R. Glang

3.3k total citations · 1 hit paper
20 papers, 2.4k citations indexed

About

R. Glang is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, R. Glang has authored 20 papers receiving a total of 2.4k indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 5 papers in Atomic and Molecular Physics, and Optics and 4 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in R. Glang's work include Semiconductor materials and devices (5 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor materials and interfaces (4 papers). R. Glang is often cited by papers focused on Semiconductor materials and devices (5 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor materials and interfaces (4 papers). R. Glang collaborates with scholars based in United States and United Kingdom. R. Glang's co-authors include L. I. Maissel, Paul P. Budenstein, W. Patrick, S. R. Herd, F. F. Morehead, R. F. Lever, Hans‐Jürgen Engell, Karl Häuffe and Philipp Schaible and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Thin Solid Films.

In The Last Decade

R. Glang

18 papers receiving 2.2k citations

Hit Papers

Handbook of Thin Film Technology 1971 2026 1989 2007 1971 500 1000 1.5k 2.0k

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
R. Glang United States 10 1.4k 1.0k 581 524 438 20 2.4k
Paul P. Budenstein United States 11 1.4k 1.0× 1.1k 1.1× 528 0.9× 487 0.9× 434 1.0× 26 2.5k
D. Gerstenberg United States 13 1.1k 0.8× 725 0.7× 545 0.9× 541 1.0× 293 0.7× 20 2.0k
C. A. Neugebauer United States 19 1.1k 0.8× 522 0.5× 678 1.2× 306 0.6× 315 0.7× 49 2.0k
Akira KINBARA Japan 30 1.2k 0.8× 1.2k 1.1× 949 1.6× 815 1.6× 709 1.6× 173 3.0k
R. M. Walser United States 19 921 0.6× 505 0.5× 873 1.5× 346 0.7× 525 1.2× 98 2.4k
L. Young Canada 27 1.9k 1.3× 1.7k 1.7× 851 1.5× 133 0.3× 253 0.6× 139 3.1k
M. Shatzkes United States 14 2.4k 1.7× 751 0.7× 932 1.6× 590 1.1× 208 0.5× 31 3.0k
G. E. Jellison United States 15 2.5k 1.8× 2.1k 2.1× 502 0.9× 230 0.4× 480 1.1× 44 3.6k
R. P. Netterfield Australia 27 1.0k 0.7× 1.2k 1.2× 406 0.7× 1.1k 2.2× 294 0.7× 74 2.3k
A. F. Mayadas United States 12 1.9k 1.3× 610 0.6× 1.1k 2.0× 592 1.1× 243 0.6× 28 2.7k

Countries citing papers authored by R. Glang

Since Specialization
Citations

This map shows the geographic impact of R. Glang's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Glang with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Glang more than expected).

Fields of papers citing papers by R. Glang

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. Glang. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Glang. The network helps show where R. Glang may publish in the future.

Co-authorship network of co-authors of R. Glang

This figure shows the co-authorship network connecting the top 25 collaborators of R. Glang. A scholar is included among the top collaborators of R. Glang based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. Glang. R. Glang is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Glang, R.. (1991). Defect size distribution in VLSI chips. IEEE Transactions on Semiconductor Manufacturing. 4(4). 265–269. 39 indexed citations
2.
Glang, R.. (1990). Defect size distribution in VLSI chips. 32. 57–60. 2 indexed citations
3.
Glang, R., et al.. (1988). Boron diffusion in silicon at high concentrations. Journal of Applied Physics. 63(1). 116–120. 31 indexed citations
4.
Maissel, L. I., R. Glang, & Paul P. Budenstein. (1971). Handbook of Thin Film Technology. Journal of The Electrochemical Society. 118(4). 114C–114C. 2040 indexed citations breakdown →
5.
Maissel, L. I. & R. Glang. (1970). Handbook of thin film technology. 5 indexed citations
6.
Glang, R., et al.. (1969). Pulse trimming of thin-film resistors. IEEE Spectrum. 6(8). 71–81. 3 indexed citations
7.
Glang, R. & Philipp Schaible. (1968). Tolerance limitations of etched film resistors. Thin Solid Films. 1(4). 309–322. 5 indexed citations
8.
Glang, R., et al.. (1967). Resistivity and Structure of Cr–SiO Cermet Films. Journal of Vacuum Science and Technology. 4(4). 163–170. 53 indexed citations
9.
Glang, R., et al.. (1967). Sheet resistance control of thin Cr-SiO films. Thin Solid Films. 1(2). 151–164. 8 indexed citations
10.
Glang, R.. (1966). Materials and Processes for Passive Thin-Film Components. Journal of Vacuum Science and Technology. 3(2). 37–48. 18 indexed citations
11.
Schaible, Philipp, et al.. (1966). Load-Life Tests of Cr-SiO Cermet Thin-Film Resistors. 143–157. 2 indexed citations
12.
Glang, R., et al.. (1965). Resistivity and Temperature Coefficient of Pure Molybdenum.. Journal of Chemical & Engineering Data. 10(2). 162–163. 10 indexed citations
13.
Glang, R., et al.. (1965). Vacuum Deposited Molybdenum Films. Journal of The Electrochemical Society. 112(8). 827–827. 15 indexed citations
14.
Glang, R., et al.. (1965). Determination of Stress in Films on Single Crystalline Silicon Substrates. Review of Scientific Instruments. 36(1). 7–10. 111 indexed citations
15.
Glang, R., et al.. (1963). Vacuum Evaporation of Cadmium Telluride. Journal of The Electrochemical Society. 110(5). 407–407. 58 indexed citations
16.
Glang, R., et al.. (1961). VAPOR PHASE GROWTH OF SILICON.. Defense Technical Information Center (DTIC). 1 indexed citations
17.
Glang, R., et al.. (1960). Donor Concentration at the Surface of a Diffused N-type Layer on P-type Germanium. Journal of The Electrochemical Society. 107(9). 758–758. 4 indexed citations
18.
Glang, R., et al.. (1960). Impurity Introduction during Epitaxial Growth of Silicon. IBM Journal of Research and Development. 4(3). 299–301. 5 indexed citations
19.
Glang, R.. (1960). Location of Diffused pn-Junctions on Germanium by Electrodeposition of Copper. Journal of The Electrochemical Society. 107(4). 356–356. 3 indexed citations
20.
Häuffe, Karl, R. Glang, & Hans‐Jürgen Engell. (1952). Der Einfluß der Elektronenfehlordnung oxydischer Katalysatoren auf die Zerfallsgeschwindigkeit des Stickoxyduls. Zeitschrift für Physikalische Chemie. 201(1). 223–245. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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