Michiro Isobe

400 total citations
34 papers, 334 citations indexed

About

Michiro Isobe is a scholar working on Materials Chemistry, Electrical and Electronic Engineering and Computational Mechanics. According to data from OpenAlex, Michiro Isobe has authored 34 papers receiving a total of 334 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Materials Chemistry, 18 papers in Electrical and Electronic Engineering and 16 papers in Computational Mechanics. Recurrent topics in Michiro Isobe's work include Semiconductor materials and devices (17 papers), Ion-surface interactions and analysis (16 papers) and Plasma Diagnostics and Applications (12 papers). Michiro Isobe is often cited by papers focused on Semiconductor materials and devices (17 papers), Ion-surface interactions and analysis (16 papers) and Plasma Diagnostics and Applications (12 papers). Michiro Isobe collaborates with scholars based in Japan, United States and Indonesia. Michiro Isobe's co-authors include Satoshi Hamaguchi, Kazuhiro Karahashi, Masahiro Nishikawa, Y. Ueda, Tomoko Ito, Y. Ohtsuka, Tetsuya Tatsumi, Kazunori Nagahata, Masanaga Fukasawa and Satoshi Numazawa and has published in prestigious journals such as Journal of Physics D Applied Physics, Japanese Journal of Applied Physics and Review of Scientific Instruments.

In The Last Decade

Michiro Isobe

34 papers receiving 319 citations

Peers

Countries citing papers authored by Michiro Isobe

Since Specialization

Citations

This map shows the geographic impact of Michiro Isobe's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michiro Isobe with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michiro Isobe more than expected).

Fields of papers citing papers by Michiro Isobe

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michiro Isobe. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michiro Isobe. The network helps show where Michiro Isobe may publish in the future.

Co-authorship network of co-authors of Michiro Isobe

This figure shows the co-authorship network connecting the top 25 collaborators of Michiro Isobe. A scholar is included among the top collaborators of Michiro Isobe based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Michiro Isobe. Michiro Isobe is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Surface chemical reactions of etch stop prevention in plasma-enhanced atomic layer etching of silicon nitride 2024 ·Surface and Coatings Technology ·(unknown), Akiko Hirata, Michiro Isobe, Kazuhiro Karahashi, Masanaga Fukasawa, Satoshi Hamaguchi	5
2	Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study 2024 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Michiro Isobe, Kazuhiro Karahashi, Magdaleno R. Vasquez, Satoshi Hamaguchi	1
3	Molecular dynamics simulations of silicon nitride atomic layer etching with Ar, Kr, and Xe ion irradiations 2024 ·Japanese Journal of Applied Physics ·(unknown), Michiro Isobe, Kazuhiro Karahashi, Satoshi Hamaguchi	3
4	Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals 2023 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Tomoko Ito, Michiro Isobe, Lenka Zajı́čková, Satoshi Hamaguchi	2
5	Molecular dynamics study of SiO2 nanohole etching by fluorocarbon ions 2023 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Michiro Isobe, Satoshi Hamaguchi	8
6	Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces 2023 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Michiro Isobe, Eric A. Hudson, Satoshi Hamaguchi	2
7	Molecular dynamics simulation of oxide-nitride bilayer etching with energetic fluorocarbon ions 2022 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Michiro Isobe, Eric A. Hudson, Satoshi Hamaguchi	11
8	Self-sputtering of the Lennard–Jones crystal 2022 ·Physics of Plasmas ·(unknown), (unknown), Michiro Isobe, Satoshi Hamaguchi	4
9	Molecular dynamics simulation for reactive ion etching of Si and SiO2 by SF5+ ions 2021 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·(unknown), Tomoko Ito, Kazuhiro Karahashi, Michiro Isobe, Satoshi Hamaguchi	13
10	Surface damage formation during atomic layer etching of silicon with chlorine adsorption 2021 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Michiro Isobe, Satoshi Hamaguchi	29
11	Molecular dynamics simulation of Si and SiO2 reactive ion etching by fluorine-rich ion species 2019 ·Surface and Coatings Technology ·(unknown), Michiro Isobe, Kazuhiro Karahashi, Satoshi Hamaguchi	22
12	Molecular dynamic simulation of damage formation at Si vertical walls by grazing incidence of energetic ions in gate etching processes 2015 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Michiro Isobe, Satoshi Hamaguchi	12
13	Numerical Simulation of Atomic Layer Oxidation of Silicon by Oxygen Gas Cluster Beams 2015 ·Plasma and Fusion Research ·(unknown), Michiro Isobe, Kazuhiro Karahashi, Satoshi Hamaguchi	1
14	Characterization of polymer layer formation during SiO 2014 ·Japanese Journal of Applied Physics ·(unknown), Tomoko Ito, Michiro Isobe, Kazuhiro Karahashi, Masanaga Fukasawa, Kazunori Nagahata, Tetsuya Tatsumi, Satoshi Hamaguchi	1
15	Si Damage Due to Oblique-Angle Ion Impact Relevant for Vertical Gate Etching Processes 2012 ·Japanese Journal of Applied Physics ·Tomoko Ito, Kazuhiro Karahashi, (unknown), Michiro Isobe, (unknown), (unknown), Satoshi Hamaguchi	14
16	Behavior of Falling Pebble for Pebble Divertor 2001 ·Fusion Technology ·(unknown), (unknown), Michiro Isobe, Masahiro Nishikawa	6
17	Operating windows of the pebble divertor 2001 ·Nuclear Fusion ·(unknown), Michiro Isobe, Y. Ohtsuka, Y. Ueda, Masahiro Nishikawa	6
18	Multilayer pebbles for application to new divertor systems 2000 ·Nuclear Fusion ·Michiro Isobe, (unknown), Y. Ohtsuka, Y. Ueda, Masahiro Nishikawa	15
19	Flux dependence of sputtering yield for C and B4C by high flux neutral beam 1995 ·Journal of Nuclear Materials ·Y. Ohtsuka, Michiro Isobe, (unknown), Y. Ueda, Shusaku Goto, Masahiro Nishikawa	13
20	Effects of sheath potential of source plasma on characteristics of low energy beam extraction 1994 ·Review of Scientific Instruments ·Y. Ueda, (unknown), Takafumi Yoshikawa, Michiro Isobe, Masahiro Nishikawa, (unknown)	9

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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