T. E. Jewell

543 total citations
33 papers, 358 citations indexed

About

T. E. Jewell is a scholar working on Electrical and Electronic Engineering, Radiation and Surfaces, Coatings and Films. According to data from OpenAlex, T. E. Jewell has authored 33 papers receiving a total of 358 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 19 papers in Radiation and 10 papers in Surfaces, Coatings and Films. Recurrent topics in T. E. Jewell's work include Advancements in Photolithography Techniques (23 papers), Advanced X-ray Imaging Techniques (19 papers) and Optical Coatings and Gratings (6 papers). T. E. Jewell is often cited by papers focused on Advancements in Photolithography Techniques (23 papers), Advanced X-ray Imaging Techniques (19 papers) and Optical Coatings and Gratings (6 papers). T. E. Jewell collaborates with scholars based in United States, Canada and Japan. T. E. Jewell's co-authors include O. R. Wood, D. L. White, W. T. Silfvast, W Mansfield, J. E. Bjorkholm, W. K. Waskiewicz, David L. Windt, L. H. Szeto, J. Michael Rodgers and Kevin P. Thompson and has published in prestigious journals such as Applied Physics Letters, Optics Letters and Journal of Lightwave Technology.

In The Last Decade

T. E. Jewell

29 papers receiving 339 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
T. E. Jewell United States	10	300	148	126	77	44	33	358
F. Glaus Switzerland	5	112 0.4×	47 0.3×	60 0.5×	19 0.2×	32 0.7×	8	215
W.J. DeHope United States	6	92 0.3×	32 0.2×	50 0.4×	80 1.0×	101 2.3×	22	255
S. Dreiner Germany	11	279 0.9×	34 0.2×	24 0.2×	69 0.9×	71 1.6×	40	346
T.C. Holloway United States	13	523 1.7×	45 0.3×	61 0.5×	27 0.4×	190 4.3×	29	612
Julius J. Muray United States	7	130 0.4×	13 0.1×	71 0.6×	42 0.5×	60 1.4×	19	245
Ronald A. Rojeski United States	11	544 1.8×	267 1.8×	167 1.3×	7 0.1×	97 2.2×	15	582
Ingolf Rüge Germany	9	183 0.6×	18 0.1×	61 0.5×	16 0.2×	68 1.5×	30	262
E. Hoyer United States	9	125 0.4×	73 0.5×	67 0.5×	17 0.2×	70 1.6×	44	243
J. Söchtig Switzerland	9	254 0.8×	22 0.1×	86 0.7×	68 0.9×	224 5.1×	14	387
E. te Kaat Germany	10	202 0.7×	68 0.5×	25 0.2×	19 0.2×	69 1.6×	12	339

Countries citing papers authored by T. E. Jewell

Since Specialization

Citations

This map shows the geographic impact of T. E. Jewell's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. E. Jewell with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. E. Jewell more than expected).

Fields of papers citing papers by T. E. Jewell

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. E. Jewell. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. E. Jewell. The network helps show where T. E. Jewell may publish in the future.

Co-authorship network of co-authors of T. E. Jewell

This figure shows the co-authorship network connecting the top 25 collaborators of T. E. Jewell. A scholar is included among the top collaborators of T. E. Jewell based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. E. Jewell. T. E. Jewell is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

MacDowell, Alastair A., J. E. Bjorkholm, R. R. Freeman, et al.. (1996). Extreme Ultraviolet 1:1 Ring-Field Lithography Machine. EIE192–EIE192.

Jewell, T. E.. (1994). Four-Mirror Ring-Field System for EUV Projection Lithography. EOS.98–EOS.98. 3 indexed citations

MacDowell, Alastair A., J. E. Bjorkholm, R. R. Freeman, et al.. (1993). Soft-x-ray projection imaging with a 1:1 ring-field optic. Applied Optics. 32(34). 7072–7072. 5 indexed citations

MacDowell, Alastair A., J. E. Bjorkholm, Jeffrey Bokor, et al.. (1992). Reduction imaging with soft x rays for projection lithography. Review of Scientific Instruments. 63(1). 737–740. 2 indexed citations

Tennant, D. M., J. E. Bjorkholm, R. R. Freeman, et al.. (1992). <title>Comparison of reflective mask technologies for soft x-ray projection lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1604. 91–104.

Jewell, T. E.. (1991). Effect of amplitude and phase dispersion on images in multilayer coated soft x-ray projection systems. WE2–WE2. 2 indexed citations

Waskiewicz, W. K., David L. Windt, J. E. Bjorkholm, et al.. (1991). Achieving Uniform Multilayer Coatings on Figured Optics. ThB3–ThB3. 1 indexed citations

Wood, O. R., J. E. Bjorkholm, Jeffrey Bokor, et al.. (1991). High Resolution Soft-X-Ray Projection Imaging. WB1–WB1. 1 indexed citations

Freeman, R. R., Jeffrey Bokor, J. Greguš, et al.. (1991). X‐ray reduction imaging at the NSLS. Synchrotron Radiation News. 4(2). 13–15. 1 indexed citations

10.

Wood, O. R., J. E. Bjorkholm, Jeffrey Bokor, et al.. (1991). High Resolution Soft-X-Ray Projection Imaging. WB1–WB1. 4 indexed citations

11.

Berreman, Dwight W., J. E. Bjorkholm, Marco Becker, et al.. (1990). Use of trilevel resists for high-resolution soft-x-ray projection lithography. Applied Physics Letters. 56(22). 2180–2182. 16 indexed citations

12.

Jewell, T. E., Marco Becker, J. E. Bjorkholm, et al.. (1990). 20:1 projection soft x-ray lithography using trilevel resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1263. 90–90. 11 indexed citations

13.

Jewell, T. E., et al.. (1990). Design of Reflective Relay for Soft X-ray Lithography. LTuE2–LTuE2.

14.

Jewell, T. E., et al.. (1989). 0.25 μm Periodic Structures For Lightwave Technology Fabricated By Spatial Frequency Doubling Lithography (SFDL). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1088. 496–496. 2 indexed citations

15.

Jewell, T. E. & D. L. White. (1989). Spatial frequency doubling lithography (SFDL) of periodic structures for integrated optical circuit technology. Journal of Lightwave Technology. 7(9). 1386–1393. 6 indexed citations

16.

Wood, O. R., W. T. Silfvast, & T. E. Jewell. (1989). Short-wavelength annular-field optical system for imaging tenth-micron features. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(6). 1613–1615. 15 indexed citations

17.

Jewell, T. E. & D. L. White. (1988). Integrated Optical Circuit Grating Fabrication Using 0.25 µm Optical Lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 993. 48–48. 1 indexed citations

18.

Jewell, T. E., et al.. (1987). Excimer Laser Based Lithography: A Deep-Ultraviolet Wafer Stepper For VLSI Processing. Optical Engineering. 26(4). 264311–264311. 7 indexed citations

19.

Jewell, T. E., et al.. (1987). Effect Of Laser Characteristics On The Performance Of A Deep UV Projection System. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 774. 124–124. 5 indexed citations

20.

Feldman, Martin, et al.. (1986). Excimer Laser-Based Lithography: A Deep Ultraviolet Wafer Stepper. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 40 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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