K. Maex

635 total citations
19 papers, 533 citations indexed

About

K. Maex is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, K. Maex has authored 19 papers receiving a total of 533 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Electrical and Electronic Engineering, 10 papers in Atomic and Molecular Physics, and Optics and 10 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in K. Maex's work include Copper Interconnects and Reliability (10 papers), Semiconductor materials and interfaces (9 papers) and Semiconductor materials and devices (9 papers). K. Maex is often cited by papers focused on Copper Interconnects and Reliability (10 papers), Semiconductor materials and interfaces (9 papers) and Semiconductor materials and devices (9 papers). K. Maex collaborates with scholars based in Belgium, United States and Sweden. K. Maex's co-authors include Sywert Brongersma, I. Vervoort, H. Bender, Emma Kerr, Wilfried Vandervorst, R.L. Van Meirhaeghe, Christophe Detavernier, F. Cardon, Caroline M. Whelan and Bert Brijs and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

K. Maex

17 papers receiving 510 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
K. Maex Belgium 11 427 253 165 162 101 19 533
Changsup Ryu United States 10 413 1.0× 334 1.3× 120 0.7× 80 0.5× 156 1.5× 16 518
R. Ruiz United States 13 449 1.1× 299 1.2× 140 0.8× 181 1.1× 235 2.3× 32 566
N. Lustig United States 12 419 1.0× 146 0.6× 193 1.2× 104 0.6× 48 0.5× 28 529
K. Hieber Germany 9 253 0.6× 123 0.5× 65 0.4× 98 0.6× 148 1.5× 25 345
Jeremy Thurn United States 11 234 0.5× 87 0.3× 187 1.1× 95 0.6× 234 2.3× 17 458
H. Geisler Germany 12 226 0.5× 129 0.5× 156 0.9× 89 0.5× 171 1.7× 53 464
B. M. Ullrich United States 10 214 0.5× 113 0.4× 106 0.6× 139 0.9× 45 0.4× 12 332
M. H. Hong United States 9 319 0.7× 70 0.3× 120 0.7× 105 0.6× 63 0.6× 18 452
K. A. Ellis United States 10 263 0.6× 141 0.6× 143 0.9× 137 0.8× 45 0.4× 18 415
P.J. Pokela United States 8 351 0.8× 302 1.2× 77 0.5× 140 0.9× 194 1.9× 13 438

Countries citing papers authored by K. Maex

Since Specialization
Citations

This map shows the geographic impact of K. Maex's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Maex with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Maex more than expected).

Fields of papers citing papers by K. Maex

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. Maex. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Maex. The network helps show where K. Maex may publish in the future.

Co-authorship network of co-authors of K. Maex

This figure shows the co-authorship network connecting the top 25 collaborators of K. Maex. A scholar is included among the top collaborators of K. Maex based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K. Maex. K. Maex is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

19 of 19 papers shown
1.
Armini, Silvia, Caroline M. Whelan, Mansour Moinpour, & K. Maex. (2008). Mixed Organic/Inorganic Abrasive Particles during Oxide CMP. Electrochemical and Solid-State Letters. 11(7). H197–H197. 4 indexed citations
2.
Armini, Silvia, Caroline M. Whelan, Mansour Moinpour, & K. Maex. (2008). Composite Polymer Core–Silica Shell Abrasives: The Effect of the Shape of the Silica Particles on Oxide CMP. Journal of The Electrochemical Society. 155(6). H401–H401. 24 indexed citations
3.
Brongersma, Sywert, et al.. (2007). Analysis of the size effect in electroplated fine copper wires and a realistic assessment to model copper resistivity. Journal of Applied Physics. 101(6). 73 indexed citations
4.
Detavernier, Christophe, R.L. Van Meirhaeghe, H. Bender, et al.. (2002). CoSi 2 formation in the presence of carbon. Journal of Applied Physics. 92(3). 1207–1211. 19 indexed citations
5.
Brongersma, Sywert, et al.. (2002). Grain Growth, Stress, and Impurities in Electroplated Copper. Journal of materials research/Pratt's guide to venture capital sources. 17(3). 582–589. 100 indexed citations
6.
Satta, A., Jörg Schuhmacher, Caroline M. Whelan, et al.. (2002). Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2. Journal of Applied Physics. 92(12). 7641–7646. 82 indexed citations
7.
Detavernier, Christophe, R.L. Van Meirhaeghe, F. Cardon, et al.. (2001). Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer. Journal of Applied Physics. 89(4). 2146–2150. 26 indexed citations
8.
Shamiryan, Denis, Mikhaı̈l R. Baklanov, S. Vanhaelemeersch, & K. Maex. (2001). Controllable Change of Porosity of 3-Methylsilane Low-k Dielectric Film. Electrochemical and Solid-State Letters. 4(1). F3–F3. 34 indexed citations
9.
Ghica, Corneliu, L. C. Nistor, H. Bender, et al.. (2001). In situ transmission electron microscopy study of the silicidation process in Co thin films on patterned (001) Si substrates. Journal of materials research/Pratt's guide to venture capital sources. 16(3). 701–708. 2 indexed citations
10.
Detavernier, Christophe, R.L. Van Meirhaeghe, F. Cardon, et al.. (2000). CoSi 2 formation in the Ti/Co/SiO2/Si system. Journal of Applied Physics. 88(1). 133–140. 30 indexed citations
11.
Detavernier, Christophe, R.L. Van Meirhaeghe, F. Cardon, et al.. (2000). Influence of Ti on CoSi2 nucleation. Applied Physics Letters. 77(20). 3170–3172. 36 indexed citations
12.
Brongersma, Sywert, E. Richard, I. Vervoort, & K. Maex. (1999). Stress in electrochemically deposited copper. AIP conference proceedings. 249–254. 2 indexed citations
13.
Proost, Joris, et al.. (1999). Effect of Cu on Al Interfacial Mass Transport in Bamboo Rie and Damascene Al(Cu). MRS Proceedings. 563.
14.
Brongersma, Sywert, E. Richard, I. Vervoort, et al.. (1999). Two-step room temperature grain growth in electroplated copper. Journal of Applied Physics. 86(7). 3642–3645. 81 indexed citations
15.
Detavernier, Christophe, et al.. (1999). The Influence of Ti Capping Layers on CoSi2 Formation in the Presence of Interfacial Oxide. MRS Proceedings. 564. 1 indexed citations
16.
Bender, H., et al.. (1999). Microstructural studies by transmission electron microscopy of the formation of ultrathin PtSi layers with novel silicidation processes. Journal of materials research/Pratt's guide to venture capital sources. 14(6). 2577–2587. 3 indexed citations
17.
Mouroux, A., Shaoling Zhang, C. S. Petersson, et al.. (1998). An experimental study of chemical vapour deposition of tungsten on Ti/TiN adhesion bilayers: mechanical properties. Surface and Coatings Technology. 99(3). 274–280. 4 indexed citations
18.
Donaton, R. A., H. Bender, Kris Baert, et al.. (1997). Formation of ultra-thin PtSi layers with a 2-step silicidation process. Microelectronic Engineering. 37-38. 507–514. 10 indexed citations
19.
Lauwers, A., et al.. (1995). bilayers in salicide technology: electrical evaluation. Applied Surface Science. 91(1-4). 12–18. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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