D. Josell
- Electrochemistry top 0.5%
- Electrochemical Analysis and Applications 17
-
- Copper Interconnects and Reliability 36
-
- Electrodeposition and Electroless Coatings 71
- Semiconductor materials and devices 19
- Electronic Packaging and Soldering Technologies 17
- Materials Chemistry top 2%
- Corrosion Behavior and Inhibition 19
-
- Semiconductor materials and interfaces 27
-
- Metal and Thin Film Mechanics 16
- Co-authors
- Thomas P. MoffatDaniel WheelerWilliam HuberT. P. MoffatJohn E. BonevichS.-K. KimF. SpaepenMonica D. Edelstein
- Cited by
- ElectrochemistryElectronic, Optical and Magnetic MaterialsElectrical and Electronic Engineering
- Journals
- Journal of The Electrochemical Society (51 papers)Electrochemical and Solid-State Letters (8 papers)Journal of Applied Physics (7 papers)
- Partner nations
- United StatesEgyptSwitzerland
In The Last Decade
D. Josell
153 papers receiving 4.9k citations
Peers
Comparison fields: 5 of 78
- Electrochemistry 794
- Electronic, Optical and Magnetic Materials 1.5k
- Electrical and Electronic Engineering 3.8k
- Materials Chemistry 2.2k
- Atomic and Molecular Physics, and Optics 1.0k
Countries citing papers authored by D. Josell
This map shows the geographic impact of D. Josell's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Josell with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Josell more than expected).
Fields of papers citing papers by D. Josell
This network shows the impact of papers produced by D. Josell. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Josell. The network helps show where D. Josell may publish in the future.
Co-authorship network
The 25 scholars most cited alongside D. Josell, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2025 | 0 | |
| 2 | 2025 | 2 | |
| 3 | 2025 | 1 | |
| 4 | 2024 | 1 | |
| 5 | 2022 | 10 | |
| 6 | 2022 | 10 | |
| 7 | 2022 | 8 | |
| 8 | 2021 | 12 | |
| 9 | 2021 | 6 | |
| 10 | 2021 | 2 | |
| 11 | 2020 | 24 | |
| 12 | 2020 | 21 | |
| 13 | 2017 | 31 | |
| 14 | 2016 | 47 | |
| 15 | 2016 | 5 | |
| 16 | 2006 | 1 | |
| 17 | Interconnect Fabrication by Superconformal Iodine-Catalyzed Chemical Vapor | 2003 | 1 |
| 18 | Numerical Simulation of Superconformal Electrodeposition Using the Level Set Method | 2002 | 3 |
| 19 | 1999 | 39 | |
| 20 | 1997 | 5 |
About D. Josell
D. Josell is a scholar working on Structural Biology, Electrochemistry, Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics, having authored 160 papers that have together received 5.1k indexed citations. Recurring topics across this work include Electrodeposition and Electroless Coatings (71 papers), Copper Interconnects and Reliability (36 papers), Semiconductor materials and interfaces (27 papers), Corrosion Behavior and Inhibition (19 papers), Semiconductor materials and devices (19 papers), Electrochemical Analysis and Applications (17 papers), Electronic Packaging and Soldering Technologies (17 papers) and Metal and Thin Film Mechanics (16 papers). The work is most often cited by research in Electrochemistry (794 citations), Electronic, Optical and Magnetic Materials (1.5k citations), Electrical and Electronic Engineering (3.8k citations), Materials Chemistry (2.2k citations) and Atomic and Molecular Physics, and Optics (1.0k citations). D. Josell has collaborated with scholars based in United States, Egypt and Switzerland. Frequent co-authors include Thomas P. Moffat, Daniel Wheeler, William Huber, T. P. Moffat, John E. Bonevich, S.-K. Kim, T. P. Moffat, F. Spaepen, Monica D. Edelstein and D. Van Heerden. Their work appears in journals such as Journal of The Electrochemical Society, Electrochemical and Solid-State Letters, Journal of Applied Physics, Journal of materials research/Pratt's guide to venture capital sources and Materials Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.