Koji Eriguchi

2.6k total citations
179 papers, 2.2k citations indexed

About

Koji Eriguchi is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Mechanics of Materials. According to data from OpenAlex, Koji Eriguchi has authored 179 papers receiving a total of 2.2k indexed citations (citations by other indexed papers that have themselves been cited), including 168 papers in Electrical and Electronic Engineering, 44 papers in Computational Mechanics and 37 papers in Mechanics of Materials. Recurrent topics in Koji Eriguchi's work include Semiconductor materials and devices (134 papers), Plasma Diagnostics and Applications (61 papers) and Integrated Circuits and Semiconductor Failure Analysis (60 papers). Koji Eriguchi is often cited by papers focused on Semiconductor materials and devices (134 papers), Plasma Diagnostics and Applications (61 papers) and Integrated Circuits and Semiconductor Failure Analysis (60 papers). Koji Eriguchi collaborates with scholars based in Japan, United States and South Korea. Koji Eriguchi's co-authors include Kouichi Ono, Yoshinori Takao, Yoshinori Nakakubo, Asahiko Matsuda, M. Niwa, Masayuki Kamei, Hiroaki Ohta, K. Ono, Takeshi Takahashi and Hiromichi Ohta and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Applied Surface Science.

In The Last Decade

Koji Eriguchi

171 papers receiving 2.1k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Koji Eriguchi Japan 25 2.0k 428 381 377 191 179 2.2k
Kouichi Ono Japan 26 2.0k 1.0× 429 1.0× 496 1.3× 456 1.2× 249 1.3× 146 2.2k
Y. Horiike Japan 16 584 0.3× 113 0.3× 187 0.5× 234 0.6× 92 0.5× 69 789
D. B. Brown United States 28 1.6k 0.8× 87 0.2× 104 0.3× 335 0.9× 116 0.6× 67 2.2k
R. S. Robinson United States 15 999 0.5× 370 0.9× 364 1.0× 338 0.9× 74 0.4× 56 1.3k
C. S. Pai United States 20 877 0.4× 146 0.3× 94 0.2× 285 0.8× 161 0.8× 74 1.4k
Ajay Kumar India 16 1.5k 0.8× 130 0.3× 138 0.4× 211 0.6× 106 0.6× 76 1.9k
P. V. Dressendorfer United States 28 4.0k 2.0× 126 0.3× 50 0.1× 988 2.6× 225 1.2× 59 4.4k
A.F. Tasch United States 31 3.0k 1.5× 486 1.1× 105 0.3× 1.3k 3.3× 141 0.7× 213 3.5k
Ki‐Woong Whang South Korea 18 1.0k 0.5× 51 0.1× 174 0.5× 362 1.0× 84 0.4× 117 1.1k
Parviz Elahi Türkiye 13 697 0.4× 446 1.0× 163 0.4× 102 0.3× 60 0.3× 42 1.4k

Countries citing papers authored by Koji Eriguchi

Since Specialization
Citations

This map shows the geographic impact of Koji Eriguchi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Koji Eriguchi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Koji Eriguchi more than expected).

Fields of papers citing papers by Koji Eriguchi

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Koji Eriguchi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Koji Eriguchi. The network helps show where Koji Eriguchi may publish in the future.

Co-authorship network of co-authors of Koji Eriguchi

This figure shows the co-authorship network connecting the top 25 collaborators of Koji Eriguchi. A scholar is included among the top collaborators of Koji Eriguchi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Koji Eriguchi. Koji Eriguchi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hattori, T., et al.. (2025). Characterization of time-dependent dielectric degradation and breakdown in bulk hexagonal BN/Si structures. Journal of Applied Physics. 137(10). 1 indexed citations
2.
3.
Urabe, Keiichiro, et al.. (2025). Characterization methods for plasma process-induced damage to dielectric films with pre-existing defects. Japanese Journal of Applied Physics. 64(6). 06SP10–06SP10.
4.
Urabe, Keiichiro, Takayuki Matsuda, Takashi Hamano, et al.. (2024). Study on Ion Flux From Magnetically Confined Low-Pressure Arc Discharge With a Thermionic Cathode to Substrate for High-Throughput Film Deposition Processes. IEEE Transactions on Plasma Science. 52(6). 2333–2342. 2 indexed citations
5.
Hamano, Takashi, et al.. (2022). Ion irradiation-induced sputtering and surface modification of BN films prepared by a reactive plasma-assisted coating technique. Japanese Journal of Applied Physics. 61(SI). SI1014–SI1014. 3 indexed citations
6.
Hamano, Takashi, Takayuki Matsuda, Shigehiko Hasegawa, et al.. (2022). Spectroscopic ellipsometry characterization of boron nitride films synthesized by a reactive plasma-assisted coating method. Applied Physics Letters. 120(3). 6 indexed citations
7.
Sato, Yoshihiro, et al.. (2022). Characterization of Plasma Process-Induced Low-Density Defect Creation by Lateral Junction Leakage. IEEE Journal of the Electron Devices Society. 10. 769–777. 1 indexed citations
8.
Sato, Yoshihiro, et al.. (2022). Predicting the effects of plasma-induced damage on p–n junction leakage and its application in the characterization of defect distribution. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 40(6).
9.
Urabe, Keiichiro, et al.. (2022). Multi-harmonic analysis in a floating harmonic probe method for diagnostics of electron energy and ion density in low-temperature plasmas. Japanese Journal of Applied Physics. 61(10). 106002–106002.
10.
Eriguchi, Koji. (2021). Characterization techniques of ion bombardment damage on electronic devices during plasma processing—plasma process-induced damage. Japanese Journal of Applied Physics. 60(4). 40101–40101. 17 indexed citations
11.
Urabe, Keiichiro, et al.. (2020). Characterization of dynamic behaviors of defects in Si substrates created by H 2 plasma using conductance method. Japanese Journal of Applied Physics. 59(SJ). SJJC02–SJJC02. 6 indexed citations
12.
Hamano, Takashi, Keiichiro Urabe, & Koji Eriguchi. (2019). Investigation of spatial and energy profiles of plasma process-induced latent defects in Si substrate using capacitance–voltage characteristics. Journal of Physics D Applied Physics. 6 indexed citations
13.
Nishida, Kentaro, Kouichi Ono, & Koji Eriguchi. (2017). Optical model for spectroscopic ellipsometry analysis of plasma-induced damage to SiOC films. Japanese Journal of Applied Physics. 56(6S2). 06HD01–06HD01. 4 indexed citations
14.
Mori, Daisuke, et al.. (2015). Particle-in-Cell Simulation of a Micro ECR Plasma Thruster. Bulletin of the American Physical Society. 1 indexed citations
15.
Kamei, Masayuki, Yoshinori Takao, Koji Eriguchi, & Kouichi Ono. (2014). Effects of plasma-induced charging damage on random telegraph noise in metal–oxide–semiconductor field-effect transistors with SiO. Japanese Journal of Applied Physics. 53(3). 1 indexed citations
16.
Takao, Yoshinori, Masataka Sakamoto, Koji Eriguchi, & Kouichi Ono. (2014). Investigation of Plasma Characteristics and Ion Beam Extraction for a Micro RF Ion Thruster. TRANSACTIONS OF THE JAPAN SOCIETY FOR AERONAUTICAL AND SPACE SCIENCES AEROSPACE TECHNOLOGY JAPAN. 12(ists29). Pb_13–Pb_18. 6 indexed citations
17.
Eriguchi, Koji, Yoshinori Nakakubo, Asahiko Matsuda, et al.. (2012). Optimization problems for plasma-induced damage - A concept for plasma-induced damage design. 47. 1–4. 1 indexed citations
18.
Takao, Yoshinori, et al.. (2011). PIC-MCC Simulations of Capacitive RF Discharges for Plasma Etching. AIP conference proceedings. 1051–1056. 4 indexed citations
19.
Eriguchi, Koji, et al.. (2000). Impacts of strained SiO2 on TDDB lifetime projection. Symposium on VLSI Technology. 216–217.
20.
Eriguchi, Koji, Masatoshi Arai, Yukiharu Uraoka, & Masafumi Kubota. (1995). Plasma-induced transconductance degradation of nMOSFET with thin gate oxide. IEICE Transactions on Electronics. 78(3). 261–266. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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