J. Trube

560 total citations
22 papers, 482 citations indexed

About

J. Trube is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, J. Trube has authored 22 papers receiving a total of 482 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Electrical and Electronic Engineering, 8 papers in Materials Chemistry and 4 papers in Mechanics of Materials. Recurrent topics in J. Trube's work include Advancements in Photolithography Techniques (8 papers), Thin-Film Transistor Technologies (7 papers) and Electron and X-Ray Spectroscopy Techniques (4 papers). J. Trube is often cited by papers focused on Advancements in Photolithography Techniques (8 papers), Thin-Film Transistor Technologies (7 papers) and Electron and X-Ray Spectroscopy Techniques (4 papers). J. Trube collaborates with scholars based in Germany, Netherlands and Japan. J. Trube's co-authors include Jochen Stollenwerk, B. Meyer, Marcus Bender, A. Scharmann, Conner Daube, W. Kriegseis, H.‐L. Huber, O. Kluth, Günter Bräuer and J. Müller and has published in prestigious journals such as Thin Solid Films, Surface and Coatings Technology and Applied Physics A.

In The Last Decade

J. Trube

22 papers receiving 449 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. Trube Germany 10 372 328 81 60 58 22 482
S. Ishibashi Japan 5 341 0.9× 315 1.0× 44 0.5× 70 1.2× 84 1.4× 7 424
M. Ruske Germany 12 401 1.1× 380 1.2× 72 0.9× 63 1.1× 65 1.1× 21 539
Hauk Han United States 9 457 1.2× 423 1.3× 107 1.3× 90 1.5× 123 2.1× 11 577
Jebreel M. Khoshman Jordan 11 352 0.9× 340 1.0× 52 0.6× 93 1.6× 42 0.7× 19 501
Tien Sheng Chao Taiwan 14 428 1.2× 170 0.5× 74 0.9× 75 1.3× 26 0.4× 57 496
Kyoung‐Bo Kim South Korea 12 227 0.6× 214 0.7× 45 0.6× 72 1.2× 32 0.6× 57 358
Satoru Takaki Japan 11 674 1.8× 669 2.0× 121 1.5× 97 1.6× 175 3.0× 18 812
Joon‐Ho Oh South Korea 12 163 0.4× 173 0.5× 56 0.7× 41 0.7× 42 0.7× 36 305
J. W. Bae South Korea 13 269 0.7× 344 1.0× 90 1.1× 175 2.9× 37 0.6× 28 449
M. Kalitzova Bulgaria 11 424 1.1× 333 1.0× 43 0.5× 109 1.8× 50 0.9× 53 563

Countries citing papers authored by J. Trube

Since Specialization
Citations

This map shows the geographic impact of J. Trube's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Trube with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Trube more than expected).

Fields of papers citing papers by J. Trube

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Trube. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Trube. The network helps show where J. Trube may publish in the future.

Co-authorship network of co-authors of J. Trube

This figure shows the co-authorship network connecting the top 25 collaborators of J. Trube. A scholar is included among the top collaborators of J. Trube based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Trube. J. Trube is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Nag, Manoj, Soeren Steudel, Ajay Bhoolokam, et al.. (2014). High performance a‐IGZO thin‐film transistors with mf‐PVD SiO2 as an etch‐stop‐layer. Journal of the Society for Information Display. 22(1). 23–28. 34 indexed citations
2.
Trube, J., et al.. (2002). P‐29: Erosion Calculation for Sputtering Cathodes. SID Symposium Digest of Technical Papers. 33(1). 309–311. 2 indexed citations
3.
Hoffmann, Uwe, et al.. (2002). 27.3: New In‐Line Machine Concept for OLED Manufacturing. SID Symposium Digest of Technical Papers. 33(1). 891–893. 10 indexed citations
4.
Müller, J., G. Schöpe, O. Kluth, et al.. (2001). Upscaling of texture-etched zinc oxide substrates for silicon thin film solar cells. Thin Solid Films. 392(2). 327–333. 42 indexed citations
5.
Meyer, B., et al.. (2001). Influence of substrate temperature and sputtering atmosphere on electrical and optical properties of double silver layer systems. Thin Solid Films. 392(2). 311–314. 72 indexed citations
6.
Trube, J., et al.. (2000). 46.3: Ultra‐flat ITO Films for Light Emitting Polymer Applications. SID Symposium Digest of Technical Papers. 31(1). 1084–1087. 4 indexed citations
7.
Müller, J., G. Schöpe, O. Kluth, et al.. (2000). Texture-etched zinc oxide substrates for silicon thin film solar cells-from laboratory size to large areas. 758–761. 3 indexed citations
8.
Kriegseis, W., B. Meyer, A. Scharmann, et al.. (2000). Dependence of the electrical and optical behaviour of ITO–silver–ITO multilayers on the silver properties. Thin Solid Films. 365(1). 139–146. 154 indexed citations
9.
Bender, Marcus, J. Trube, & Jochen Stollenwerk. (1999). 38.2: Deposition of Highly Conductive ITO Thin Films for Display Applications with the rf/dc Process. SID Symposium Digest of Technical Papers. 30(1). 841–843. 4 indexed citations
10.
Bender, Marcus, J. Trube, & Jochen Stollenwerk. (1999). Characterization of a RF/dc-magnetron discharge for the sputter deposition of transparent and highly conductive ITO films. Applied Physics A. 69(4). 397–401. 22 indexed citations
11.
Bender, Marcus, J. Trube, & Jochen Stollenwerk. (1999). Deposition of transparent and conducting indium-tin-oxide films by the r.f.-superimposed DC sputtering technology. Thin Solid Films. 354(1-2). 100–105. 71 indexed citations
12.
Trube, J., et al.. (1993). Low stress and optically transparent chromium oxide layer for x-ray mask making. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2990–2993. 16 indexed citations
13.
Löchel, Bernd, H.‐L. Huber, J. Trube, et al.. (1992). Diamond membranes for x-ray masks. Microelectronic Engineering. 17(1-4). 175–179. 6 indexed citations
14.
Trube, J., et al.. (1992). In situ temperature and distribution measurements of x-ray. Microelectronic Engineering. 17(1-4). 193–197. 3 indexed citations
15.
Trube, J., H.‐L. Huber, S. Mourikis, Sigrid Bernstorff, & E.E. Koch. (1990). Infrared-measurement of X-ray mask heating during sr-lithography. Microelectronic Engineering. 11(1-4). 245–250. 5 indexed citations
16.
Trube, J., et al.. (1990). Investigation of process latitude for quality improvement in x-ray lithography mask fabrication. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1600–1603. 1 indexed citations
17.
Trube, J., et al.. (1990). Procedure and results of mask fabrication via X-ray lithography. Microelectronic Engineering. 11(1-4). 275–278. 2 indexed citations
18.
Löchel, Bernd, et al.. (1990). Pulse plating of quarter micron gold patterns on silicon X-ray masks. Microelectronic Engineering. 11(1-4). 279–282. 9 indexed citations
19.
Dammel, Ralph R., et al.. (1989). Negative-tone high-resolution photocatalytic resist for x-ray lithography. Microelectronic Engineering. 9(1-4). 575–578. 12 indexed citations
20.
Huber, H.‐L., et al.. (1988). Sub-half-micron critical dimension control in x-ray lithography mask technology. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 2184–2189. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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