Zhong-Ling Dai
- Electrical and Electronic Engineering top 10%
- Mechanics of Materials top 5%
- Atomic and Molecular Physics, and Optics
- Radiology, Nuclear Medicine and Imaging
- Materials Chemistry
- Co-authors
- You‐Nian WangXiang XuMa TengcaiWei JiangZhenqun GuanYuan‐Hong SongYou-Nian WangZhenhua Bi
- Topics
- Plasma Diagnostics and Applications (40 papers)Electrohydrodynamics and Fluid Dynamics (19 papers)Dust and Plasma Wave Phenomena (9 papers)
- Cited by
- Mechanics of MaterialsElectrical and Electronic EngineeringRadiology, Nuclear Medicine and Imaging
- Partner nations
- China
In The Last Decade
Zhong-Ling Dai
41 papers receiving 425 citations
Peers
Comparison fields: 5 of 37
- Electrical and Electronic Engineering 444
- Mechanics of Materials 207
- Atomic and Molecular Physics, and Optics 107
- Radiology, Nuclear Medicine and Imaging 103
- Materials Chemistry 86
Countries citing papers authored by Zhong-Ling Dai
This map shows the geographic impact of Zhong-Ling Dai's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Zhong-Ling Dai with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Zhong-Ling Dai more than expected).
Fields of papers citing papers by Zhong-Ling Dai
This network shows the impact of papers produced by Zhong-Ling Dai. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Zhong-Ling Dai. The network helps show where Zhong-Ling Dai may publish in the future.
Co-authorship network of co-authors of Zhong-Ling Dai
This figure shows the co-authorship network connecting the top 25 collaborators of Zhong-Ling Dai. A scholar is included among the top collaborators of Zhong-Ling Dai based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Zhong-Ling Dai. Zhong-Ling Dai is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 3 | |
| 2 | 5 | |
| 3 | 10 | |
| 4 | 2 | |
| 5 | 4 | |
| 6 | 6 | |
| 7 | 18 | |
| 8 | 8 | |
| 9 | 14 | |
| 10 | 1 | |
| 11 | 4 | |
| 12 | 14 | |
| 13 | 6 | |
| 14 | 1 | |
| 15 | 34 | |
| 16 | 25 | |
| 17 | 19 | |
| 18 | 53 | |
| 19 | 27 | |
| 20 | 12 |
About Zhong-Ling Dai
Zhong-Ling Dai is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Mechanics of Materials, having authored 41 papers that have together received 480 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (40 papers), Electrohydrodynamics and Fluid Dynamics (19 papers) and Dust and Plasma Wave Phenomena (9 papers). The work is most often cited by research in Mechanics of Materials (207 citations), Electrical and Electronic Engineering (444 citations) and Radiology, Nuclear Medicine and Imaging (103 citations). Zhong-Ling Dai has collaborated with scholars based in China. Frequent co-authors include You‐Nian Wang, Xiang Xu, Ma Tengcai, Wei Jiang, Zhenqun Guan, Yuan‐Hong Song, You-Nian Wang, Zhenhua Bi, Zhicheng Li and Yu‐Ru Zhang. Their work appears in journals such as Journal of Applied Physics, Surface and Coatings Technology and Physics of Plasmas.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.