Kouichi Ono

2.6k total citations
146 papers, 2.2k citations indexed

About

Kouichi Ono is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Mechanics of Materials. According to data from OpenAlex, Kouichi Ono has authored 146 papers receiving a total of 2.2k indexed citations (citations by other indexed papers that have themselves been cited), including 135 papers in Electrical and Electronic Engineering, 39 papers in Computational Mechanics and 31 papers in Mechanics of Materials. Recurrent topics in Kouichi Ono's work include Semiconductor materials and devices (89 papers), Plasma Diagnostics and Applications (69 papers) and Ion-surface interactions and analysis (38 papers). Kouichi Ono is often cited by papers focused on Semiconductor materials and devices (89 papers), Plasma Diagnostics and Applications (69 papers) and Ion-surface interactions and analysis (38 papers). Kouichi Ono collaborates with scholars based in Japan, United States and Germany. Kouichi Ono's co-authors include Koji Eriguchi, Yoshinori Takao, Mutumi Tuda, Yoshinori Nakakubo, Asahiko Matsuda, Hiroyuki Kousaka, Kazuo Takahashi, Tatsuo Oomori, Masayuki Kamei and Hiroaki Ohta and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Physics D Applied Physics.

In The Last Decade

Kouichi Ono

144 papers receiving 2.1k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Kouichi Ono Japan 26 2.0k 496 456 429 258 146 2.2k
Koji Eriguchi Japan 25 2.0k 1.0× 381 0.8× 377 0.8× 428 1.0× 174 0.7× 179 2.2k
J.P. McVittie United States 30 2.6k 1.3× 532 1.1× 987 2.2× 265 0.6× 517 2.0× 116 3.3k
Tiberiu Minea France 27 1.5k 0.8× 1.5k 3.1× 1.2k 2.6× 421 1.0× 284 1.1× 128 2.3k
T.A. Grotjohn United States 27 1.1k 0.5× 743 1.5× 1.2k 2.6× 134 0.3× 344 1.3× 101 1.9k
R. S. Robinson United States 15 999 0.5× 364 0.7× 338 0.7× 370 0.9× 285 1.1× 56 1.3k
David R. Boris United States 20 804 0.4× 319 0.6× 426 0.9× 97 0.2× 112 0.4× 79 1.2k
C. R. Guarnieri United States 14 1.1k 0.5× 553 1.1× 700 1.5× 115 0.3× 371 1.4× 35 1.6k
Seitaro Matsuo Japan 14 864 0.4× 289 0.6× 282 0.6× 111 0.3× 200 0.8× 43 1.0k
Shoji Miyake Japan 22 831 0.4× 753 1.5× 856 1.9× 120 0.3× 192 0.7× 141 1.7k
Sudeep Bhattacharjee India 17 1.0k 0.5× 149 0.3× 274 0.6× 135 0.3× 614 2.4× 104 1.4k

Countries citing papers authored by Kouichi Ono

Since Specialization
Citations

This map shows the geographic impact of Kouichi Ono's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Kouichi Ono with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Kouichi Ono more than expected).

Fields of papers citing papers by Kouichi Ono

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Kouichi Ono. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Kouichi Ono. The network helps show where Kouichi Ono may publish in the future.

Co-authorship network of co-authors of Kouichi Ono

This figure shows the co-authorship network connecting the top 25 collaborators of Kouichi Ono. A scholar is included among the top collaborators of Kouichi Ono based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Kouichi Ono. Kouichi Ono is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Nishida, Kentaro, Kouichi Ono, & Koji Eriguchi. (2017). Optical model for spectroscopic ellipsometry analysis of plasma-induced damage to SiOC films. Japanese Journal of Applied Physics. 56(6S2). 06HD01–06HD01. 4 indexed citations
2.
Ono, Kouichi, et al.. (2017). An evaluation method of the profile of plasma-induced defects based on capacitance–voltage measurement. Japanese Journal of Applied Physics. 56(6S2). 06HD04–06HD04. 2 indexed citations
3.
Matsumoto, H., et al.. (2016). Surface smoothing during plasma etching of Si in Cl2. Applied Physics Letters. 109(20). 8 indexed citations
4.
Mori, Daisuke, et al.. (2015). Particle-in-Cell Simulation of a Micro ECR Plasma Thruster. Bulletin of the American Physical Society. 1 indexed citations
5.
Takao, Yoshinori, et al.. (2015). Ar/H 2 のrfマグネトロンスパッタによるSiとSiO 2 基板上のシリコンナノワイヤの成長. Applied Physics Express. 8(6). 1–66201. 1 indexed citations
6.
Kamei, Masayuki, Yoshinori Takao, Koji Eriguchi, & Kouichi Ono. (2014). Effects of plasma-induced charging damage on random telegraph noise in metal–oxide–semiconductor field-effect transistors with SiO. Japanese Journal of Applied Physics. 53(3). 1 indexed citations
7.
Takao, Yoshinori, Masataka Sakamoto, Koji Eriguchi, & Kouichi Ono. (2014). Investigation of Plasma Characteristics and Ion Beam Extraction for a Micro RF Ion Thruster. TRANSACTIONS OF THE JAPAN SOCIETY FOR AERONAUTICAL AND SPACE SCIENCES AEROSPACE TECHNOLOGY JAPAN. 12(ists29). Pb_13–Pb_18. 6 indexed citations
8.
Eriguchi, Koji, Yoshinori Nakakubo, Asahiko Matsuda, et al.. (2012). Optimization problems for plasma-induced damage - A concept for plasma-induced damage design. 47. 1–4. 1 indexed citations
9.
Takao, Yoshinori, et al.. (2011). PIC-MCC Simulations of Capacitive RF Discharges for Plasma Etching. AIP conference proceedings. 1051–1056. 4 indexed citations
10.
Takao, Yoshinori, et al.. (2011). Molecular Dynamics Analysis of the Formation of Surface Roughness during Si Etching in Chlorine-Based Plasmas. Japanese Journal of Applied Physics. 50(8S2). 08KB02–08KB02. 3 indexed citations
11.
Takahashi, Takeshi, et al.. (2011). Microwave-excited microplasma thruster with helium and hydrogen propellants. Physics of Plasmas. 18(6). 19 indexed citations
12.
Takao, Yoshinori, Koji Eriguchi, & Kouichi Ono. (2010). Numerical Analysis of a Micro Ion Thruster Using PIC/MCC Model. 1 indexed citations
13.
Eriguchi, Koji, Yoshinori Nakakubo, Asahiko Matsuda, et al.. (2010). Comprehensive Modeling of Threshold Voltage Variability Induced by Plasma Damage in Advanced Metal–Oxide–Semiconductor Field-Effect Transistors. Japanese Journal of Applied Physics. 49(4S). 04DA18–04DA18. 14 indexed citations
14.
Eriguchi, Koji, Masayuki Kamei, Yoshinori Takao, & Kouichi Ono. (2010). Modeling the effects of plasma-induced physical damage on subthreshold leakage current in scaled MOSFETs. 94–97. 2 indexed citations
15.
Takao, Yoshinori, et al.. (2009). SiO 2 の誘導結合CF 4 プラズマエッチング中の反応原料と反応生成物のプラズマ化学的挙動. Plasma Sources Science and Technology. 18(4). 1–17. 17 indexed citations
16.
Setsuhara, Yuichi, Kouichi Ono, & Akinori Ebe. (2007). Development of a Meters-Scale Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Giant Electronics Processing. OUKA (Osaka University Knowledge Archive) (Osaka University). 36(2). 95–97. 1 indexed citations
17.
Kousaka, Hiroyuki & Kouichi Ono. (2002). Numerical Analysis of the Electromagnetic Fields in a Microwave Plasma Source Excited by Azimuthally Symmetric Surface Waves. Japanese Journal of Applied Physics. 41(Part 1, No. 4A). 2199–2206. 37 indexed citations
18.
Horikawa, Tsuyoshi, Junji Tanimura, Takaaki Kawahara, et al.. (1998). Effects of Post-Annealing on Dielectric Properties of (Ba, Sr)TiO 3 Thin Films Prepared by Liquid Source Chemical Vapor Deposition. IEICE Transactions on Electronics. 81(4). 497–504. 5 indexed citations
19.
Ono, Kouichi. (1981). Plasma Formation in a Neutral Gas by a Short-Pulsed, High-Current Electron Beam. Japanese Journal of Applied Physics. 20(8). 1515–1515. 6 indexed citations
20.
Ono, Kouichi. (1980). UV∼Near-IR Laser Lines in Electron-Beam-Produced Rare Gas Plasmas. Journal of the Physical Society of Japan. 48(6). 2175–2176. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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