Deuk-Chul Kwon
- Electrical and Electronic Engineering
- Mechanics of Materials top 10%
- Atomic and Molecular Physics, and Optics
- Materials Chemistry
- Aerospace Engineering
- Co-authors
- Mi‐Young SongJung‐Sik YoonHyo‐Chang LeeN. S. YoonChin‐Wook ChungYeon‐Ho ImHeechol ChoiJung‐Hyung Kim
- Topics
- Plasma Diagnostics and Applications (45 papers)Plasma Applications and Diagnostics (15 papers)Metal and Thin Film Mechanics (15 papers)
- Cited by
- Mechanics of MaterialsElectrical and Electronic EngineeringAtomic and Molecular Physics, and Optics
- Partner nations
- South KoreaIndiaUnited Kingdom
In The Last Decade
Deuk-Chul Kwon
48 papers receiving 274 citations
Peers
Comparison fields: 5 of 45
- Electrical and Electronic Engineering 241
- Mechanics of Materials 129
- Atomic and Molecular Physics, and Optics 80
- Materials Chemistry 54
- Aerospace Engineering 47
Countries citing papers authored by Deuk-Chul Kwon
This map shows the geographic impact of Deuk-Chul Kwon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Deuk-Chul Kwon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Deuk-Chul Kwon more than expected).
Fields of papers citing papers by Deuk-Chul Kwon
This network shows the impact of papers produced by Deuk-Chul Kwon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Deuk-Chul Kwon. The network helps show where Deuk-Chul Kwon may publish in the future.
Co-authorship network of co-authors of Deuk-Chul Kwon
This figure shows the co-authorship network connecting the top 25 collaborators of Deuk-Chul Kwon. A scholar is included among the top collaborators of Deuk-Chul Kwon based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Deuk-Chul Kwon. Deuk-Chul Kwon is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 2 | |
| 2 | 2 | |
| 3 | 5 | |
| 4 | 3 | |
| 5 | 1 | |
| 6 | 6 | |
| 7 | 6 | |
| 8 | 7 | |
| 9 | 7 | |
| 10 | 10 | |
| 11 | 4 | |
| 12 | 24 | |
| 13 | 11 | |
| 14 | 35 | |
| 15 | 3 | |
| 16 | Plasma surface kinetics studies of silicon dioxide etch process in inductively coupled fluorocarbon plasmas | 1 |
| 17 | 1 | |
| 18 | 5 | |
| 19 | 3 | |
| 20 | 4 |
About Deuk-Chul Kwon
Deuk-Chul Kwon is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Radiology, Nuclear Medicine and Imaging, having authored 52 papers that have together received 309 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (45 papers), Plasma Applications and Diagnostics (15 papers) and Metal and Thin Film Mechanics (15 papers). The work is most often cited by research in Mechanics of Materials (129 citations), Electrical and Electronic Engineering (241 citations) and Atomic and Molecular Physics, and Optics (80 citations). Deuk-Chul Kwon has collaborated with scholars based in South Korea, India and United Kingdom. Frequent co-authors include Mi‐Young Song, Jung‐Sik Yoon, Hyo‐Chang Lee, N. S. Yoon, Chin‐Wook Chung, Yeon‐Ho Im, Heechol Choi, Jung‐Hyung Kim, Dhanoj Gupta and Yong Jai Cho. Their work appears in journals such as The Journal of Chemical Physics, Applied Physics Letters and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.