John Borland

661 total citations
70 papers, 490 citations indexed

About

John Borland is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering. According to data from OpenAlex, John Borland has authored 70 papers receiving a total of 490 indexed citations (citations by other indexed papers that have themselves been cited), including 64 papers in Electrical and Electronic Engineering, 13 papers in Atomic and Molecular Physics, and Optics and 9 papers in Biomedical Engineering. Recurrent topics in John Borland's work include Semiconductor materials and devices (35 papers), Silicon and Solar Cell Technologies (32 papers) and Integrated Circuits and Semiconductor Failure Analysis (27 papers). John Borland is often cited by papers focused on Semiconductor materials and devices (35 papers), Silicon and Solar Cell Technologies (32 papers) and Integrated Circuits and Semiconductor Failure Analysis (27 papers). John Borland collaborates with scholars based in United States, Japan and Taiwan. John Borland's co-authors include Michael Current, T. Dı́az de la Rubia, Mark E. Law, J. Melngailis, O. W. Holland, Eric Chason, D. J. Eaglesham, A.F. Tasch, C. W. Magee and J. W. Mayer and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Thin Solid Films.

In The Last Decade

John Borland

56 papers receiving 440 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
John Borland United States 9 372 146 123 99 90 70 490
Oleg Kononchuk France 13 401 1.1× 126 0.9× 111 0.9× 145 1.5× 47 0.5× 75 490
Amitabh Jain United States 12 329 0.9× 195 1.3× 104 0.8× 72 0.7× 134 1.5× 125 497
Brian R. Tull United States 8 241 0.6× 243 1.7× 273 2.2× 64 0.6× 79 0.9× 8 457
C.C.G. Visser Netherlands 8 357 1.0× 130 0.9× 43 0.3× 129 1.3× 96 1.1× 23 440
T. Akatsu France 14 453 1.2× 131 0.9× 61 0.5× 167 1.7× 25 0.3× 20 522
Zhengxiu Fan China 12 195 0.5× 120 0.8× 132 1.1× 55 0.6× 70 0.8× 38 362
Johann Zehetner Austria 10 160 0.4× 106 0.7× 116 0.9× 44 0.4× 77 0.9× 30 308
Frank Torregrosa France 11 318 0.9× 191 1.3× 169 1.4× 109 1.1× 109 1.2× 69 514
Mathieu Halbwax France 14 448 1.2× 230 1.6× 144 1.2× 217 2.2× 54 0.6× 35 653
M. Italia Italy 12 430 1.2× 133 0.9× 118 1.0× 124 1.3× 26 0.3× 36 499

Countries citing papers authored by John Borland

Since Specialization
Citations

This map shows the geographic impact of John Borland's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by John Borland with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites John Borland more than expected).

Fields of papers citing papers by John Borland

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by John Borland. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by John Borland. The network helps show where John Borland may publish in the future.

Co-authorship network of co-authors of John Borland

This figure shows the co-authorship network connecting the top 25 collaborators of John Borland. A scholar is included among the top collaborators of John Borland based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with John Borland. John Borland is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Borland, John. (2023). A Historical Review of Selective Epitaxial Growth: From 1962 to Present. 1(3). 9–21. 2 indexed citations
2.
Borland, John, et al.. (2020). Strain evaluation in Ge and Sn implanted Si layers with laser and rapid thermal annealing. Materials Science in Semiconductor Processing. 120. 105282–105282. 4 indexed citations
3.
Borland, John, Tseung‐Yuen Tseng, Abhijeet Joshi, et al.. (2018). Boosting Ge-Epi P-Well Mobility & Crystal Quality with Si or Sn Implantation and Melt Annealing. ECS Transactions. 86(7). 357–372. 3 indexed citations
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Nagayama, Tsutomu, et al.. (2009). Cluster Ion Implantation System: Claris for Beyond 45nm Device Fabrication (Ii). ECS Transactions. 18(1). 1059–1064. 14 indexed citations
8.
Borland, John, Tsutomu Nagayama, Temel Büyüklimanli, et al.. (2009). 22nm node n+ SiC stressor using deep PAI+C7H7+P4 with laser annealing. 1–8. 1 indexed citations
9.
Current, Michael & John Borland. (2008). New metrologies for annealing of USJs and thin films. 39. 43–55. 2 indexed citations
10.
Borland, John, David G. Seiler, Alain C. Diebold, et al.. (2007). Dopant Activation and Profile Determination with an Elastic Material Probe (EM-Probe). AIP conference proceedings. 931. 261–264.
11.
Borland, John. (2007). 32nm Node USJ Implant & Annealing Options. 2 indexed citations
12.
McCoy, S., et al.. (2006). Flash Annealing Technology for USJ: Modeling and Metrology. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 103–110. 2 indexed citations
13.
Buczkowski, A., et al.. (2006). Non-Contact, Image-Based Photoluminescence Metrology for Ion Implantation and Annealing Process Inspection. AIP conference proceedings. 866. 566–569. 1 indexed citations
14.
Hautala, J. & John Borland. (2005). Infusion processing solutions for USJ and localized strained-Si using gas cluster ion beams. 2. 37–45. 1 indexed citations
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Chen, Wei, et al.. (2003). The use of selective silicide plugs for submicron contact fill. 136–143. 1 indexed citations
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Borland, John, et al.. (1993). Properties of chemical-vapor-deposited titanium nitride. Thin Solid Films. 236(1-2). 311–318. 74 indexed citations
19.
Borland, John, et al.. (1991). Surface planarity and microstructure of low temperature silicon SEG and ELO. Journal of materials research/Pratt's guide to venture capital sources. 6(4). 784–791. 12 indexed citations
20.
Borland, John. (1987). Novel device structures by selective epitaxial growth (SEG). 12–15. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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