J. W. Shon
- Electrical and Electronic Engineering top 10%
- Mechanics of Materials top 5%
- Radiology, Nuclear Medicine and Imaging top 10%
- Materials Chemistry
- Atomic and Molecular Physics, and Optics
- Co-authors
- Natalia Yu. BabaevaО.V. ManuilenkoJ. K. LeeNae‐Eung LeeEllen MeeksPeter G. JonesKim JsJin Su Kim
- Topics
- Plasma Diagnostics and Applications (13 papers)Semiconductor materials and devices (8 papers)Metal and Thin Film Mechanics (6 papers)
- Cited by
- Mechanics of MaterialsElectrical and Electronic EngineeringRadiology, Nuclear Medicine and Imaging
- Journals
- Applied Physics LettersJournal of The Electrochemical SocietyJournal of Physics D Applied Physics
- Partner nations
- South KoreaUnited StatesUkraine
In The Last Decade
J. W. Shon
18 papers receiving 574 citations
Peers
Comparison fields: 5 of 28
- Electrical and Electronic Engineering 586
- Mechanics of Materials 258
- Radiology, Nuclear Medicine and Imaging 130
- Materials Chemistry 114
- Atomic and Molecular Physics, and Optics 112
Countries citing papers authored by J. W. Shon
This map shows the geographic impact of J. W. Shon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. W. Shon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. W. Shon more than expected).
Fields of papers citing papers by J. W. Shon
This network shows the impact of papers produced by J. W. Shon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. W. Shon. The network helps show where J. W. Shon may publish in the future.
Co-authorship network of co-authors of J. W. Shon
This figure shows the co-authorship network connecting the top 25 collaborators of J. W. Shon. A scholar is included among the top collaborators of J. W. Shon based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. W. Shon. J. W. Shon is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 3 | |
| 2 | 5 | |
| 3 | 6 | |
| 4 | 36 | |
| 5 | 4 | |
| 6 | 13 | |
| 7 | 5 | |
| 8 | 1 | |
| 9 | 20 | |
| 10 | 21 | |
| 11 | 27 | |
| 12 | 147 | |
| 13 | 90 | |
| 14 | 8 | |
| 15 | 7 | |
| 16 | 119 | |
| 17 | 66 | |
| 18 | 39 |
About J. W. Shon
J. W. Shon is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry, having authored 18 papers that have together received 617 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (13 papers), Semiconductor materials and devices (8 papers) and Metal and Thin Film Mechanics (6 papers). The work is most often cited by research in Mechanics of Materials (258 citations), Electrical and Electronic Engineering (586 citations) and Radiology, Nuclear Medicine and Imaging (130 citations). J. W. Shon has collaborated with scholars based in South Korea, United States and Ukraine. Frequent co-authors include Natalia Yu. Babaeva, О.V. Manuilenko, J. K. Lee, Nae‐Eung Lee, Ellen Meeks, Peter G. Jones, Kim Js, Jin Su Kim, Eric A. Hudson and Jeonghoon Han. Their work appears in journals such as Applied Physics Letters, Journal of The Electrochemical Society and Journal of Physics D Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.