J. Liu

1.8k citations

23 papers · 846 indexed · h-index 11

Impact in

Electronic, Optical and Magnetic Materials top 10%
- Supercapacitor Materials and Fabrication
- Copper Interconnects and Reliability
Automotive Engineering top 5%
- Advanced Battery Technologies Research

Papers in ⓘ

Electrical and Electronic Engineering 18
- Semiconductor materials and devices 15
- Advancements in Semiconductor Devices and Circuit Design 7
- Integrated Circuits and Semiconductor Failure Analysis 4
- Advancements in Battery Materials 3
Atomic and Molecular Physics, and Optics 7
- Semiconductor materials and interfaces 6

Co-authors: Arumugam Manthiram (3 shared papers)A. Vadivel Murugan (1 shared paper)Dim‐Lee Kwong (9 shared papers)Weiping Bai (3 shared papers)D. L. Kwong (2 shared papers)Xiaogang Wang (1 shared paper)J.P. Lu (3 shared papers)H.C. Wen (3 shared papers)
Journals: Applied Physics Letters (4 papers)IEEE Electron Device Letters (3 papers)Journal of The Electrochemical Society (2 papers)IEEE Transactions on Electron Devices (2 papers)Optics Express (1 paper)
Partner nations: United States China Japan

In The Last Decade

J. Liu

22 papers receiving 820 citations

Peers

Countries citing papers authored by J. Liu

Since Specialization

Citations

This map shows the geographic impact of J. Liu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Liu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Liu more than expected).

Fields of papers citing papers by J. Liu

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Liu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Liu. The network helps show where J. Liu may publish in the future.

Co-authors

The 25 scholars most cited alongside J. Liu, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with J. Liu Line = papers co-authored together J. Liu links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 23 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	High capacity double-layer surface modified Li[Li0.2Mn0.54Ni0.13Co0.13]O2 cathode with improved rate capability Journal of Materials Chemistry ·Q. Y. Wang, J. Liu, A. Vadivel Murugan, Arumugam Manthiram	2009	287
2	Improved Electrochemical Performance of the 5 V Spinel Cathode LiMn[sub 1.5]Ni[sub 0.42]Zn[sub 0.08]O[sub 4] by Surface Modification Journal of The Electrochemical Society ·J. Liu, Arumugam Manthiram	2008	131
3	A Novel MONOS-Type Nonvolatile Memory Using High-<tex>$kappa$</tex>Dielectrics for Improved Data Retention and Programming Speed IEEE Transactions on Electron Devices ·Xiaogang Wang, J. Liu, Weiping Bai, D. L. Kwong	2004	82
4	Mechanistic study of plasma damage of low k dielectric surfaces Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·J. Bao, Hua‐Tian Shi, J. Liu, Huai Huang, Pei‐Shan Ho, Michael D. Goodner, Mansour Moinpour, Grant M. Kloster	2008	80
5	Ge MOS characteristics with CVD HfO/sub 2/ gate dielectrics and TaN gate electrode Weiping Bai, N. Lu, J. Liu, A. Ramírez, Dim‐Lee Kwong, D. Wristers, Andrew Ritenour, L. Lee, D.A. Antoniadis	2004	53
6	Dual-work-function metal gates by full silicidation of poly-Si with Co-Ni bi-Layers IEEE Electron Device Letters ·J. Liu, H.C. Wen, J.P. Lu, Dim‐Lee Kwong	2005	52
7	A Simple Approach to Fabrication of High-Quality HfSiON Gate Dielectrics With Improved nMOSFET Performances IEEE Transactions on Electron Devices ·Xinchen Wang, J. Liu, Feng Zhu, Naoto Yamada, Dim‐Lee Kwong	2004	36
8	Origin of dielectric loss induced by oxygen plasma on organo-silicate glass low-k dielectrics Applied Physics Letters ·Hua‐Tian Shi, J. Bao, Ryan Scott Smith, Huai Huang, J. Liu, Paul S. Ho, Michael L. McSwiney, Mansour Moinpour, Grant M. Kloster	2008	28
9	Effects of surface chemistry on ALD Ta3N5 barrier formation on low-k dielectrics Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·J. Liu, J. Bao, M. Scharnberg, W. C. Kim, Paul S. Ho, Ravi Laxman	2005	21
10	A High-Resolution, Fully Implicit Method for Enhanced Oil Recovery Simulation J. Liu, G. A. Pope, Kamy Sepehrnoori	1995	14
11	Publisher's Note: Kinetics Study of the 5 V Spinel Cathode LiMn[sub 1.5]Ni[sub 0.5]O[sub 4] Before and After Surface Modifications [J. Electrochem. Soc., 156, A833 (2009)] Journal of The Electrochemical Society ·J. Liu, Arumugam Manthiram	2009	10
12	Theoretical and experimental investigation of Si nanocrystal memory device with HfO/sub 2/ high-k tunneling dielectric J.J. Lee, X. Wang, Weiping Bai, N. Lu, J. Liu, Dim‐Lee Kwong	2004	8
13	Phonon density of states of single-crystalSrFe2As2across the collapsed phase transition at high pressure Physical review. B. ·Y. Q. Wang, Pengchao Lu, Junjie Wu, J. Liu, Xiancheng Wang, Jiyong Zhao, Wenli Bi, E. Ercan, Changyong Park, Dmitry Popov, Changqing Jin, Jian Sun, Jung‐Fu Lin	2016	7
14	Phase formation and work function tuning in fully silicided Co–Ni metal gates with variable Co:Ni ratios Applied Physics Letters ·J. Liu, Dim‐Lee Kwong	2006	7
15	Corner-cube four-detector photopolarimeter Optics & Laser Technology ·J. Liu, R. M. A. Azzam	1997	6
16	Holographic display using layered computer-generated volume hologram Optics Express ·Chenxiao Wei, Ruyi Zhou, Haowen Ma, Dapu Pi, Jiahao Wei, Yongtian Wang, J. Liu	2023	4
17	Initial interface formation of Ta-based barriers on SiLK™ low dielectric constant films Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·J. Liu, M. Scharnberg, J. Bao, J. Im, Paul S. Ho	2005	4
18	Improving gate-oxide reliability by TiN capping layer on NiSi FUSI metal gate IEEE Electron Device Letters ·J. Liu, H.C. Wen, J.P. Lu, Dim‐Lee Kwong	2005	4
19	Improving work function tuning by preimplanting multiple dopants in Ni fully silicided gate Applied Physics Letters ·J. Liu, D. L. Kwong	2006	4
20	Impacts of Dopant Segregation on the Performance and Interface-State Density of the MOSFET With FUSI NiSi Gate IEEE Electron Device Letters ·J. Liu, Dim‐Lee Kwong	2007	4

About J. Liu

J. Liu is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Mechanics of Materials and Mechanical Engineering, having authored 23 papers that have together received 846 indexed citations. Recurring topics across this work include Semiconductor materials and devices (15 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers), Semiconductor materials and interfaces (6 papers), Metal and Thin Film Mechanics (4 papers), Copper Interconnects and Reliability (4 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers), Extraction and Separation Processes (3 papers) and Advancements in Battery Materials (3 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (274 citations), Automotive Engineering (170 citations), Electrical and Electronic Engineering (806 citations), Mechanics of Materials (85 citations) and Mechanical Engineering (104 citations). J. Liu has collaborated with scholars based in United States, China and Japan. Frequent co-authors include Arumugam Manthiram, A. Vadivel Murugan, Dim‐Lee Kwong, Weiping Bai, D. L. Kwong, Xiaogang Wang, J.P. Lu, H.C. Wen, Hua‐Tian Shi and Grant M. Kloster. Their work appears in journals such as Applied Physics Letters, IEEE Electron Device Letters, Journal of The Electrochemical Society, IEEE Transactions on Electron Devices and Optics Express.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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