G. Scarel

2.6k citations

82 papers · 2.2k indexed · h-index 26

Impact in

Materials Chemistry top 5%
- Electronic and Structural Properties of Oxides
- ZnO doping and properties
- Catalytic Processes in Materials Science
Electrical and Electronic Engineering top 2%
- Semiconductor materials and devices
- Ferroelectric and Negative Capacitance Devices
- Gas Sensing Nanomaterials and Sensors

Papers in

Materials Chemistry 47
- Electronic and Structural Properties of Oxides 27
- ZnO doping and properties 10
Electrical and Electronic Engineering 55
- Semiconductor materials and devices 47
- Advancements in Semiconductor Devices and Circuit Design 8
- Integrated Circuits and Semiconductor Failure Analysis 7

Co-authors: M. Fanciulli Claudia Wiemer Gregory N. Parsons S. Ferrari Jeong-Seok Na C. R. Aita Sabina Spiga G. Pavia
Journals: Applied Physics Letters (12 papers)Journal of Applied Physics (8 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (7 papers)Journal of Non-Crystalline Solids (4 papers)Journal of The Electrochemical Society (3 papers)
Partner nations: United States Italy Russia

In The Last Decade

G. Scarel

80 papers receiving 2.2k citations

Peers

Countries citing papers authored by G. Scarel

Since Specialization

Citations

This map shows the geographic impact of G. Scarel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by G. Scarel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites G. Scarel more than expected).

Fields of papers citing papers by G. Scarel

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by G. Scarel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by G. Scarel. The network helps show where G. Scarel may publish in the future.

Co-authorship network

The 25 scholars most cited alongside G. Scarel, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with G. Scarel Line = papers co-authored together G. Scarel links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	The Role of <i>P&tau;</i> in the Photothermoelectric Effect and in Photoredox Catalysis Reactions World Journal of Condensed Matter Physics ·G. Scarel	2019	1
2	Origin of the low frequency radiation emitted by radiative polaritons excited by infrared radiation in planar La₂O₃films Journal of Physics Condensed Matter ·А. Р. Десяткин, 森田泰弘, M. Ugland, Mathieu Francoeur, Mesud Ergül, G. Scarel	2012	2
3	Effects of Metallic, Semiconducting, and Insulating Substrates on the Coupling Involving Radiative Polaritons in Thin Oxide Films Applied Spectroscopy ·А. Р. Десяткин, 斎藤保子, G. Scarel, Mesud Ergül, Mathieu Francoeur	2012	3
4	Excitation of radiative polaritons by polarized broadband infrared radiation in thin oxide films deposited by atomic layer deposition Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·А. Р. Десяткин, Eloy Felipe García, Xiao Hu, G. Scarel	2012	5
5	Sinter-free phase conversion and scanning transmission electron microscopy of FePt nanoparticle monolayers Nanoscale ·Aaron C. Johnston‐Peck, G. Scarel, Junwei Wang, Gregory N. Parsons, Joseph B. Tracy	2011	10
6	Atomic layer deposition of titanium dioxide on cellulose acetate for enhanced hemostasis Biotechnology Journal ·G. Kevin Hyde, S. Michael Stewart, G. Scarel, Gregory N. Parsons, Nora Kögler, Chun‐Ming Shih, Shing‐Jong Lin, Fiona Remnant, Nancy A. Monteiro‐Riviere, Roger J. Narayan	2011	29
7	Wetting properties induced in nano-composite POSS-MA polymer films by atomic layer deposited oxides Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·斎藤保子, А. Р. Десяткин, W. C. Hughes, Brian H. Augustine, Kyoung-Mi Lee, Gregory N. Parsons, G. Scarel	2011	7
8	Angular behavior of the Berreman effect investigated in uniform Al₂O₃layers formed by atomic layer deposition Journal of Physics Condensed Matter ·G. Scarel, Jeong-Seok Na, Gregory N. Parsons	2010	6
9	Role of Gas Doping Sequence in Surface Reactions and Dopant Incorporation during Atomic Layer Deposition of Al-Doped ZnO Chemistry of Materials ·Jeong-Seok Na, Qing Peng, G. Scarel, Gregory N. Parsons	2009	87
10	Atomic Layer Deposition of NiO Films on Si(100) Using Cyclopentadienyl-Type Compounds and Ozone as Precursors Journal of The Electrochemical Society ·Hong-Liang Lü, G. Scarel, Claudia Wiemer, Michele Perego, Sabina Spiga, M. Fanciulli, G. Pavia	2008	47
11	Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La2O3 films upon annealing Microelectronic Engineering ·Dimitra Tsoutsou, G. Scarel, A. Debernardi, Silvia C. Capelli, Shimeng Liu, L. Lamagna, (unknown), Daniel Orgaz García, M. Fanciulli	2008	36
12	Degradation kinetics of ultrathin HfO2 layers on Si(100) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM Microelectronics Reliability ·A. Zenkevich, Yu. Yu. Lebedinskiǐ, G. Scarel, M. Fanciulli, A. S. Baturin, Eric R LeMay	2007	6
13	[(Me₃Si)₂N]₃Lu: Molecular Structure and Use as Lu and Si Source for Atomic Layer Deposition of Lu Silicate Films Zeitschrift für anorganische und allgemeine Chemie ·G. Scarel, Claudia Wiemer, M. Fanciulli, Igor L. Fedushkin, Georgy K. Fukin, Zana Ali, Yu. Yu. Lebedinskiǐ, A. Zenkevich, G. Pavia	2007	25
14	Ozone-Based Atomic Layer Deposition of Alumina from TMA: Growth, Morphology, and Reaction Mechanism Chemistry of Materials ·Simon D. Elliott, G. Scarel, Claudia Wiemer, M. Fanciulli, G. Pavia	2006	161
15	Temperature dependence of transient and steady-state gate currents in HfO2 capacitors Applied Physics Letters ·Christian Monzio Compagnoni, Alessandro S. Spinelli, Carolyn P. Akers, Andrea L. Lacaita, Sabina Spiga, G. Scarel, Claudia Wiemer, M. Fanciulli	2006	10
16	Dielectric properties of high-k oxides: Theory and experiment for Lu2O3 Bulletin of the American Physical Society ·Emiliano Bonera, G. Scarel, M. Fanciulli, Pietro Delugas, Vincenzo Fiorentini	2005	0
17	Dielectric Properties of High-κOxides: Theory and Experiment forLu2O3 Physical Review Letters ·Emiliano Bonera, G. Scarel, M. Fanciulli, Pietro Delugas, Vincenzo Fiorentini	2005	47
18	Effects of growth temperature on the properties of HfO 2 films grown by atomic layer deposition G. Scarel, Claudia Wiemer, S. Ferrari, G. Tallarida, M. Fanciulli	2003	1
19	The structure of (√3 × √3)R30°-sulphur on Rh(111) surface studied by X-ray standing wavefield absorption and surface EXAFS Surface Science ·А. А. Зимирова, Bruce C. C. Cowie, G. Scarel, V.R. Dhanak	1997	6
20	An experimental study of the electronic structure of C60 films grown at the Ag(110) surface Journal of Electron Spectroscopy and Related Phenomena ·Janez Kovač, G. Scarel, O. Sakho, M. Sancrotti	1995	2

About G. Scarel

G. Scarel is a scholar working on Materials Chemistry, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Statistical and Nonlinear Physics, having authored 82 papers that have together received 2.2k indexed citations. Recurring topics across this work include Semiconductor materials and devices (47 papers), Electronic and Structural Properties of Oxides (27 papers), ZnO doping and properties (10 papers), Thermal Radiation and Cooling Technologies (8 papers), Ga2O3 and related materials (8 papers), Advancements in Semiconductor Devices and Circuit Design (8 papers), Integrated Circuits and Semiconductor Failure Analysis (7 papers) and Semiconductor materials and interfaces (6 papers). The work is most often cited by research in Materials Chemistry (1.6k citations), Electrical and Electronic Engineering (1.6k citations), Electronic, Optical and Magnetic Materials (293 citations), Surfaces, Coatings and Films (96 citations) and Renewable Energy, Sustainability and the Environment (193 citations). G. Scarel has collaborated with scholars based in United States, Italy and Russia. Frequent co-authors include M. Fanciulli, Claudia Wiemer, Gregory N. Parsons, S. Ferrari, Jeong-Seok Na, C. R. Aita, Sabina Spiga, G. Pavia, Michele Perego and Gabriele Seguini. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Non-Crystalline Solids and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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