Andrew C. Hourd

422 total citations
34 papers, 345 citations indexed

About

Andrew C. Hourd is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Andrew C. Hourd has authored 34 papers receiving a total of 345 indexed citations (citations by other indexed papers that have themselves been cited), including 32 papers in Electrical and Electronic Engineering, 13 papers in Biomedical Engineering and 11 papers in Surfaces, Coatings and Films. Recurrent topics in Andrew C. Hourd's work include Advancements in Photolithography Techniques (22 papers), Integrated Circuits and Semiconductor Failure Analysis (14 papers) and Electron and X-Ray Spectroscopy Techniques (8 papers). Andrew C. Hourd is often cited by papers focused on Advancements in Photolithography Techniques (22 papers), Integrated Circuits and Semiconductor Failure Analysis (14 papers) and Electron and X-Ray Spectroscopy Techniques (8 papers). Andrew C. Hourd collaborates with scholars based in United Kingdom, Netherlands and Belgium. Andrew C. Hourd's co-authors include W. E. Spear, Amin Abdolvand, Martin McCallum, J.T.M. Stevenson, Stewart Smith, A.J. Walton, P. G. Le Comber, Andreas Tsiamis, Richard T. Baker and Liudi Jiang and has published in prestigious journals such as Applied Physics Letters, Journal of Materials Chemistry and Nanoscale.

In The Last Decade

Andrew C. Hourd

31 papers receiving 333 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Andrew C. Hourd United Kingdom 10 269 124 90 62 45 34 345
Yoshiya Hagimoto Taiwan 9 375 1.4× 166 1.3× 65 0.7× 54 0.9× 55 1.2× 32 407
Cheryl Hartfield United States 8 130 0.5× 81 0.7× 136 1.5× 55 0.9× 34 0.8× 30 304
Patrick J. Paniez France 10 240 0.9× 53 0.4× 133 1.5× 67 1.1× 47 1.0× 54 333
S. Akiyama Japan 11 300 1.1× 73 0.6× 54 0.6× 44 0.7× 189 4.2× 26 420
Yuanan Zhao China 10 136 0.5× 71 0.6× 136 1.5× 63 1.0× 89 2.0× 43 328
A. Plößl Germany 8 437 1.6× 99 0.8× 133 1.5× 23 0.4× 195 4.3× 14 536
T. Akatsu France 14 453 1.7× 131 1.1× 119 1.3× 17 0.3× 167 3.7× 20 522
Kathleen C. Richardson United States 10 228 0.8× 77 0.6× 108 1.2× 22 0.4× 149 3.3× 11 409
Vincent Larrey France 10 250 0.9× 57 0.5× 85 0.9× 11 0.2× 72 1.6× 51 330
Zhengxiu Fan China 12 195 0.7× 120 1.0× 94 1.0× 81 1.3× 55 1.2× 38 362

Countries citing papers authored by Andrew C. Hourd

Since Specialization
Citations

This map shows the geographic impact of Andrew C. Hourd's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Andrew C. Hourd with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Andrew C. Hourd more than expected).

Fields of papers citing papers by Andrew C. Hourd

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Andrew C. Hourd. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Andrew C. Hourd. The network helps show where Andrew C. Hourd may publish in the future.

Co-authorship network of co-authors of Andrew C. Hourd

This figure shows the co-authorship network connecting the top 25 collaborators of Andrew C. Hourd. A scholar is included among the top collaborators of Andrew C. Hourd based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Andrew C. Hourd. Andrew C. Hourd is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hourd, Andrew C., Richard T. Baker, & Amin Abdolvand. (2015). Structural characterisation of printable noble metal/poly(vinyl-alcohol) nanocomposites for optical applications. Nanoscale. 7(32). 13537–13546. 9 indexed citations
2.
Hourd, Andrew C., et al.. (2014). Scatter-limited conduction in printed platinum nanofilms. Journal of Materials Science. 50(3). 1169–1174. 8 indexed citations
3.
Wackerow, Stefan, et al.. (2012). Diffractive optical element embedded in silver-doped nanocomposite glass. Optics Express. 20(20). 22579–22579. 14 indexed citations
4.
Tsiamis, Andreas, Stewart Smith, Martin McCallum, et al.. (2011). Electrical Test Structures for the Characterization of Optical Proximity Correction. IEEE Transactions on Semiconductor Manufacturing. 25(2). 162–169. 2 indexed citations
5.
Smith, Stewart, Andreas Tsiamis, Martin McCallum, et al.. (2009). Application of Matching Structures to Identify the Source of Systematic Dimensional Offsets in GHOST Proximity Corrected Photomasks. Discovery Research Portal (University of Dundee). 50–55. 1 indexed citations
6.
Smith, Stewart, Andreas Tsiamis, Martin McCallum, et al.. (2009). Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks. IEEE Transactions on Semiconductor Manufacturing. 22(1). 72–79. 8 indexed citations
7.
Smith, Stewart, Andreas Tsiamis, Martin McCallum, et al.. (2008). Comparison of measurement techniques for advanced photomask metrology. Discovery Research Portal (University of Dundee). 1926. 35–39. 2 indexed citations
8.
Smith, Stewart, Andreas Tsiamis, Martin McCallum, et al.. (2008). Comparison of Optical and Electrical Techniques for Dimensional Metrology on Alternating Aperture Phase-Shifting Masks. IEEE Transactions on Semiconductor Manufacturing. 21(2). 154–160. 3 indexed citations
9.
Tsiamis, Andreas, Stewart Smith, Martin McCallum, et al.. (2007). Development of Eectrilcal On-Mask CD Test Structures Based on Optical Metrology Features. 171–176. 9 indexed citations
10.
Smith, Stewart, Andreas Tsiamis, Martin McCallum, et al.. (2007). Electrical Measurement of On-Mask Mismatch Resistor Structures. 3–8. 8 indexed citations
11.
Smith, Stewart, Martin McCallum, A.J. Walton, et al.. (2005). On-Mask CD and Overlay Test Structures for Alternating Aperture Phase Shift Lithography. IEEE Transactions on Semiconductor Manufacturing. 18(2). 238–245. 13 indexed citations
12.
Smith, Stewart, et al.. (2004). Test structures for CD and overlay metrology on alternating aperture phase-shifting masks. ePrints Soton (University of Southampton). 13. 29–34. 10 indexed citations
13.
Hourd, Andrew C., Hans Hartmann, R. Jonckheere, et al.. (2003). <title>Implementation of 248-nm based CD metrology for advanced reticle production</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5148. 148–157.
14.
Hourd, Andrew C., et al.. (2002). Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 319–319. 5 indexed citations
15.
Constantine, C., et al.. (1998). Inductively coupled plasma etch of DUV MoSi photomasks: a designed study of etch chemistries and process results. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3546. 88–88. 3 indexed citations
16.
Hofmann, Ulrich, et al.. (1996). <title>Hierarchical e-beam proximity correction in mask making</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2723. 150–158. 1 indexed citations
17.
18.
Cairns, J.A., et al.. (1994). Silicon–germanium films for photomasking applications. Journal of Materials Chemistry. 4(3). 393–397. 3 indexed citations
19.
Spear, W. E., et al.. (1986). Low-temperature electron transport near the mobility edge of amorphous silicon. Philosophical Magazine B. 54(4). L113–L118. 41 indexed citations
20.
Spear, W. E., et al.. (1985). The temperature dependence of the D° and D+ capture cross-section in a-Si. Journal of Non-Crystalline Solids. 77-78. 607–610. 17 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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