Standout Papers

Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of n... 1992 2026 2003 2014 382
  1. Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions (1992)
    Karen Holloway, P. M. Fryer et al. Journal of Applied Physics

Immediate Impact

1 by Nobel laureates 48 from Science/Nature 76 standout
Sub-graph 1 of 21

Citing Papers

Synaptic and neural behaviours in a standard silicon transistor
2025 StandoutNature
Monolithic three-dimensional tier-by-tier integration via van der Waals lamination
2024 StandoutNature
3 intermediate papers

Works of C. Cabral being referenced

Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
2003
Reduction of the C54–TiSi2 phase transformation temperature using refractory metal ion implantation
1995
and 1 more

Author Peers

Author Last Decade Papers Cites
C. Cabral 3192 1677 1528 1537 135 4.2k
M. Eizenberg 3114 1592 955 1621 243 4.2k
D. Josell 3649 977 1441 2151 158 4.9k
S. Nakahara 1925 1638 1181 1452 198 4.4k
J. C. Bravman 1789 1122 1623 1606 152 4.4k
Kevin R. Coffey 1217 2068 1864 1454 123 3.9k
P. Ruterana 1967 1262 980 1889 289 4.4k
J. M. E. Harper 3306 1524 2180 1763 152 5.3k
A. J. Kellock 2281 1862 1508 3101 108 5.0k
M. Wittmer 2273 1426 532 1160 85 3.3k
Christian Elsässer 2041 1248 1410 4666 170 6.3k

All Works

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