T. Lin

405 total citations
10 papers, 350 citations indexed

About

T. Lin is a scholar working on Materials Chemistry, Mechanics of Materials and Electrical and Electronic Engineering. According to data from OpenAlex, T. Lin has authored 10 papers receiving a total of 350 indexed citations (citations by other indexed papers that have themselves been cited), including 5 papers in Materials Chemistry, 4 papers in Mechanics of Materials and 4 papers in Electrical and Electronic Engineering. Recurrent topics in T. Lin's work include Copper Interconnects and Reliability (3 papers), Diamond and Carbon-based Materials Research (3 papers) and Surface Modification and Superhydrophobicity (3 papers). T. Lin is often cited by papers focused on Copper Interconnects and Reliability (3 papers), Diamond and Carbon-based Materials Research (3 papers) and Surface Modification and Superhydrophobicity (3 papers). T. Lin collaborates with scholars based in United States, Taiwan and Bulgaria. T. Lin's co-authors include Dong‐Sing Wuu, Wei‐Kai Wang, Shih-Yung Huang, G. S. Oehrlein, Robert L. Bruce, R. J. Phaneuf, Brian K. Long, C. Grant Willson, David B. Graves and D. Nest and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Physics D Applied Physics.

In The Last Decade

T. Lin

10 papers receiving 340 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
T. Lin United States 10 224 174 102 83 65 10 350
B. Geetha Priyadarshini India 11 161 0.7× 155 0.9× 71 0.7× 21 0.3× 46 0.7× 27 328
Tomasz Stapiński Poland 14 399 1.8× 373 2.1× 50 0.5× 30 0.4× 61 0.9× 48 540
M. Ruske Germany 12 401 1.8× 380 2.2× 78 0.8× 46 0.6× 72 1.1× 21 539
J. Strümpfel Germany 10 299 1.3× 257 1.5× 208 2.0× 50 0.6× 31 0.5× 13 390
A. Zöller Germany 7 213 1.0× 128 0.7× 43 0.4× 75 0.9× 80 1.2× 23 338
Amitabh Jain United States 12 329 1.5× 195 1.1× 134 1.3× 104 1.3× 73 1.1× 125 497
K. S. Shamala India 6 267 1.2× 230 1.3× 29 0.3× 18 0.2× 55 0.8× 11 351
G. Beister Germany 9 255 1.1× 272 1.6× 243 2.4× 68 0.8× 20 0.3× 13 426
L.C.S. Murthy India 5 292 1.3× 255 1.5× 30 0.3× 18 0.2× 58 0.9× 11 377

Countries citing papers authored by T. Lin

Since Specialization
Citations

This map shows the geographic impact of T. Lin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Lin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Lin more than expected).

Fields of papers citing papers by T. Lin

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. Lin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Lin. The network helps show where T. Lin may publish in the future.

Co-authorship network of co-authors of T. Lin

This figure shows the co-authorship network connecting the top 25 collaborators of T. Lin. A scholar is included among the top collaborators of T. Lin based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. Lin. T. Lin is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

10 of 10 papers shown
1.
Lin, T., Dong‐Sing Wuu, Shih-Yung Huang, & Wei‐Kai Wang. (2018). Preparation and Characterization of Sprayed-Yttrium Oxyfluoride Corrosion Protective Coating for Plasma Process Chambers. Coatings. 8(10). 373–373. 35 indexed citations
2.
3.
Lin, T., Dong‐Sing Wuu, Shih-Yung Huang, & Wei‐Kai Wang. (2016). Characteristics of yttrium fluoride and yttrium oxide coatings for plasma process equipment prepared by atmospheric plasma spraying. Japanese Journal of Applied Physics. 55(12). 126201–126201. 29 indexed citations
4.
Lin, T., Robert L. Bruce, G. S. Oehrlein, R. J. Phaneuf, & Hung‐Chih Kan. (2012). Direct and quantitative evidence for buckling instability as a mechanism for roughening of polymer during plasma etching. Applied Physics Letters. 100(23). 12 indexed citations
5.
Bruce, Robert L., F. Weilnboeck, T. Lin, et al.. (2011). On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 29(4). 22 indexed citations
6.
Bruce, Robert L., F. Weilnboeck, T. Lin, et al.. (2010). Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films. Journal of Applied Physics. 107(8). 90 indexed citations
7.
Bruce, Robert L., T. Lin, R. J. Phaneuf, et al.. (2010). Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(4). 751–757. 13 indexed citations
8.
Nest, D., David B. Graves, Robert L. Bruce, et al.. (2010). Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: a beam system study of P4MS and PαMS. Journal of Physics D Applied Physics. 43(8). 85204–85204. 13 indexed citations
9.
Bruce, Robert L., Sebastian Engelmann, T. Lin, et al.. (2009). Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 27(3). 1142–1155. 59 indexed citations
10.
Pal, Arup R., Robert L. Bruce, F. Weilnboeck, et al.. (2009). Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing. Journal of Applied Physics. 105(1). 20 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026