Gon‐Ho Kim
- Surfaces, Coatings and Films top 5%
- Mechanics of Materials top 5%
- Metal and Thin Film Mechanics 36
- Laser-induced spectroscopy and plasma 12
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- Plasma Diagnostics and Applications 72
- Semiconductor materials and devices 18
- Nuclear and High Energy Physics top 10%
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- Plasma Applications and Diagnostics 21
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- Ion-surface interactions and analysis 16
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- Particle accelerators and beam dynamics 13
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- Diamond and Carbon-based Materials Research 12
- Co-authors
- N. HershkowitzSangwon RyuNam‐Kyun KimSeunghee HanD. DieboldYeonhee LeeGunwoo KimJunghye Lee
- Journals
- Physics of Plasmas (10 papers)Journal of Applied Physics (8 papers)Thin Solid Films (7 papers)
- Partner nations
- South KoreaUnited StatesJapan
In The Last Decade
Gon‐Ho Kim
130 papers receiving 1.4k citations
Peers
Comparison fields: 5 of 103
- Surfaces, Coatings and Films 123
- Mechanics of Materials 419
- Electrical and Electronic Engineering 830
- Nuclear and High Energy Physics 152
- Radiology, Nuclear Medicine and Imaging 229
Countries citing papers authored by Gon‐Ho Kim
This map shows the geographic impact of Gon‐Ho Kim's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Gon‐Ho Kim with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Gon‐Ho Kim more than expected).
Fields of papers citing papers by Gon‐Ho Kim
This network shows the impact of papers produced by Gon‐Ho Kim. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Gon‐Ho Kim. The network helps show where Gon‐Ho Kim may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Gon‐Ho Kim, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 1 | |
| 2 | 2024 | 3 | |
| 3 | 2024 | 0 | |
| 4 | 2024 | 2 | |
| 5 | 2023 | 7 | |
| 6 | 2022 | 4 | |
| 7 | Role of features in plasma information based virtual metrology (PI-VM) for SiO2 etching depth | 2019 | 4 |
| 8 | 2019 | 36 | |
| 9 | 2018 | 8 | |
| 10 | 2018 | 4 | |
| 11 | 2018 | 1 | |
| 12 | 2015 | 36 | |
| 13 | 2014 | 4 | |
| 14 | 2014 | 3 | |
| 15 | 2009 | 7 | |
| 16 | Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process | 2006 | 3 |
| 17 | Determination of plasma potential from the langmuir probe trace using bi-orthogonal wavelet transformation | 2003 | 1 |
| 18 | 2001 | 1 | |
| 19 | 2001 | 9 | |
| 20 | 2001 | 1 |
About Gon‐Ho Kim
Gon‐Ho Kim is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering, Computational Mechanics, Nuclear and High Energy Physics and Radiology, Nuclear Medicine and Imaging, having authored 135 papers that have together received 1.4k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (72 papers), Metal and Thin Film Mechanics (36 papers), Plasma Applications and Diagnostics (21 papers), Semiconductor materials and devices (18 papers), Ion-surface interactions and analysis (16 papers), Particle accelerators and beam dynamics (13 papers), Diamond and Carbon-based Materials Research (12 papers) and Laser-induced spectroscopy and plasma (12 papers). The work is most often cited by research in Surfaces, Coatings and Films (123 citations), Mechanics of Materials (419 citations), Electrical and Electronic Engineering (830 citations), Nuclear and High Energy Physics (152 citations) and Radiology, Nuclear Medicine and Imaging (229 citations). Gon‐Ho Kim has collaborated with scholars based in South Korea, United States and Japan. Frequent co-authors include N. Hershkowitz, Sangwon Ryu, Nam‐Kyun Kim, Seunghee Han, D. Diebold, Yeonhee Lee, Gunwoo Kim, Junghye Lee, Sung-Young Yoon and J. A. Meyer. Their work appears in journals such as Physics of Plasmas, Journal of Applied Physics, Thin Solid Films, Current Applied Physics and Plasma Sources Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.