (2005). Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films. Applied Surface Science. 252(16). 5723–5734. 30 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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