L. E. Trimble

1.2k total citations
62 papers, 979 citations indexed

About

L. E. Trimble is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Biomedical Engineering. According to data from OpenAlex, L. E. Trimble has authored 62 papers receiving a total of 979 indexed citations (citations by other indexed papers that have themselves been cited), including 42 papers in Electrical and Electronic Engineering, 29 papers in Materials Chemistry and 16 papers in Biomedical Engineering. Recurrent topics in L. E. Trimble's work include Silicon Nanostructures and Photoluminescence (19 papers), Thin-Film Transistor Technologies (17 papers) and Silicon and Solar Cell Technologies (17 papers). L. E. Trimble is often cited by papers focused on Silicon Nanostructures and Photoluminescence (19 papers), Thin-Film Transistor Technologies (17 papers) and Silicon and Solar Cell Technologies (17 papers). L. E. Trimble collaborates with scholars based in United States, Germany and Australia. L. E. Trimble's co-authors include R. J. H. Voorhoeve, J. P. Remeika, G. K. Celler, P.K. Gallagher, A. S. Cooper, Francis J. DiSalvo, T. T. Sheng, J. Frackoviak, David Harvey and McD. Robinson and has published in prestigious journals such as Science, Applied Physics Letters and Journal of The Electrochemical Society.

In The Last Decade

L. E. Trimble

58 papers receiving 893 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
L. E. Trimble United States 18 618 411 274 214 123 62 979
Tuomo Suntola Finland 18 1.0k 1.6× 902 2.2× 160 0.6× 150 0.7× 74 0.6× 41 1.3k
J. Finster Germany 17 485 0.8× 414 1.0× 101 0.4× 72 0.3× 92 0.7× 28 847
M. L. Colaianni United States 18 548 0.9× 342 0.8× 146 0.5× 86 0.4× 181 1.5× 24 876
Joseph Eng United States 18 615 1.0× 450 1.1× 159 0.6× 61 0.3× 159 1.3× 30 1.0k
F. Thieme Germany 17 829 1.3× 325 0.8× 215 0.8× 108 0.5× 60 0.5× 47 1.2k
S. S. Sun China 22 915 1.5× 279 0.7× 259 0.9× 170 0.8× 51 0.4× 59 1.2k
J.P. Delrue Belgium 10 467 0.8× 249 0.6× 125 0.5× 87 0.4× 49 0.4× 23 691
F. Šutara Czechia 19 863 1.4× 343 0.8× 304 1.1× 46 0.2× 77 0.6× 54 1.1k
C. T. Campbell United States 14 604 1.0× 167 0.4× 248 0.9× 41 0.2× 96 0.8× 19 845
P.G. Dickens United Kingdom 14 415 0.7× 408 1.0× 139 0.5× 170 0.8× 63 0.5× 23 835

Countries citing papers authored by L. E. Trimble

Since Specialization
Citations

This map shows the geographic impact of L. E. Trimble's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by L. E. Trimble with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites L. E. Trimble more than expected).

Fields of papers citing papers by L. E. Trimble

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by L. E. Trimble. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by L. E. Trimble. The network helps show where L. E. Trimble may publish in the future.

Co-authorship network of co-authors of L. E. Trimble

This figure shows the co-authorship network connecting the top 25 collaborators of L. E. Trimble. A scholar is included among the top collaborators of L. E. Trimble based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with L. E. Trimble. L. E. Trimble is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Farrow, R. C., I.C. Kizilyalli, W. K. Waskiewicz, et al.. (2001). SCALPEL mark detection using Si/SiO2 and 100 keV backscattered electrons. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(5). 1852–1856. 1 indexed citations
3.
Watson, G. P., I.C. Kizilyalli, O. Nalamasu, et al.. (2000). Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gates. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 2877–2880. 1 indexed citations
4.
Pau, Stanley, L. E. Trimble, J. W. Blatchford, et al.. (1999). Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 2499–2506. 1 indexed citations
5.
Trimble, L. E. & G. K. Celler. (1989). Evaluation of polycrystalline silicon membranes on fused silica for x-ray lithography masks. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(6). 1675–1679. 6 indexed citations
6.
Celler, G. K. & L. E. Trimble. (1989). Catalytic effect of SiO on thermomigration of impurities in SiO2. Applied Physics Letters. 54(15). 1427–1429. 49 indexed citations
7.
Trimble, L. E., et al.. (1988). The nature of residual stress, defects, and device characteristics for thick single-crystalline Si films on oxidized Si wafers. Journal of materials research/Pratt's guide to venture capital sources. 3(3). 514–520. 1 indexed citations
8.
Celler, G. K., L. E. Trimble, T. T. Sheng, S. G. Kosinski, & K. W. West. (1988). Precipitation of group V elements and Ge in SiO2 and their drift in a temperature gradient. Applied Physics Letters. 53(13). 1178–1180. 14 indexed citations
9.
Celler, G. K. & L. E. Trimble. (1988). High-temperature stability of Si/SiO2 interfaces and the influence of SiO flux on thermomigration of impurities in SiO2. Applied Physics Letters. 53(25). 2492–2494. 14 indexed citations
10.
Celler, G. K., L. E. Trimble, K. W. West, L. N. Pfeiffer, & T. T. Sheng. (1987). Segregation and drift of arsenic in SiO2 under the influence of a temperature gradient. Applied Physics Letters. 50(11). 664–666. 14 indexed citations
11.
Celler, G. K., L. E. Trimble, K. W. West, L. N. Pfeiffer, & T. T. Sheng. (1987). Drift of Arsenic in SiO2in a Lamp Furnace With a Built-In Temperature Gradient. MRS Proceedings. 92. 3 indexed citations
12.
Wolfe, R., J. Hegarty, J. F. Dillon, et al.. (1985). Thin-film waveguide magneto-optic isolator. Applied Physics Letters. 46(9). 817–819. 41 indexed citations
13.
Celler, G. K., et al.. (1985). Dielectrically Isolated Thick Si Films by Lateral Epitaxy from the Melt. Journal of The Electrochemical Society. 132(1). 211–219. 15 indexed citations
14.
Celler, G. K., et al.. (1983). Faceted Melting and Superheating of Crystalline Si Irradiated with Incoherent Light. MRS Proceedings. 23. 4 indexed citations
15.
Baumgart, Helmut, R.C. Frye, L. E. Trimble, H. J. Leamy, & G. K. Celler. (1981). Laser Processing of Porous Silicon. MRS Proceedings. 4. 1 indexed citations
16.
Trimble, L. E. & R. J. H. Voorhoeve. (1978). Continuous colorimetric monitoring of vapour-phase urea and cyanates. The Analyst. 103(1228). 759–759. 14 indexed citations
17.
Voorhoeve, R. J. H., C. K. N. Patel, L. E. Trimble, & R. J. Kerl. (1975). Hydrogen Cyanide Production During Reduction of Nitric Oxide over Platinum Catalysts. Science. 190(4210). 149–151. 23 indexed citations
18.
Gallagher, P.K., David W. Johnson, J. P. Remeika, et al.. (1975). The activity of La0.7Sr0.3MnO3 without Pt and La0.7Pb0.3MnO3 with varying Pt contents for the catalytic oxidation of CO. Materials Research Bulletin. 10(6). 529–538. 28 indexed citations
19.
Trimble, L. E., et al.. (1971). Diffusion in liquid mixtures of cadmium and lead at 350°C. Metallurgical Transactions. 2(6). 1669–1673. 4 indexed citations
20.
Trimble, L. E., et al.. (1965). A mathematical analysis of diffusion coefficients in binary systems. Acta Metallurgica. 13(5). 501–507. 38 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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