T. E. Seidel

1.7k citations

45 papers · 1.2k indexed · h-index 18

Computational Mechanics top 2%
- Ion-surface interactions and analysis 12
Electrical and Electronic Engineering top 5%
- Semiconductor materials and devices 21
- Silicon and Solar Cell Technologies 20
- Integrated Circuits and Semiconductor Failure Analysis 9
- 3D IC and TSV technologies 7
- Thin-Film Transistor Technologies 4
Atomic and Molecular Physics, and Optics top 10%
- Semiconductor materials and interfaces 9
Surfaces, Coatings and Films top 10%
Materials Chemistry
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 14

Co-authors: Ronald L. Meek A. G. Cullis J. S. Williams R. G. Elliman W. L. Brown G. E. Becker J. C. Bean P. M. Petroff
Cited by: Computational Mechanics Electrical and Electronic Engineering Atomic and Molecular Physics, and Optics
Journals: Journal of Applied Physics (7 papers)Applied Physics Letters (4 papers)IEEE Electron Device Letters (2 papers)
Partner nations: United States Germany Australia

In The Last Decade

T. E. Seidel

41 papers receiving 1.0k citations

Peers

Countries citing papers authored by T. E. Seidel

Since Specialization

Citations

This map shows the geographic impact of T. E. Seidel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. E. Seidel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. E. Seidel more than expected).

Fields of papers citing papers by T. E. Seidel

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. E. Seidel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. E. Seidel. The network helps show where T. E. Seidel may publish in the future.

Co-authorship network

The 25 scholars most cited alongside T. E. Seidel, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with T. E. Seidel Line = papers co-authored together T. E. Seidel links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	High Performance ALD Reactor for High-k Films ECS Transactions ·J. A. OZOEMENE,Lucie Strempková,Zhihong Zhang,T. E. Seidel,Zia Karim,Sasangan Ramanathan	2007	1
2	AVD and MOCVD TaCN-based Films for Gate Metal Applications on High k Gate Dielectrics ECS Transactions ·Zia Karim,Karl Hans Strobl,Л. С. Кращук,P. Lehnen,C. Lohe,T. E. Seidel,Christoph Adelmann,Thierry Conard,Barry O’Sullivan,Stefan O. Schoenberg,T. Schram,Sven Van Elshocht,Stefan De Gendt	2007	4
3	AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin‐Film Processing Chemical Vapor Deposition ·M. Schumacher,P. K. Baumann,T. E. Seidel	2006	41
4	Advanced Metal Gate Electrode Options Compatible with ALD and AVD® HfSiOx-Based Gate Dielectrics ECS Transactions ·Zia Karim,Gres Kurnia,C. Lohe,Zhihong Zhang,Woong Park,A V Trjapel’nikov,P. K. Baumann,J. A. OZOEMENE,Sasangan Ramanathan,B Laauwen,T. E. Seidel,P. Lehnen	2006	1
5	Mass Production Worthy HfO2-Al2O3 Laminates Capacitor Technology using Hf Liquid Precursor for sub-100 nm DRAMS Dinghao Feng,Jaehwan Kim,Nihan Gülmez,H. S. Jung,N. I. Lee,Hyun-Kyu Kang,Annisa Fitri Muhaemin,J. K. Elliott,Benjamin Martin Sim,María José Garrido Asperó,Youngsu Chung,Xinye Liu,Sasangan Ramanathan,T. E. Seidel,横山正明,Gryhoriy Ivanovych Goncharuk,Hak Yong Kim,李正化	2002	7
6	A novel low temperature PVD planarized Al-Cu process for high aspect ratio sub-half micron interconnect Bin Zhao,T.M. Abdulazeez,V. Hoffman,Marliene DʼAialo,P.K. Vasudev,T. E. Seidel	2002	3
7	Advanced materials for low power electronics Solid-State Electronics ·P.K. Vasudev,Chongliang Zheng,T. E. Seidel	1996	1
8	Bone mineral composition analysis by back-scattered electron microscopy (BSE) and linescanning Bone ·Olivia Cashman,Jorge Gustavo Alejandro Gzain,T. E. Seidel,Κ. Abendroth	1996	0
9	Status of Low-Dose Implantation for VLSI MRS Bulletin ·T. E. Seidel,明丽梅	1992	8
10	Influence of shear rate and temperature on the crystallization of spontaneous crystallizing glass-ceramic Journal of Materials Science ·T. E. Seidel,Christin Friedrich	1992	4
11	A superconducting magnetic levitation device for the transport of light payloads Journal of Superconductivity ·Hau,T. E. Seidel,David W. Johnson,W. W. Rhodes	1989	7
12	Rapid thermal annealing/chemical vapor deposition and integrated processing D. Hodul,Jeffrey C. Gelpey,Eulogia Merle,T. E. Seidel	1989	27
13	Zn gettering in InGaAs/InP interfaces Journal of Applied Physics ·M. Geva,T. E. Seidel	1986	18
14	A review of rapid thermal annealing (RTA) of B, BF 2 and As ions implanted into silicon Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·T. E. Seidel,Takele Belay,C. S. Pai,R. V. Knoell,D. M. Maher,D. C. Jacobson	1985	104
15	Dominant Influence of Beam-Induced Interface Rearrangement on Solid-Phase Epitaxial Crystallization of Amorphous Silicon Physical Review Letters ·J. S. Williams,R. G. Elliman,W. L. Brown,T. E. Seidel	1985	171
16	Enhanced Diffusion in Boron Implanted Silicon Journal of The Electrochemical Society ·L. C. Hopkins,T. E. Seidel,J. S. Williams,J. C. Bean	1985	13
17	Rapid thermal annealing of BF₂⁺implanted, preamorphized silicon IEEE Electron Device Letters ·T. E. Seidel	1983	64
18	Comparative study of annealed neon-, argon-, and krypton-ion implantation damage in silicon Journal of Applied Physics ·A. G. Cullis,T. E. Seidel,Ronald L. Meek	1978	91
19	Visible interference effects in silicon caused by high-current–high-dose implantation Applied Physics Letters ·T. E. Seidel,Gabriela Díaz Gorbea,J. C. C. Tsai	1976	27
20	Direct comparison of ion−damage gettering and phosphorus−diffusion gettering of Au in Si Journal of Applied Physics ·T. E. Seidel,Ronald L. Meek,A. G. Cullis	1975	103

About T. E. Seidel

T. E. Seidel is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Computational Mechanics, having authored 45 papers that have together received 1.2k indexed citations. Recurring topics across this work include Semiconductor materials and devices (21 papers), Silicon and Solar Cell Technologies (20 papers), Copper Interconnects and Reliability (14 papers), Ion-surface interactions and analysis (12 papers), Semiconductor materials and interfaces (9 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers), 3D IC and TSV technologies (7 papers) and Thin-Film Transistor Technologies (4 papers). The work is most often cited by research in Computational Mechanics (395 citations), Electrical and Electronic Engineering (1.0k citations) and Atomic and Molecular Physics, and Optics (319 citations). T. E. Seidel has collaborated with scholars based in United States, Germany and Australia. Frequent co-authors include Ronald L. Meek, A. G. Cullis, J. S. Williams, R. G. Elliman, W. L. Brown, G. E. Becker, J. C. Bean, P. M. Petroff, C. S. Pai and Jian Li. Their work appears in journals such as Journal of Applied Physics, Applied Physics Letters, IEEE Electron Device Letters, MRS Bulletin and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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