Jerry A. Stefani

490 total citations
24 papers, 383 citations indexed

About

Jerry A. Stefani is a scholar working on Mechanical Engineering, Electrical and Electronic Engineering and Biomedical Engineering. According to data from OpenAlex, Jerry A. Stefani has authored 24 papers receiving a total of 383 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Mechanical Engineering, 11 papers in Electrical and Electronic Engineering and 7 papers in Biomedical Engineering. Recurrent topics in Jerry A. Stefani's work include Magnetic Properties and Applications (6 papers), Non-Destructive Testing Techniques (5 papers) and Advanced Statistical Process Monitoring (5 papers). Jerry A. Stefani is often cited by papers focused on Magnetic Properties and Applications (6 papers), Non-Destructive Testing Techniques (5 papers) and Advanced Statistical Process Monitoring (5 papers). Jerry A. Stefani collaborates with scholars based in United States. Jerry A. Stefani's co-authors include Stephanie Watts Butler, Duane S. Boning, T. Smith, John Wallace, J. K. Tien, John K. Tien, Lee M. Loewenstein, Sharad Saxena, P.K. Mozumder and Steven A. Henck and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Journal of Crystal Growth.

In The Last Decade

Jerry A. Stefani

24 papers receiving 370 citations

Peers

Jerry A. Stefani

SPU

CSE

IME

EEE

T. Smith United States

Tat-Kwan Yu United States

C. H. Yu Taiwan

Nishad Patil United States

Edward B. Hakim United States

B.E. Stine United States

Brian K. Lambert United States

Giovanni Artale Italy

Kyu‐Seob Kim South Korea

R. Weill Switzerland

T. Smith United States

Jerry A. Stefani

131 ×0.8

SPU

154 ×0.9

CSE

104 ×0.8

IME

114 ×1.1

69 ×1.0

EEE

Citations per year, relative to Jerry A. Stefani Jerry A. Stefani (= 1×) peers T. Smith

Countries citing papers authored by Jerry A. Stefani

Since Specialization

Citations

This map shows the geographic impact of Jerry A. Stefani's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jerry A. Stefani with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jerry A. Stefani more than expected).

Fields of papers citing papers by Jerry A. Stefani

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jerry A. Stefani. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jerry A. Stefani. The network helps show where Jerry A. Stefani may publish in the future.

Co-authorship network of co-authors of Jerry A. Stefani

This figure shows the co-authorship network connecting the top 25 collaborators of Jerry A. Stefani. A scholar is included among the top collaborators of Jerry A. Stefani based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jerry A. Stefani. Jerry A. Stefani is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Stefani, Jerry A., et al.. (2002). Run-to-run process control of oxide CMP using integrated metrology. 411–414. 3 indexed citations

Stefani, Jerry A., et al.. (2002). Diagnostic monitoring of photoresist ashing. 9. 27–32. 1 indexed citations

Smith, T., et al.. (1999). On-line patterned wafer thickness control of chemical-mechanical polishing. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 17(4). 1384–1390. 6 indexed citations

Smith, T., Duane S. Boning, Jerry A. Stefani, & Stephanie Watts Butler. (1998). Run by run advanced process control of metal sputter deposition. IEEE Transactions on Semiconductor Manufacturing. 11(2). 276–284. 42 indexed citations

Stefani, Jerry A., et al.. (1996). Advanced process control of a CVD tungsten reactor. IEEE Transactions on Semiconductor Manufacturing. 9(3). 366–383. 18 indexed citations

Stefani, Jerry A., et al.. (1995). On-line diagnostic monitoring of photoresist ashing. IEEE Transactions on Semiconductor Manufacturing. 8(1). 2–9. 1 indexed citations

Barna, Gabriel G., Lee M. Loewenstein, Stephanie Watts Butler, et al.. (1994). Sensor integration into plasma etch reactors of a developmental pilot line. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(4). 2860–2867. 4 indexed citations

Butler, Stephanie Watts & Jerry A. Stefani. (1994). Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry. IEEE Transactions on Semiconductor Manufacturing. 7(2). 193–201. 188 indexed citations

Butler, Stephanie Watts, et al.. (1994). Intelligent model-based control system employing in situ ellipsometry. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 12(4). 1984–1991. 13 indexed citations

10.

Stefani, Jerry A. & Stephanie Watts Butler. (1994). On‐Line Inference of Plasma Etch Uniformity Using In Situ Ellipsometry. Journal of The Electrochemical Society. 141(5). 1387–1391. 6 indexed citations

11.

Loewenstein, Lee M., Jerry A. Stefani, & Stephanie Watts Butler. (1994). First-wafer effect in remote plasma processing: The stripping of photoresist, silicon nitride, and polysilicon. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(4). 2810–2817. 6 indexed citations

12.

Butler, Stephanie Watts & Jerry A. Stefani. (1993). Application of Predictor Corrector Control to Polysilicon Gate Etching. 3003–3007. 24 indexed citations

13.

Stefani, Jerry A., et al.. (1992). <title>Open-loop predictive control of plasma etching of tungsten using an in-situ film thickness sensor</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1594. 243–257. 4 indexed citations

14.

Wallace, John, et al.. (1991). Internal heat transfer in Czochralski grown silicon crystals. Journal of Applied Physics. 69(1). 550–552. 6 indexed citations

15.

Stefani, Jerry A., et al.. (1991). Effects of growth conditions on thermal profiles during Czochralski silicon crystal growth. Journal of Crystal Growth. 108(1-2). 262–276. 8 indexed citations

16.

Stefani, Jerry A., et al.. (1989). Eddy current responses of an encircling sensor in a Czochralski silicon crystal puller. Journal of Crystal Growth. 97(3-4). 622–630. 7 indexed citations

17.

Stefani, Jerry A., et al.. (1988). Eddy current monitoring system and data reduction protocol for Czochralski silicon crystal growth. Journal of Crystal Growth. 88(1). 30–38. 9 indexed citations

18.

Stefani, Jerry A., et al.. (1988). Eddy current measurement of crystal axial thermal profiles during Czochralski silicon crystal growth. Journal of Crystal Growth. 88(1). 39–52. 10 indexed citations

19.

Stefani, Jerry A., Vincent C. Nardone, & J. K. Tien. (1987). The effect of high frequencies on the cyclic creep behavior of an ods superalloy. Scripta Metallurgica. 21(1). 1–6. 5 indexed citations

20.

Stefani, Jerry A., Vincent C. Nardone, & J. K. Tien. (1986). On the refinement of the anelastic relaxation controlled cyclic creep model. Scripta Metallurgica. 20(5). 685–688. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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