Raul Rammula

763 total citations
29 papers, 624 citations indexed

About

Raul Rammula is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Surfaces, Coatings and Films. According to data from OpenAlex, Raul Rammula has authored 29 papers receiving a total of 624 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 22 papers in Materials Chemistry and 2 papers in Surfaces, Coatings and Films. Recurrent topics in Raul Rammula's work include Semiconductor materials and devices (29 papers), Electronic and Structural Properties of Oxides (17 papers) and Ferroelectric and Negative Capacitance Devices (7 papers). Raul Rammula is often cited by papers focused on Semiconductor materials and devices (29 papers), Electronic and Structural Properties of Oxides (17 papers) and Ferroelectric and Negative Capacitance Devices (7 papers). Raul Rammula collaborates with scholars based in Estonia, Slovakia and Finland. Raul Rammula's co-authors include Jaan Aarik, Hugo Mändar, Lauri Aarik, Väino Sammelselg, Tõnis Arroval, Aarne Kasikov, Ahti Niilisk, Teet Uustare, K. Hušeková and Boris Hudec and has published in prestigious journals such as ACS Applied Materials & Interfaces, Applied Surface Science and Journal of Physics D Applied Physics.

In The Last Decade

Raul Rammula

29 papers receiving 618 citations

Peers

Countries citing papers authored by Raul Rammula

Since Specialization

Citations

This map shows the geographic impact of Raul Rammula's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Raul Rammula with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Raul Rammula more than expected).

Fields of papers citing papers by Raul Rammula

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Raul Rammula. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Raul Rammula. The network helps show where Raul Rammula may publish in the future.

Co-authorship network of co-authors of Raul Rammula

This figure shows the co-authorship network connecting the top 25 collaborators of Raul Rammula. A scholar is included among the top collaborators of Raul Rammula based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Raul Rammula. Raul Rammula is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Title	Journal	Authors	Indexed citations
1	Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition	Nanomaterials	Jekaterina Kozlova, Aivar Tarre et al.	6
2	Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone	Nanotechnology	Raul Rammula, Peeter Ritslaid et al.	3
3	Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes	Applied Surface Science	Lauri Aarik, Tõnis Arroval et al.	14
4	Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films	Thin Solid Films	Tõnis Arroval, Lauri Aarik et al.	44
5	Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O	Thin Solid Films	Lauri Aarik, Harry Alles et al.	20
6	Nanoscale Characterization of TiO₂ Films Grown by Atomic Layer Deposition on RuO₂ Electrodes	ACS Applied Materials & Interfaces	K. Murakami, Mathias Rommel et al.	18
7	Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors	Thin Solid Films	Lauri Aarik, Tõnis Arroval et al.	32
8	Influence of growth temperature on the structure and electrical properties of high‐permittivity TiO₂ films in TiCl₄‐H₂O and TiCl₄‐O₃ atomic‐layer‐deposition processes	physica status solidi (a)	Tõnis Arroval, Lauri Aarik et al.	14
9	Atomic layer deposition of aluminum oxide films on graphene	IOP Conference Series Materials Science and Engineering	Raul Rammula, Lauri Aarik et al.	18
10	Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current	Journal of Crystal Growth	Jaan Aarik, Tõnis Arroval et al.	18
11	TiO₂-Based Metal-Insulator-Metal Structures for Future DRAM Storage Capacitors	ECS Transactions	K. Fröhlich, Boris Hudec et al.	12
12	Atomic layer deposition of high-permittivity TiO₂dielectrics with low leakage current on RuO₂in TiCl₄-based processes	Semiconductor Science and Technology	Jaan Aarik, Boris Hudec et al.	18
13	Atomic layer deposition of high-k dielectrics on carbon nanoparticles	Thin Solid Films	Aile Tamm, Anna‐Liisa Peikolainen et al.	4
14	Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer	Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena	Boris Hudec, K. Hušeková et al.	15
15	Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films	Applied Surface Science	Raul Rammula, Jaan Aarik et al.	28
16	Structural characterization of TiO2–Cr2O3 nanolaminates grown by atomic layer deposition	Surface and Coatings Technology	Väino Sammelselg, Aivar Tarre et al.	21
17	Atomic layer deposition of Cr2O3 thin films: Effect of crystallization on growth and properties	Applied Surface Science	Aivar Tarre, Jaan Aarik et al.	33
18	XPS and AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon	Journal of Electron Spectroscopy and Related Phenomena	Väino Sammelselg, Raul Rammula et al.	16
19	Electron Probe Microanalysis of HfO2 Thin Films on Conductive and Insulating Substrates	Microchimica Acta	Jaan Aarik, Kaupo Kukli et al.	4
20	Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films	Applied Surface Science	Jaan Aarik, Aleks Aidla et al.	30

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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