Michiro Isobe

400 total citations
34 papers, 334 citations indexed

About

Michiro Isobe is a scholar working on Materials Chemistry, Electrical and Electronic Engineering and Computational Mechanics. According to data from OpenAlex, Michiro Isobe has authored 34 papers receiving a total of 334 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Materials Chemistry, 18 papers in Electrical and Electronic Engineering and 16 papers in Computational Mechanics. Recurrent topics in Michiro Isobe's work include Semiconductor materials and devices (17 papers), Ion-surface interactions and analysis (16 papers) and Plasma Diagnostics and Applications (12 papers). Michiro Isobe is often cited by papers focused on Semiconductor materials and devices (17 papers), Ion-surface interactions and analysis (16 papers) and Plasma Diagnostics and Applications (12 papers). Michiro Isobe collaborates with scholars based in Japan, United States and Philippines. Michiro Isobe's co-authors include Satoshi Hamaguchi, Kazuhiro Karahashi, Masahiro Nishikawa, Y. Ueda, Tomoko Ito, Y. Ohtsuka, Tetsuya Tatsumi, Kazunori Nagahata, Masanaga Fukasawa and Satoshi Numazawa and has published in prestigious journals such as Journal of Physics D Applied Physics, Japanese Journal of Applied Physics and Review of Scientific Instruments.

In The Last Decade

Michiro Isobe

34 papers receiving 319 citations

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
Michiro Isobe 227 178 104 61 53 34 334
M.I. Patino 110 0.5× 194 1.1× 69 0.7× 94 1.5× 34 0.6× 41 309
T. Lynch 65 0.3× 365 2.1× 107 1.0× 110 1.8× 101 1.9× 10 420
Rajendra Singh Rajput 81 0.4× 171 1.0× 25 0.2× 76 1.2× 92 1.7× 28 278
Д. А. Комаров 91 0.4× 189 1.1× 44 0.4× 91 1.5× 52 1.0× 51 301
Dogyun Hwangbo 98 0.4× 350 2.0× 74 0.7× 123 2.0× 41 0.8× 43 430
Р. Х. Залавутдинов 51 0.2× 185 1.0× 66 0.6× 78 1.3× 64 1.2× 56 274
O.I. Buzhinskij 58 0.3× 240 1.3× 42 0.4× 60 1.0× 98 1.8× 30 301
S. Brons 105 0.5× 238 1.3× 34 0.3× 84 1.4× 205 3.9× 24 360
Christian Maszl 221 1.0× 153 0.9× 94 0.9× 230 3.8× 45 0.8× 26 318
С. Н. Аболмасов 303 1.3× 96 0.5× 17 0.2× 46 0.8× 29 0.5× 40 338

Countries citing papers authored by Michiro Isobe

Since Specialization
Citations

This map shows the geographic impact of Michiro Isobe's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michiro Isobe with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michiro Isobe more than expected).

Fields of papers citing papers by Michiro Isobe

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michiro Isobe. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michiro Isobe. The network helps show where Michiro Isobe may publish in the future.

Co-authorship network of co-authors of Michiro Isobe

This figure shows the co-authorship network connecting the top 25 collaborators of Michiro Isobe. A scholar is included among the top collaborators of Michiro Isobe based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Michiro Isobe. Michiro Isobe is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hirata, Akiko, et al.. (2024). Surface chemical reactions of etch stop prevention in plasma-enhanced atomic layer etching of silicon nitride. Surface and Coatings Technology. 477. 130365–130365. 5 indexed citations
2.
Isobe, Michiro, et al.. (2024). Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(5). 1 indexed citations
3.
Isobe, Michiro, et al.. (2024). Molecular dynamics simulations of silicon nitride atomic layer etching with Ar, Kr, and Xe ion irradiations. Japanese Journal of Applied Physics. 63(7). 07SP03–07SP03. 3 indexed citations
4.
Ito, Tomoko, et al.. (2023). Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(6). 2 indexed citations
5.
Isobe, Michiro, et al.. (2023). Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(2). 2 indexed citations
6.
Isobe, Michiro, et al.. (2023). Molecular dynamics study of SiO2 nanohole etching by fluorocarbon ions. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(2). 8 indexed citations
7.
Isobe, Michiro, et al.. (2022). Molecular dynamics simulation of oxide-nitride bilayer etching with energetic fluorocarbon ions. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 40(6). 11 indexed citations
8.
Isobe, Michiro, et al.. (2022). Self-sputtering of the Lennard–Jones crystal. Physics of Plasmas. 29(2). 4 indexed citations
9.
Ito, Tomoko, et al.. (2021). Molecular dynamics simulation for reactive ion etching of Si and SiO2 by SF5+ ions. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 39(4). 13 indexed citations
10.
Isobe, Michiro, et al.. (2021). Surface damage formation during atomic layer etching of silicon with chlorine adsorption. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 39(4). 29 indexed citations
11.
Ito, Tomoko, Michiro Isobe, Kazuhiro Karahashi, et al.. (2014). Characterization of polymer layer formation during SiO. Japanese Journal of Applied Physics. 53(3). 1 indexed citations
12.
Ito, Tomoko, et al.. (2012). Si Damage Due to Oblique-Angle Ion Impact Relevant for Vertical Gate Etching Processes. Japanese Journal of Applied Physics. 51(8S1). 08HB01–08HB01. 14 indexed citations
13.
Isobe, Michiro, et al.. (2001). Behavior of Falling Pebble for Pebble Divertor. Fusion Technology. 39(2P2). 934–938. 6 indexed citations
14.
Isobe, Michiro, et al.. (2001). Operating windows of the pebble divertor. Nuclear Fusion. 41(7). 827–832. 6 indexed citations
15.
Isobe, Michiro, et al.. (2000). Pumping performance of pebble drop divertor. Fusion Engineering and Design. 49-50. 283–287. 9 indexed citations
16.
Ohtsuka, Y., Miwako Tsuji, Y Kitamura, et al.. (1998). Boron ion particles sputtered from boron films deposited on graphites. Journal of Nuclear Materials. 258-263. 735–739. 1 indexed citations
17.
Nakano, Noboru, et al.. (1997). Spectroscopic measurement of kinetic energy of sputtered boron in electron cyclotron resonance plasma. Journal of Nuclear Materials. 241-243. 1122–1126. 1 indexed citations
18.
Ohtsuka, Y., et al.. (1995). Flux dependence of sputtering yield for C and B4C by high flux neutral beam. Journal of Nuclear Materials. 220-222. 886–889. 13 indexed citations
19.
Isobe, Michiro, et al.. (1995). Erosion yield of graphite and B4C irradiated by high flux deuterium beams. Fusion Engineering and Design. 28. 170–175. 3 indexed citations
20.
Ueda, Y., et al.. (1994). Effects of sheath potential of source plasma on characteristics of low energy beam extraction. Review of Scientific Instruments. 65(8). 2587–2593. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026