W. M. Posadowski

481 total citations
24 papers, 371 citations indexed

About

W. M. Posadowski is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, W. M. Posadowski has authored 24 papers receiving a total of 371 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Mechanics of Materials, 15 papers in Electrical and Electronic Engineering and 9 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in W. M. Posadowski's work include Metal and Thin Film Mechanics (17 papers), Copper Interconnects and Reliability (9 papers) and Plasma Diagnostics and Applications (6 papers). W. M. Posadowski is often cited by papers focused on Metal and Thin Film Mechanics (17 papers), Copper Interconnects and Reliability (9 papers) and Plasma Diagnostics and Applications (6 papers). W. M. Posadowski collaborates with scholars based in Poland, United States and Japan. W. M. Posadowski's co-authors include Z. J. Radzimski, Artur Wiatrowski, Shoso Shingubara, S. M. Rossnagel, A. Brudnik, J. Jadczak, Hiroyuki Sakaue, J. Serafińczuk, Y. Horiike and K. Nitsch and has published in prestigious journals such as Thin Solid Films, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Diamond and Related Materials.

In The Last Decade

W. M. Posadowski

19 papers receiving 344 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
W. M. Posadowski Poland 10 282 226 175 88 42 24 371
J. Reschke Germany 5 325 1.2× 244 1.1× 306 1.7× 43 0.5× 45 1.1× 9 438
R. Scholl United States 9 218 0.8× 203 0.9× 170 1.0× 64 0.7× 22 0.5× 20 323
E.O. Ristolainen United States 7 284 1.0× 155 0.7× 260 1.5× 40 0.5× 30 0.7× 21 398
Philip Pikart Germany 11 224 0.8× 106 0.5× 253 1.4× 61 0.7× 31 0.7× 20 416
P. Kudláček Netherlands 11 305 1.1× 436 1.9× 373 2.1× 45 0.5× 77 1.8× 15 557
H. Bäcker United Kingdom 9 504 1.8× 376 1.7× 408 2.3× 33 0.4× 106 2.5× 10 608
Н. С. Сочугов Russia 11 212 0.8× 255 1.1× 306 1.7× 30 0.3× 70 1.7× 47 456
D. Bergstrom United States 5 438 1.6× 171 0.8× 355 2.0× 79 0.9× 55 1.3× 7 520
C. Eggs Germany 10 229 0.8× 189 0.8× 376 2.1× 39 0.4× 24 0.6× 18 446
L. R. Shaginyan Ukraine 13 448 1.6× 171 0.8× 389 2.2× 66 0.8× 77 1.8× 46 595

Countries citing papers authored by W. M. Posadowski

Since Specialization
Citations

This map shows the geographic impact of W. M. Posadowski's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. M. Posadowski with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. M. Posadowski more than expected).

Fields of papers citing papers by W. M. Posadowski

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W. M. Posadowski. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. M. Posadowski. The network helps show where W. M. Posadowski may publish in the future.

Co-authorship network of co-authors of W. M. Posadowski

This figure shows the co-authorship network connecting the top 25 collaborators of W. M. Posadowski. A scholar is included among the top collaborators of W. M. Posadowski based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with W. M. Posadowski. W. M. Posadowski is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Wiatrowski, Artur, et al.. (2017). Deposition of diamond-like carbon thin films by the high power impulse magnetron sputtering method. Diamond and Related Materials. 72. 71–76. 15 indexed citations
2.
Wiatrowski, Artur & W. M. Posadowski. (2016). The impact of medium frequency pulsed magnetron discharge power on the single probe Langmuir measurements and resulted plasma parameters. Materials Science-Poland. 34(2). 374–385. 6 indexed citations
3.
Posadowski, W. M., et al.. (2012). Magnetronowe rozpylanie : technika i technologia. Elektronika : konstrukcje, technologie, zastosowania. 53. 37–39. 1 indexed citations
4.
Posadowski, W. M., et al.. (2012). Próżniowe otrzymywanie cienkich warstw na wielkogabarytowych, szklanych podłożach. Cz. 1 Magnetron prostokątny WMP 100x2500. Elektronika : konstrukcje, technologie, zastosowania. 53. 74–76.
5.
Posadowski, W. M., et al.. (2011). Wpływ parametrów pracy magnetronu na warunki nanoszenia cienkich warstw podczas procesu rozpylania. Elektronika : konstrukcje, technologie, zastosowania. 52. 45–47.
6.
Posadowski, W. M., et al.. (2011). Model of high rate reactive pulsed magnetron sputtering. Elektronika : konstrukcje, technologie, zastosowania. 52. 69–71.
7.
Posadowski, W. M., et al.. (2011). Próżniowe, wysokowydajne, osadzanie cienkich warstw dielektrycznych metodą reaktywnego, impulsowego rozpylania magnetronowego : wybór punktu pracy magnetronu. Elektronika : konstrukcje, technologie, zastosowania. 52. 90–94. 1 indexed citations
8.
Nitsch, K., et al.. (2011). Electrical characterization of aluminium oxide–aluminium thin film composites by impedance spectroscopy. Microelectronics Reliability. 51(7). 1225–1229. 4 indexed citations
9.
Posadowski, W. M. & Artur Wiatrowski. (2009). Rozwój techniki i technologii magnetronowego rozpylania. Elektronika : konstrukcje, technologie, zastosowania. 50. 35–38. 1 indexed citations
10.
Wiatrowski, Artur, W. M. Posadowski, & Z. J. Radzimski. (2008). Pulsed-DC selfsputtering of copper. Journal of Physics Conference Series. 100(6). 62004–62004. 2 indexed citations
11.
Wiatrowski, Artur, W. M. Posadowski, & Z. J. Radzimski. (2008). Pulsed dc self-sustained magnetron sputtering. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 26(5). 1277–1281. 18 indexed citations
12.
Posadowski, W. M., et al.. (2007). Magnetron sputtering process control by medium-frequency power supply parameter. Thin Solid Films. 516(14). 4478–4482. 70 indexed citations
13.
14.
Wiatrowski, Artur, et al.. (2005). Impulsowe zasilanie układu magnetronowego : parametr technologiczny procesu rozpylania. Elektronika : konstrukcje, technologie, zastosowania. 46. 33–34. 1 indexed citations
15.
Posadowski, W. M.. (2004). Self-sustained magnetron co-sputtering of Cu and Ni. Thin Solid Films. 459(1-2). 258–261. 23 indexed citations
16.
Posadowski, W. M.. (2001). Plasma parameters of very high target power density magnetron sputtering. Thin Solid Films. 392(2). 201–207. 48 indexed citations
17.
Posadowski, W. M. & A. Brudnik. (1999). Optical emission spectroscopy of self-sustained magnetron sputtering. Vacuum. 53(1-2). 11–15. 18 indexed citations
18.
Radzimski, Z. J., W. M. Posadowski, S. M. Rossnagel, & Shoso Shingubara. (1998). Directional copper deposition using dc magnetron self-sputtering. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(3). 1102–1106. 40 indexed citations
19.
Shingubara, Shoso, Hiroyuki Sakaue, Takayuki Takahagi, et al.. (1996). Cu Deposition Characteristics into Submicron Contact Holes Employing Self-Sputtering With a High Ionization Rate. MRS Proceedings. 427. 6 indexed citations
20.
Posadowski, W. M. & Z. J. Radzimski. (1993). Sustained self-sputtering using a direct current magnetron source. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(6). 2980–2984. 70 indexed citations

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