S. Rigo

1.7k citations

75 papers · 1.4k indexed · h-index 19

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques 14
Ceramics and Composites top 5%
Electrical and Electronic Engineering top 5%
- Semiconductor materials and devices 54
- Thin-Film Transistor Technologies 16
- Silicon and Solar Cell Technologies 13
- Integrated Circuits and Semiconductor Failure Analysis 8
Computational Mechanics top 5%
- Ion-surface interactions and analysis 19
Materials Chemistry top 10%
- Silicon Nanostructures and Photoluminescence 16
Radiation
- Nuclear Physics and Applications 8

Co-authors: F. Rochet I. Trimaille J.‐J. Ganem G. Amsel B. Agius A. Straboni J. Siejka F. C. Stedile
Cited by: Surfaces, Coatings and Films Ceramics and Composites Electrical and Electronic Engineering
Journals: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms (14 papers)Journal of The Electrochemical Society (11 papers)Applied Surface Science (8 papers)
Partner nations: France Brazil Germany

In The Last Decade

S. Rigo

74 papers receiving 1.3k citations

Peers

Countries citing papers authored by S. Rigo

Since Specialization

Citations

This map shows the geographic impact of S. Rigo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Rigo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Rigo more than expected).

Fields of papers citing papers by S. Rigo

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Rigo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Rigo. The network helps show where S. Rigo may publish in the future.

Co-authorship network

The 25 scholars most cited alongside S. Rigo, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with S. Rigo Line = papers co-authored together S. Rigo links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Thermal growth of silicon oxynitride films on Si: A reaction-diffusion approach Journal of Applied Physics ·Rita M. C. de Almeida,I. J. R. Baumvol,J.‐J. Ganem,I. Trimaille,S. Rigo	2004	3
2	Thermal growth of SiO2 on SiC investigated by isotopic tracing and subnanometric depth profiling Applied Surface Science ·C. Radtke,I. J. R. Baumvol,F. C. Stedile,I. Vickridge,I. Trimaille,J.‐J. Ganem,S. Rigo	2003	3
3	Limiting Step Involved in the Thermal Growth of Silicon Oxide Films on Silicon Carbide Physical Review Letters ·I. Vickridge,I. Trimaille,J.‐J. Ganem,S. Rigo,C. Radtke,I. J. R. Baumvol,F. C. Stedile	2002	33
4	Furnace Oxynitridation in Nitric Oxide of Thin Silicon Oxide: Atomic Transport Mechanisms and Interfacial Microstructure MRS Proceedings ·I. Trimaille,J.‐J. Ganem,L.G. Gosset,Jonas Da Silva Santos,S. Rigo,J. L. Cantin,H. J. von Bardeleben	1999	2
5	Time dependence of the oxygen exchange O2↔SiO2 at the SiO2–Si interface during dry thermal oxidation of silicon Journal of Applied Physics ·Torbjörn Åkermark,L.G. Gosset,J.‐J. Ganem,I. Trimaille,I. Vickridge,S. Rigo	1999	16
6	Diffusion of near surface defects during the thermal oxidation of silicon Journal of Applied Physics ·J.‐J. Ganem,I. Trimaille,Tatiana Ovchinnikova,S. Rigo,F. C. Stedile,I. J. R. Baumvol	1997	24
7	Thermal Nitridation of SiO2 Films in Ammonia: Isotopic Tracing of Nitrogen and Oxygen in the Initial Stages Journal of The Electrochemical Society ·I. J. R. Baumvol,F. C. Stedile,J.‐J. Ganem,I. Trimaille,S. Rigo	1996	17
8	The effects of ion implantation through very thin silicon oxide films Brazilian Journal of Physics ·S. Rigo,J.‐J. Ganem,F. C. Stedile,I. Trimaille,I. J. R. Baumvol	1994	2
9	IBA study of the growth mechanisms of very thin silicon oxide films: the effect of wafer cleaning Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·F. C. Stedile,I. J. R. Baumvol,J.‐J. Ganem,S. Rigo,I. Trimaille,G. Battistig,W.H. Schulte,Harry Becker	1994	10
10	Silicon Bulk Machining of Electrostatic Micromotors Fabrication and Potential Applications European Solid-State Device Research Conference ·H. Ziad,Livita Dana Mamuaja,Christoph Marischka,Carlos DeSousa,Tarik Bourouina,Sam Hanke,S. Rigo,A. L’Hoir	1993	2
11	Modellization of the silicon rapid thermal oxidation in the initial stages according to the silicon fragments model Microelectronic Engineering ·J.‐J. Ganem,S. Rigo,I. Trimaille	1993	4
12	Deuteron beam analysis of rapid thermal nitridation of silicon and thin SiO2 films Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·J.‐J. Ganem,S. Rigo,I. Trimaille,Guo‐Neng Lu,Beatriz Silva Pimenta	1992	7
13	Oxygen interaction with defects at the Si/SiO2 interface Solid State Communications ·J. H. Stathis,S. Rigo,I. Trimaille	1991	3
14	Use of 18O isotopic labelling to study thermal dry oxidation of silicon as a function of temperature and pressure Applied Surface Science ·I. Trimaille,S. Rigo	1989	42
15	Oxidation of silicon Philosophical Magazine B ·N. F. Mott,S. Rigo,F. Rochet,A.M. Stoneham	1989	131
16	Effect of pressure on thermally induced diffusivity and reactivity of water in thin amorphous silica films Philosophical Magazine B ·F. Rochet,S. Rigo	1987	5
17	Structural evolution of very thin silicon oxide films during thermal growth in dry oxygen Applied Physics Letters ·B. Agius,S. Rigo,F. Rochet,M. Froment,Marion Rauh‐van Delst,H. Roulet,G. Dufour	1984	27
18	An 18O Study of Cooperative Diffusion and Chemical Reaction during Thermal Treatments of Silica Films in Water Vapor Journal of The Electrochemical Society ·S. Rigo,F. Rochet,B. Agius,A. Straboni	1982	47
19	Investigation of ion-beam-sputtered Nb-Ti thin films by complementary use of backscattering and nuclear-reaction microanalysis Journal of Applied Physics ·D. Bouchier,G. Gautherin,B. Agius,S. Rigo	1978	4
20	Complementary use of microanalysis by the direct observation of nuclear reactions and of backscattering induced by charged particles Journal of Radioanalytical and Nuclear Chemistry ·F. Abel,G. Amsel,E. d'Artemare,M. Bruneaux,C. M. S. Cohen,B. Maurel,C. Ortega,S. Rigo,J. Siejka,M. Croset,D. Dieumegard	1973	8

About S. Rigo

S. Rigo is a scholar working on Surfaces, Coatings and Films, Ceramics and Composites and Electrical and Electronic Engineering, having authored 75 papers that have together received 1.4k indexed citations. Recurring topics across this work include Semiconductor materials and devices (54 papers), Ion-surface interactions and analysis (19 papers), Thin-Film Transistor Technologies (16 papers), Silicon Nanostructures and Photoluminescence (16 papers), Electron and X-Ray Spectroscopy Techniques (14 papers), Silicon and Solar Cell Technologies (13 papers), Nuclear Physics and Applications (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (8 papers). The work is most often cited by research in Surfaces, Coatings and Films (183 citations), Ceramics and Composites (122 citations) and Electrical and Electronic Engineering (1.0k citations). S. Rigo has collaborated with scholars based in France, Brazil and Germany. Frequent co-authors include F. Rochet, I. Trimaille, J.‐J. Ganem, G. Amsel, B. Agius, A. Straboni, J. Siejka, F. C. Stedile, I. J. R. Baumvol and E. Rosencher. Their work appears in journals such as Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, Journal of The Electrochemical Society, Applied Surface Science, Applied Physics Letters and Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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